IP Library Granted Patent US 9,859,882
Granted Patent B2
US 9,859,882 · App. 13/416,252 · Granted Jan 2, 2018

High voltage composite semiconductor device with protection for a low voltage device

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Quick Facts
Patent No.
US 9,859,882
App. No.
13/416,252
Granted
Jan 2, 2018
Kind
B2
Abstract

There are disclosed herein various implementations of composite semiconductor devices including a voltage protected device. In one exemplary implementation, a normally OFF composite semiconductor device comprises a normally ON III-nitride power transistor having a first output capacitance, and a low voltage (LV) device cascoded with the normally ON III-nitride power transistor to form the normally OFF composite semiconductor device, the LV device having a second output capacitance. A ratio of the first output capacitance to the second output capacitance is set based on a ratio of a drain voltage of the normally ON III-nitride power transistor to a breakdown voltage of the LV device so as to provide voltage protection for the LV device.

Claims (21)

1. A normally OFF composite semiconductor device, comprising:

a normally ON III-nitride power transistor having a first output capacitance;

a low voltage (LV) device cascoded with said normally ON III-nitride power transistor to form said normally OFF composite semiconductor device, said LV device having a second output capacitance;

said first output capacitance and said second output capacitance being designed to satisfy a first ratio set according to a second ratio of a drain voltage of said normally ON III-nitride power transistor to a breakdown voltage of said LV device so as to provide voltage protection for said LV device;

said normally ON III-nitride power transistor configured to turn OFF in response to a voltage across said LV device,

wherein said first ratio is set to less than 120.

2. The normally OFF composite semiconductor device of claim 1 , wherein said normally ON III-nitride power transistor is one of a III-nitride field-effect transistor (III-N FET) and a III-nitride high electron mobility transistor (III-N HEMT).

3. The normally OFF composite semiconductor device of claim 1 , wherein said LV device comprises an LV group IV semiconductor device.

4. The normally OFF composite semiconductor device of claim 1 , wherein said LV device comprises an LV silicon device.

5. The normally OFF composite semiconductor device of claim 1 , wherein said LV device comprises an LV field-effect transistor (LV FET).

6. The normally OFF composite semiconductor device of claim 1 , wherein said LV device is one of an LV metal-oxide-semiconductor FET (LV MOSFET) and an LV metal-insulator-semiconductor FET (LV MISFET).

7. The normally OFF composite semiconductor device of claim 1 , wherein said LV device comprises an LV diode.

8. The normally OFF composite semiconductor device of claim 1 , wherein said normally ON III-nitride power transistor and said LV device are monolithically integrated.

9. A normally OFF composite semiconductor device, comprising: a normally ON III-nitride power transistor having a first output capacitance; a low voltage (LV) device cascaded with said normally ON III-nitride power transistor to form said normally OFF composite semiconductor device, said LV device having a drain and a second output capacitance, wherein a ratio of said first output capacitance to said second output capacitance is based on a drain voltage of said normally ON III-nitride power transistor and a breakdown voltage of said LV device, and set to ensure that a voltage at said drain of the LV device does not rise beyond said breakdown voltage of said LV device, wherein said normally ON III-nitride power transistor is configured to, and turn OFF in response to a voltage across said LV device, and wherein said ratio is set to less than 120.

10. The normally OFF composite semiconductor device of claim 9 , wherein said normally ON III-nitride power transistor is one of a III-nitride field-effect transistor (III-N FET) and a III-nitride high electron mobility transistor (III-N HEMT).

11. The normally OFF composite semiconductor device of claim 9 , wherein said LV device comprises an LV group IV semiconductor device.

12. The normally OFF composite semiconductor device of claim 9 , wherein said LV device comprises an LV silicon device.

13. The normally OFF composite semiconductor device of claim 9 , wherein said LV device comprises an LV field-effect transistor (LV FET).

14. The normally OFF composite semiconductor device of claim 9 , wherein said LV device is one of an LV metal-oxide-semiconductor FET (LV MOSFET) and an LV metal-insulator-semiconductor FET (LV MISFET).

15. The normally OFF composite semiconductor device of claim 9 , wherein said LV device comprises an LV diode.

16. The normally OFF composite semiconductor device of claim 9 , wherein said normally ON III-nitride power transistor and said LV device are monolithically integrated.

Assignments (2)
MERGER AND CHANGE OF NAME Recorded Apr 13, 2016
From: INFINEON TECHNOLOGIES NORTH AMERICA CORP.; INTERNATIONAL RECTIFIER CORPORATION; INTERNATIONAL RECTIFIER CORPORATION
To: INFINEON TECHNOLOGIES AMERICAS CORP.
Reel/Frame 038463/0859 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 9, 2012
From: ZHANG, JASON; BRAMIAN, TONY
To: INTERNATIONAL RECTIFIER CORPORATION
Reel/Frame 027835/0735 →