Germanium-based quantum well devices
View Patent ↗A quantum well transistor has a germanium quantum well channel region. A silicon-containing etch stop layer provides easy placement of a gate dielectric close to the channel. A group III-V barrier layer adds strain to the channel. Graded silicon germanium layers above and below the channel region improve performance. Multiple gate dielectric materials allow use of a high-k value gate dielectric.
1. A device, comprising:
a lower barrier region comprising a large band gap material;
a quantum well channel region comprising germanium on the lower barrier region;
an upper barrier region comprising a large band gap material on the quantum well region;
a gate dielectric on the quantum well channel region and not in contact with the quantum well channel region;
a gate electrode on the gate dielectric; and
wherein at least one of the lower barrier region or the upper barrier region comprises a group III-V material.
2. The device of claim 1 , wherein the lower barrier region comprises a group III-V material.
3. The device of claim 2 , wherein the lower barrier region comprises GaAs.
4. The device of claim 1 , wherein one of the lower barrier region or the upper barrier region comprises silicon germanium and does not comprise a group III-V material.
5. The device of claim 1 , wherein the lower barrier region comprises silicon germanium and the upper barrier region comprises a group III-V material.
6. The device of claim 1 , wherein both the lower barrier region and the upper barrier region comprise a group III-V material.
7. The device of claim 1 , further comprising:
a spacer region on the quantum well channel region and below the upper barrier region; and
a doped region on the spacer region and below the upper barrier region.
8. The device of claim 7 , wherein the spacer region, the lower barrier region, and the upper barrier region all comprise III-V material.
9. The device of claim 8 , wherein the doped region comprises a doped III-V material.
10. The device of claim 1 , further comprising:
a spacer region under the quantum well channel region and on the lower barrier region; and
a doped region under the spacer region and on the upper barrier region.
11. A device, comprising:
a lower barrier region comprising a large band gap material;
a quantum well channel region comprising germanium on the lower barrier region;
an upper barrier region comprising a large band gap material on the quantum well region;
a gate dielectric on the quantum well channel region and not in contact with the quantum well channel region;
a gate electrode on the gate dielectric; and
wherein the lower barrier region comprises silicon germanium, with there being a higher percentage of silicon in a portion of the lower barrier region further from the quantum well channel region and a lower percentage of silicon in a portion of the lower barrier region closer to the quantum well channel region.
12. The device of claim 11 , wherein the decrease in silicon percentage in the lower barrier region is substantially smooth.
13. The device of claim 11 , wherein the decrease in silicon percentage in the lower barrier region is stepped.
14. The device of claim 11 , further comprising:
a spacer region on the quantum well channel region and below the upper barrier region; and
a doped region on the spacer region and below the upper barrier region; and
wherein the spacer region comprises silicon germanium, with there being a higher percentage of silicon in a portion of the spacer region further from the quantum well channel region and a lower percentage of silicon in a portion of the spacer region closer to the quantum well channel region.
15. A device, comprising:
a lower barrier region comprising a large band gap material;
a quantum well channel region comprising germanium on the lower barrier region;
an upper barrier region comprising a large band gap material on the quantum well region;
a first dielectric material having a first dielectric constant on the quantum well channel region;
a second dielectric material having a second dielectric constant on the first dielectric material, the second dielectric constant being higher than the first dielectric constant; and
a gate electrode on the second dielectric material.
16. The device of claim 1 , wherein the first dielectric material comprises a material selected from the group consisting of HfSiO, Al 2 O 3 , TaSiO, TaSiON, and La 2 O 3 .
17. The device of claim 1 , wherein the second dielectric material comprises a material selected from the group consisting of HfO 2 , ZrO 2 , Ti 2 O 5 , Ta 2 O 5 , HfSiON, and HfSiO.