Thermochromic substrate and method of manufacturing the same
A thermochromic substrate and a method of manufacturing the same, in which the crystallinity of a thermochromic layer can be improved. The method includes the steps of forming a pre-thermochromic layer on a glass substrate by coating the glass substrate with pure vanadium, forming a seed layer by heat-treating the pre-thermochromic layer, and forming a thermochromic layer by coating the heat-treated seed layer with a vanadium dioxide (VO 2 ) thin film.
1. A method of manufacturing a thermochromic substrate,
the thermochromic substrate comprising:
a base substrate;
a seed layer formed on the base substrate; and
a thermochromic layer formed on the seed layer,
wherein the thermochromic layer comprises a thermochromic substance, and the seed layer is modified such that at least a surface thereof facing the thermochromic layer contains the thermochromic substance,
the method comprising:
forming a pre-thermochromic layer on the base substrate, the pre-thermochromic layer containing a pre-thermochromic substance;
forming the seed layer by heat-treating the pre-thermochromic layer; and
forming the thermochromic layer on the seed layer.
2. The method of claim 1 , wherein the thermochromic substance comprises vanadium dioxide (VO 2 ).
3. The method of claim 2 , wherein the pre-thermochromic substance comprises pure vanadium, wherein at least the surface of the pre-thermochromic layer is modified from the pure vanadium into the vanadium dioxide (VO 2 ) by heat-treating the pre-thermochromic layer.
4. The method of claim 1 , wherein a thickness of the seed layer ranges from 5 nm to 10 nm.
5. The method of claim 1 , wherein the pre-thermochromic layer is heat-treated in vacuum atmosphere.
6. The method of claim 1 , wherein the pre-thermochromic layer is heat-treated in oxygen atmosphere.
7. The method of claim 6 , wherein the oxygen is provided in an amount ranging from 10 sccm to 100 sccm.
8. The method of claim 1 , wherein the pre-thermochromic layer is heat-treated at a temperature ranging from 300° C. to 500° C.
9. The method of claim 1 , wherein the pre-thermochromic layer is heat-treated for 10 to 60 minutes.
10. The method of claim 1 , wherein the thermochromic layer comprises vanadium dioxide (VO 2 ), wherein the thermochromic layer comprising the vanadium dioxide (VO 2 ) is formed by sputtering deposition using a sputtering target made of pure vanadium or a vanadium oxide.
11. The method of claim 1 , wherein the thermochromic layer comprises vanadium dioxide (VO 2 ), wherein the thermochromic layer comprising the vanadium dioxide (VO 2 ) is formed by direction current (DC) sputtering deposition using a sputtering target made of pure vanadium or vanadium dioxide (VO 2 ) into which vanadium trioxide (V 2 O 3 ) and vanadium pentoxide (V 2 O 5 ) are mixed.
12. The method of claim 1 , wherein the pre-thermochromic layer is formed at a temperature of 350° C. or less.
13. A method of manufacturing a thermochromic substrate,
the thermochromic substrate comprising:
a base substrate;
a seed layer formed on the base substrate; and
a thermochromic layer formed on the seed layer,
wherein the thermochromic layer comprises a thermochromic substance, and the seed layer is modified such that at least a surface thereof facing the thermochromic layer contains the thermochromic substance,
the method comprising:
forming a pre-thermochromic layer on the base substrate, the pre-thermochromic layer containing a pre-thermochromic substance;
forming the seed layer by oxidizing the pre-thermochromic layer; and
forming the thermochromic layer on the seed layer.
14. The method of claim 13 , wherein the thermochromic material comprises vanadium dioxide (VO 2 ).