IP Library › Granted Patent US 9,310,525
Granted Patent B2
US 9,310,525 · App. 13/434,111 · Granted Apr 12, 2016

Antireflection film and optical device

Inventors: Minoru Shibuya (Saitama, JP); Terufusa Kunisada (Saitama, JP); Naoki Yamashita (Saitama, JP)
Assignee: Tamron Co., Ltd.
G02B1/11Y10T428/24942
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Quick Facts
Patent No.
US 9,310,525
App. No.
13/434,111
Granted
Apr 12, 2016
Kind
B2
Abstract

An object of the present invention is to provide an antireflection film and an optical device having excellent antireflection characteristics against a light beam having a wide wavelength range at a wide range of an incident angle, and also having practically sufficient durability. To achieve the above object, the present invention adopts an antireflection film having an optical two-layer structure composed of an intermediate layer provided on a base material and a low refractive index layer provided on a surface of the intermediate layer, wherein the low refractive index layer is a layer obtained by binding hollow silica by a binder, a refractive index n( 1 ) thereof is between 1.15 and 1.24 inclusive, and a refractive index n( 2 ) of the intermediate layer satisfies a relation in the expression (1) below assuming a refractive index of the base material n(sub). n (1)×√{square root over ( n (sub))}×0.930 ≦n (2)≦ n (1)×√{square root over ( n (sub))}×0.985  (1).

Claims (18)

1. An antireflection film for a light beam having a wavelength of 400 nm to 800 nm inclusive, provided on a base material,

comprising an optical two-layer structure composed of an intermediate layer to be provided on the base material and a low refractive index layer provided on a surface of the intermediate layer, wherein a reflectance against a light beam having a wavelength of 400 nm to 800 nm inclusive at an incident angle of 0° is 0.5% or less, and a reflectance against a light beam having a wavelength of 400 nm to 680 nm inclusive at an incident angle of 45° or less is 0.7% or less;

wherein the low refractive index layer is a layer obtained by binding a hollow silica with a binder and the low refractive index layer has a refractive index n( 1 ) of between 1.15 and 1.24 inclusive;

wherein an optical film thickness of the low refractive index layer is between 100 nm to 180 nm inclusive;

wherein an optical film thickness of the intermediate layer is between 100 nm to 180 nm inclusive; and

a refractive index n( 2 ) of the intermediate layer satisfies a relation in an expression (1) below assuming a refractive index of the base material n(sub):

n (1)×√{square root over ( n (sub))}×0.930 ≦n (2)≦ n (1)×√{square root over ( n (sub))}×0.985  (1).

2. The antireflection film according to claim 1 , wherein occupied volume of the hollow silica in the low refractive index layer is between 30% by volume to 99% by volume inclusive.

3. The antireflection film according to claim 1 , wherein a void portion is provided in the low refractive index layer in addition to a hollow portion in the hollow silica.

4. The antireflection film according to claim 1 , wherein an average particle size of the hollow silica particles is between 5 nm to 100 nm inclusive, and outer sides of the hollow silica particles are coated with the binder.

5. The antireflection film according to any one of claims 1 to 4 , wherein the refractive index n( 1 ) of the low refractive index layer is between 1.17 and 1.23 inclusive.

6. The antireflection film according to claim 1 , wherein the refractive index n( 2 ) of the intermediate layer satisfies an expression (2) below:

n (1)×√{square root over ( n (sub))}×0.940 ≦n (2)≦ n (1)×√{square root over ( n (sub))}×0.970  (2).

7. The antireflection film according to claim 1 , wherein the intermediate layer is an equivalent stack having a multi-layer structure that satisfies the relation in the expression (1) at a reference wavelength.

8. The antireflection film according to claim 1 , wherein the low refractive index layer is a layer formed by using the hollow silica, and a resin material or metal alkoxide as a binder component.

9. The antireflection film according to claim 1 , wherein a functional layer having a refractive index n( 3 ) of 1.30 to 2.35 inclusive and a film thickness between 1 nm to 30 nm inclusive is provided on a surface of the low refractive index layer.

10. The antireflection film according to claim 1 , wherein the base material is a base material for an optical device.

11. An optical device provided with the antireflection film according to claim 1 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 24, 2012
From: SHIBUYA, MINORU; KUNISADA, TERUFUSA; YAMASHITA, NAOKI
To: TAMRON CO., LTD.
Reel/Frame 028098/0765 →
Priority Claims (2)
JP 2011-074496 · Mar 30, 2011 · national
JP 2011-091705 · Apr 18, 2011 · national
Continuity (1)
Related Publication 20120251803A1 · Oct 4, 2012