Stacked Composite Device Including a Group III-V Transistor and a Group IV Diode
In one implementation, a stacked composite device comprises a group IV diode and a group III-V transistor stacked over the group IV diode. A cathode of the group IV diode is in contact with a source of the group III-V transistor, an anode of the group IV diode is coupled to a gate of the group III-V transistor to provide a composite anode on a bottom side of the stacked composite device, and a drain of the group III-V transistor provides a composite cathode on a top side of the stacked composite device.
1 . A stacked composite device having a composite anode and a composite cathode, said stacked composite device comprising:
a group IV diode;
a group III-V transistor stacked over said group IV diode;
a cathode of said group IV diode being in contact with a source of said group III-V transistor;
an anode of said group IV diode being coupled to a gate of said group III-V transistor to provide said composite anode on a bottom side of said stacked composite device;
a drain of said group III-V transistor providing said composite cathode on a top side of said stacked composite device opposite said bottom side.
2 . The stacked composite device of claim 1 , wherein said anode of said group IV diode is coupled to said gate of said group III-V transistor through at least one through-silicon via (TSV).
3 . The stacked composite device of claim 1 , wherein said anode of said group IV diode is coupled to said gate of said group III-V transistor through at least one bond wire.
4 . The stacked composite device of claim 1 , wherein said group III-V transistor is a normally ON device and said stacked composite device is a normally OFF device.
5 . The stacked composite device of claim 1 , wherein said group III-V transistor is a high-voltage transistor and said group IV diode is a low-voltage diode.
6 . The stacked composite device of claim 1 , wherein at least one of a die of said group IV diode and a die of said group III-V transistor has a thickness of less than approximately 60 μm.
7 . The stacked composite device of claim 1 , wherein said group IV diode comprises silicon.
8 . A composite device package comprising:
a group IV diode in a first active die;
a group III-V transistor stacked over said group IV diode in a second active die, a lateral area of said first active die being greater than a lateral area of said second active die;
a cathode of said group IV diode being in contact with a source of said group III-V transistor;
an anode of said group IV diode being coupled to a gate of said group III-V transistor to provide a composite anode on a bottom side of said composite device package;
a drain of said group III-V transistor providing a composite cathode on a top side of said composite device package opposite said bottom side.
9 . The composite device package of claim 8 , wherein said anode of said group IV diode is coupled to said gate of said group III-V transistor through at least one through-silicon via (TSV).
10 . The composite device package of claim 8 , wherein said anode of said group IV diode is coupled to said gate of said group III-V transistor through at least one bond wire.
11 . The composite device package of claim 8 , wherein said group III-V transistor is a normally ON device and a composite device formed of said group III-V transistor and said group IV diode is a normally OFF device.
12 . The composite device package of claim 8 , wherein said group III-V transistor is a high-voltage transistor and said group IV diode is a low-voltage diode.
13 . The composite device package of claim 8 , wherein at least one of said first active die and said second active die has a thickness of less than approximately 60 μm.
14 . The composite device package of claim 8 , wherein said group IV diode comprises silicon.
15 . A stacked composite device having a composite anode and a composite cathode, said stacked composite device comprising:
a silicon diode;
a III-Nitride transistor stacked over said silicon diode;
a cathode of said silicon diode being in contact with a source of said III-Nitride transistor;
an anode of said silicon diode being coupled to a gate of said III-Nitride transistor to provide said composite anode on a bottom side of said stacked composite device;
a drain of said III-Nitride transistor providing said composite cathode on a top side of said stacked composite device opposite said bottom side.
16 . The stacked composite device of claim 15 , wherein said anode of said silicon diode is coupled to said gate of said III-Nitride transistor through at least one through-silicon via (TSV).
17 . The stacked composite device of claim 15 , wherein said anode of said silicon diode is coupled to said gate of said III-Nitride transistor through at least one bond wire.
18 . The stacked composite device of claim 15 , wherein said III-Nitride transistor is a normally ON device and said stacked composite device is a normally OFF device.
19 . The stacked composite device of claim 15 , wherein said III-Nitride transistor is a high-voltage transistor and said silicon diode is a low-voltage diode.
20 . The stacked composite device of claim 15 , wherein said III-Nitride transistor comprises gallium nitride (GaN).