Granted Patent B2

US 8,673,121 · App. 13/428,474 · Granted Mar 18, 2014

Abstract

Claims (32)

1. A method, comprising:

providing a substrate;

forming a first piezoelectric layer having a compression-negative (C N ) polarity over the substrate; and

forming a second piezoelectric layer having a compression-positive (C P ) over the substrate and adjacent to the first piezoelectric layer, wherein the forming of the first piezoelectric layer and the forming of the second piezoelectric layer occurs substantially simultaneously.

2. A method as claimed in claim 1 , further comprising, before forming the first piezoelectric layer and the second piezoelectric layer, forming a first electrode layer.

3. A method as claimed in claim 2 , further comprising forming an electronegative layer over the first electrode.

4. A method as claimed in claim 3 , further comprising removing the electronegative layer from a portion of the first electrode.

5. A method as claimed in claim 4 , further comprising flowing hydrogen over the portion and over the electronegative layer.

6. A method as claimed in claim 5 , further comprising forming the first piezoelectric layer over the portion of the first electrode and forming the second piezoelectric layer over the electronegative layer.

7. A method as claimed in claim 6 , further comprising, reducing the flow rate of the hydrogen after beginning the forming of the first piezoelectric layer.

8. A method as claimed in claim 5 , further comprising forming a seed layer of the first piezoelectric layer over the portion of the first electrode.

9. A method as claimed in claim 8 , wherein a layer is formed over the electronegative layer, and the method further comprises removing the layer to expose the electronegative layer before the forming of the first piezoelectric layer and before the forming of the second piezoelectric layer.

10. A method as claimed in claim 9 , wherein the forming of the first piezoelectric layer and the forming of the second piezoelectric layer occurs substantially simultaneously.

11. A method as claimed in claim 8 , further comprising before the forming of the seed layer, flowing hydrogen over the portion and over the electronegative layer.

12. A method as claimed in claim 8 , further comprising terminating the flow of hydrogen after beginning the forming of the first piezoelectric layer and the beginning of the forming of the second piezoelectric layer.

13. A method as claimed in claim 2 , further comprising forming an electropositive surface over the first electrode.

14. A method as claimed in claim 13 , further comprising removing the electropositive surface from a portion of the first electrode.

15. A method as claimed in claim 14 , further comprising flowing hydrogen over the portion and over the portion and the electropositive surface.

16. A method as claimed in claim 15 , further comprising forming the first piezoelectric layer over the electronegative layer and forming the second piezoelectric layer over the portion of the first electrode, wherein the forming of the first piezoelectric layer and the forming of the second piezoelectric layer occurs substantially simultaneously.

17. A method as claimed in claim 16 , further comprising, after forming the electropositive surface, flowing hydrogen over the portion and over the electropositive surface.

18. A method as claimed in claim 17 , further comprising reducing the flow of hydrogen after beginning the forming of the first piezoelectric layer and after beginning the forming of the second piezoelectric layer.

19. A method, comprising:

providing a seed layer useful in the growth of type-C P piezoelectric material over a portion of an electrode;

providing a seed layer useful in the growth of type-C N piezoelectric material is provided over another portion of the electrode;

growing an initial layer of type-C P piezoelectric material and an initial thickness of type-C N piezoelectric material over a common substrate;

removing the initial layer of the type-C P piezoelectric material; and

growing type-C P piezoelectric material and type-C N piezoelectric material substantially simultaneously over the substrate under conditions conducive to the formation of type C P piezoelectric material.

20. A method as claimed in claim 19 , further comprising performing a cleaning step after the removing of the initial layer of the type-C P piezoelectric material.

21. A method, comprising:

providing a seed layer useful in the growth of type-C N piezoelectric material over a portion of an electrode;

activating the seed layer useful in the growth of type-C N piezoelectric material;

growing a type-C P piezoelectric material and a type-C N piezoelectric material substantially simultaneously in a chamber under conditions conducive to the formation of type-C P piezoelectric material.

Assignments (9)