DONOR SUBSTRATE, METHOD OF MANUFACTURING A DONOR SUBSTRATE AND METHOD OF MANUFACTURING AN ORGANIC LIGHT EMITTING DISPLAY DEVICE USING A DONOR SUBSTRATE
A donor substrate may include a base substrate, an expansion layer positioned on the base substrate, a light-to-heat conversion layer on the expansion layer, an insulation layer located on the light-to-heat conversion layer, and an organic transfer layer on the insulation layer. The donor substrate may effectively and uniformly transfer the organic transfer layer onto a display substrate of an organic light emitting display device.
1 . A donor substrate comprising:
a base substrate;
an expansion layer on the base substrate;
a light-to-heat conversion layer on the expansion layer;
an insulation layer on the light-to-heat conversion layer; and
an organic transfer layer on the insulation layer.
2 . The donor substrate of claim 1 , wherein the expansion layer comprises a material having a thermal expansion coefficient equal to or greater than about 1.5×10 −5 /° C.
3 . The donor substrate of claim 2 , wherein the expansion layer comprises a thermoplastic resin.
4 . The donor substrate of claim 3 , wherein the expansion layer comprises at least one selected from the group consisting of polystyrene, polymethyl acrylate, polyethyl acrylate, polypropyl acrylate, polyisopropyl acrylate, poly n-butyl acrylate, poly sec-butyl acrylate, poly isobutyl acrylate, poly tetra-butyl acrylate, polymethyl methacrylate, polyethyl methacrylate, poly n-butyl methacrylate, poly n-decyl methacrylate, polyvinyl chloride, polyvinylidene chloride, and acrylonitrile-butadiene-styrene copolymer.
5 . The donor substrate of claim 3 , wherein the base substrate comprises a thermoplastic resin, and the base substrate and the expansion layer are integrally formed.
6 . A donor substrate comprising:
a base substrate;
a light-to-heat conversion layer on a first side of the base substrate;
an insulation layer on the light-to-heat conversion layer;
an organic transfer layer on the insulation layer; and
an antistatic member in the base substrate or the insulation layer.
7 . The donor substrate of claim 6 , wherein the antistatic member comprises an antistatic agent dispersed in the base substrate.
8 . The donor substrate of claim 7 , wherein the antistatic agent has a concentration between about 0.1 percent by weight and about 0.2 percent by weight based on a total weight of the base substrate.
9 . The donor substrate of claim 7 , wherein the antistatic agent comprises at least one selected from the group consisting of a glycerin monomer stearate-based antistatic material, an amine-based antistatic material, and a magnetic metal oxide.
10 . The donor substrate of claim 6 , wherein the antistatic member comprises an antistatic agent dispersed in the insulation layer.
11 . The donor substrate of claim 6 , wherein the antistatic member comprises a transparent conductive layer on a second side of the base substrate.
12 . The donor substrate of claim 11 , wherein the transparent conductive layer comprises a conductive metal oxide or a high molecular weight conductive material.
13 . The donor substrate of claim 12 , wherein the transparent conductive layer comprises at least one selected from the group consisting of polyaniline, polypyrrole, polythiophene, polyethylenedioxythiophene, antimony tin oxide, indium tin oxide, indium zinc oxide, niobium oxide, zinc oxide, gallium oxide, tin oxide, and indium oxide.
14 . A method of forming a donor substrate, comprising:
forming a base substrate;
forming an expansion layer on the base substrate;
forming a light-to-heat conversion layer on the expansion layer;
forming an insulation layer on the light-to-heat conversion layer; and
forming an organic transfer layer on the insulation layer.
15 . The method of claim 14 , wherein the expansion layer is formed by coating a thermoplastic resin on the base substrate by a spin coating process, a slit coating process, or a gravure coating process.
16 . The method of claim 14 , wherein the expansion layer is formed using a polyethylene terephthalate resin containing a thermoplastic resin.
17 . The method of claim 16 , wherein the expansion layer is formed by a biaxial drawing process.
18 . A method of forming a donor substrate, comprising:
forming a base substrate;
forming a light-to-heat conversion layer on a first side of the base substrate;
forming an insulation layer on the light-to-heat conversion layer;
forming an organic transfer layer on the insulation layer; and
forming an antistatic member in the base substrate, in the insulation layer, or on a second side of the base substrate.
19 . The method of claim 18 , wherein the forming the antistatic member comprises dispersing an antistatic agent in the base substrate.
20 . The method of claim 18 , wherein the forming the antistatic member comprises dispersing an antistatic agent in the insulation layer.
21 . The method of claim 18 , wherein the forming the antistatic member comprises forming a transparent conductive layer on the second side of the base substrate.
22 . A method of manufacturing an organic light emitting display device, comprising:
forming a lower electrode on a substrate;
forming a pixel defining layer on the lower electrode to define a pixel region;
forming a donor substrate including a base substrate, an expansion layer on the base substrate, a light-to-heat conversion layer on the expansion layer, and an organic transfer layer on the light-to-heat conversion layer;
attaching the donor substrate to the substrate with the organic transfer layer facing the pixel region of the substrate; and
forming an organic layer pattern on the pixel region from the organic transfer layer by irradiating a laser beam onto at least a portion of the donor substrate opposite the pixel region.
23 . The method of claim 22 , wherein the donor substrate further comprises an insulation layer between the light-to-heat conversion layer and the organic transfer layer.
24 . A method of manufacturing an organic light emitting display device, comprising:
forming a lower electrode on a substrate;
forming a pixel defining layer on the lower electrode to define a pixel region;
forming a donor substrate including a base substrate, a light-to-heat conversion layer on a first side of the base substrate, an insulation layer on the light-to-heat conversion layer, an organic transfer layer on the insulation layer, and an antistatic member in the base substrate, in the insulation layer, or on a second side of the base substrate;
attaching the donor substrate to the substrate with the organic transfer layer facing the pixel region of the substrate; and
forming an organic layer pattern on the pixel region from the organic transfer layer by irradiating a laser beam onto at least a portion of the donor substrate opposite the pixel region.
25 . The method of claim 24 , wherein the antistatic member comprises an antistatic agent dispersed in the insulation layer.
26 . The method of claim 24 , wherein the antistatic member comprises an antistatic agent dispersed in the base substrate.