Tube Reactor for Chemical Vapor Deposition
An apparatus for performing film deposition, comprises an energy source, a plurality of process tubes, and a gas manifold. The energy source is adapted to direct energy into a cylindrical space. The plurality of process tubes, in turn, pass through this cylindrical space. To perform the film deposition, the gas manifold is operative to introduce a respective gas flow into each of the plurality of process tubes.
1 . An apparatus for performing film deposition, the apparatus comprising:
an energy source, the energy source adapted to direct energy into a cylindrical space;
a plurality of process tubes, the plurality of process tubes passing through the cylindrical space; and
a gas manifold, the gas manifold operative to introduce a respective gas flow into each of the plurality of process tubes.
2 . The apparatus of claim 1 , wherein the energy source defines a wall of the cylindrical space.
3 . The apparatus of claim 1 , wherein the energy source comprises a resistively-heated heating element.
4 . The apparatus of claim 3 , wherein the resistively-heated heating element forms a coil around the cylindrical space.
5 . The apparatus of claim 1 , wherein the energy source comprises one or more heating lamps.
6 . The apparatus of claim 1 , wherein the energy source comprises an electrical coil operative to direct a magnetic field into the cylindrical space.
7 . The apparatus of claim 1 , wherein the energy source comprises a plurality of separately controllable zones.
8 . The apparatus of claim 1 , wherein each of the plurality of process tubes terminates in a respective input port and a respective output port.
9 . The apparatus of claim 8 , wherein each of the input ports comprises a respective passage adapted to allow gases to be passed through the input port.
10 . The apparatus of claim 8 , wherein each of the output ports comprises a respective passage adapted to allow gases to be passed through the output port.
11 . The apparatus of claim 1 , wherein each of the plurality of process tubes comprises at least one of quartz and alumina.
12 . The apparatus of claim 1 , wherein the gas manifold is operative to determine a different respective composition for each of the respective gas flows introduced into each of the plurality of process tubes.
13 . The apparatus of claim 1 , wherein the gas manifold comprises one or more mass flow controllers.
14 . The apparatus of claim 1 , further comprising a first support block, the first support block defining a plurality of openings therein through which the plurality of process tubes pass.
15 . The apparatus of claim 14 , further comprising a second support block, the second support block defining a plurality of openings therein through which the plurality of process tubes pass, the second support block being spaced apart from the first support block.
16 . The apparatus of claim 15 , wherein the first support block and the second support block define opposing ends of the cylindrical space.
17 . The apparatus of claim 1 , further comprising an exhaust manifold, the exhaust manifold operative to determine a different respective pressure for each of the plurality of process tubes.
18 . The apparatus of claim 17 , wherein the exhaust manifold is operative to reduce the respective pressures in each of the plurality of process tubes below atmospheric pressure.
19 . The apparatus of claim 17 , wherein the exhaust manifold comprises one or more vacuum pumps.
20 . A method for performing film deposition, the method comprising the steps of:
directing energy into a cylindrical space through which a plurality of process tubes pass; and
introducing a respective gas flow into each of the plurality of process tubes.