IP Library Granted Patent US 8,558,171
Granted Patent B2
US 8,558,171 · App. 13/404,492 · Granted Oct 15, 2013

Charged particle beam apparatus including aberration corrector

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Quick Facts
Patent No.
US 8,558,171
App. No.
13/404,492
Granted
Oct 15, 2013
Kind
B2
Abstract

A focused charged particle beam apparatus including an aberration corrector, capable of finding the absolute value of the aberration coefficient at high speed, and capable of making high-accuracy adjustments at high speed. A deflection coil tilts the input beam relative to the object point, and measures the defocus data and aberration quantity at high speed while the beam is tilted from one image, and perform least squares fitting on these results to find the absolute value of the aberration coefficient prior to tilting the beam, and to adjust the aberration corrector.

Claims (61)

1. A charged particle beam apparatus comprising:

a charged particle optical system to scan a primary charged particle beam on a specimen, detect secondary charged particles emitted from the specimen due to the scanning and output the detection results as a secondary charged particle signal;

a control unit for controlling the charged particle optical system;

a data processing device to process the secondary charged particle signal that was output and acquire two-dimensional distribution information on pixels matching the area scanned by the primary charged particle beam,

wherein the charged particle optical system includes:

an aberration corrector to reduce the aberration generated by the charged particle optical system; and

a unit to guide the charged particle beam from the optical axis of the charged particle beam in a tilted state onto the specimen, and

wherein the data processing device:

calculates an out-of-focus amount and astigmatic difference in the charged particle optical system from multiple two-dimensional distribution information of a directional degree of sharpness acquired by scanning the specimen with the primary charged particle beam in a tilted state and also while changing the degree of focus, and

calculates an optical order aberration coefficient to use in the charged particle optical system, by utilizing the two-dimensional distribution information obtained from scanning the specimen in a state where the primary charged particle beam is not tilted, and the calculated out-of-focus amount and astigmatic difference.

2. The charged particle beam apparatus according to claim 1 ,

wherein the data processing device calculates the out-of-focus amount and astigmatic difference based on the respective focus values that the directional degree of sharpness reaches a peak.

3. The charged particle beam apparatus according to claim 1 ,

wherein the charged particle optical system contains a magnetic field objective lens, and

wherein the control unit for the charged particle optical system changes the degree of focus by adjusting the magnetic field objective lens.

4. The charged particle beam apparatus according to claim 1 ,

wherein the data processing device:

calculates the out-of-focus amount, astigmatic difference and astigmatic direction in the charged particle optical system from multiple two-dimensional distribution information of a directional degree of sharpness acquired by scanning the specimen with the primary charged particle beam in a tilted state and also while changing the degree of focus, and

calculates an optical order aberration coefficient to use in the charged particle optical system, by utilizing the two-dimensional distribution information obtained from scanning the specimen in a state where the primary charged particle beam is not tilted, and the calculated the out-of-focus amount, astigmatic difference and astigmatic direction.

5. A charged particle beam apparatus comprising:

a charged particle optical system to scan a primary charged particle beam on a specimen, detect secondary charged particles emitted from the specimen due to the scanning and output the detection results as a secondary charged particle signal;

a control unit for controlling the charged particle optical system;

a data processing device to process the secondary charged particle signal that was output and acquire two-dimensional distribution information on pixels matching the area scanned by the primary charged particle beam,

wherein the charged particle optical system includes:

magnetic field objective lens;

an aberration corrector to reduce the aberration generated by the charged particle optical system; and

a unit to guide the charged particle beam from the optical axis of the charged particle beam in a tilted state onto the specimen, and

wherein the data processing device:

calculates an out-of-focus amount and astigmatic difference in the charged particle optical system from multiple two-dimensional distribution information acquired by scanning the specimen with the primary charged particle beam in a tilted state and also while changing a degree of focus, and

calculates an optical order aberration coefficient to use in the charged particle optical system, by utilizing the two-dimensional distribution information obtained from scanning the specimen in a state where the primary charged particle beam is not tilted, and the calculated out-of-focus amount and astigmatic difference,

wherein the control unit for the charged particle optical system changes the degree of focus by adjusting the magnetic field objective lens.

6. The charged particle beam apparatus according to claim 5 ,

wherein the data processing device:

calculates the out-of-focus amount, astigmatic difference and astigmatic direction in the charged particle optical system from multiple two-dimensional distribution information of a directional degree of sharpness acquired by scanning the specimen with the primary charged particle beam in a tilted state and also while changing the degree of focus, and

calculates an optical order aberration coefficient to use in the charged particle optical system, by utilizing the two-dimensional distribution information obtained from scanning the specimen in a state where the primary charged particle beam is not tilted, and the calculated the out-of-focus amount, astigmatic difference and astigmatic direction.

7. A charged particle beam apparatus comprising:

a charged particle optical system to scan a charged particle beam on a specimen, detect a transmission electron transmitted from the specimen due to the scanning and output the detection results as a transmission electron signal;

a control unit for controlling the charged particle optical system;

a data processing device to process the transmission electron signal that was output and acquire two-dimensional distribution information on pixels matching the area scanned by the charged particle beam,

wherein the charged particle optical system includes:

an aberration corrected to reduce the aberration generated by the charged particle optical system; and

a unit to guide the charged particle beam from the optical axis of the charged particle beam in a tilted state onto the specimen, and

wherein the data processing device:

calculates an out-of-focus amount and astigmatic difference in the charged particle optical system from multiple two-dimensional distribution information acquired by scanning the specimen with the charged particle beam in a tilted state and also while changing a degree of focus, and

calculates an optical order aberration coefficient to use in the charged particle optical system, by utilizing the two-dimensional distribution information obtained from scanning the specimen in a state where the charged particle beam is not tilted, and the calculated out-of-focus amount and astigmatic difference.

8. The charged particle beam apparatus according to claim 7 ,

wherein the data processing device calculates the correction quantity of the aberration corrector by utilizing the calculated aberration coefficient.

9. The charged particle beam apparatus according to claim 7 ,

wherein the charged particle optical system contains a magnetic field objective lens including an electrostatic lens, and

wherein the control unit for the charged particle optical system changes the degree of focus by adjusting the applicable electrostatic lens.

10. The charged particle beam apparatus according to claim 9 ,

comprising a storage unit to store information relating to the range width of the focus adjustment.

11. The charged particle beam apparatus according to claim 7 ,

wherein the data processing device calculates the out-of-focus amount and dual symmetrical aberration from the two-dimensional distribution information, and calculates the aberration coefficient by using the applicable calculated out-of-focus amount and dual symmetrical aberration.

12. The charged particle beam apparatus according to claim 7 ,

wherein the charged particle optical system contains a magnetic field objective lens including, and

wherein the control unit for the charged particle optical system changes the degree of focus by adjusting the magnetic field objective lens.

13. The charged particle beam apparatus according to claim 7 ,

wherein the data processing device:

calculates the out-of-focus amount, astigmatic difference and astigmatic direction in the charged particle optical system from multiple two-dimensional distribution information of a directional degree of sharpness acquired by scanning the specimen with the charged particle beam in a tilted state and also while changing the degree of focus, and

calculates an optical order aberration coefficient to use in the charged particle optical system, by utilizing the two-dimensional distribution information obtained from scanning the specimen in a state where the charged particle beam is not tilted, and the calculated the out-of-focus amount, astigmatic difference and astigmatic direction.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →