Retainer rings of chemical mechanical polishing apparatus and methods of manufacturing the same

1. A retainer ring of a chemical mechanical polishing apparatus utilizing a slurry including particles, sizes of which particles are no larger than that of a particle having a maximum size, the retainer ring comprising:

a base portion having a ring shape, the base portion including a pressurizing surface and a combining surface opposite the pressurizing surface;

slurry inflowing portions on the pressurizing surface of the base portion, the slurry inflowing portions having groove shapes; and

minute grooves at least on a surface portion of the slurry inflowing portions,

wherein a width of each minute groove is so dimensioned as to be smaller than ten times a diameter of the particle having the maximum size included in the slurry and is greater than a diameter of a water molecule.

2. The retainer ring as claimed in claim 1 , wherein the width of each minute groove is so dimensioned as to be smaller than the diameter of the particle having the maximum size included in the slurry.

3. The retainer ring as claimed in claim 1 , wherein the minute grooves are arranged in parallel to each other, the minute grooves having line shapes extending from an outer circumference to an inner circumference of the base portion.

4. The retainer ring as claimed in claim 1 , wherein a distance between the minute grooves is so dimensioned as to be smaller than ten times the diameter of the particle having the maximum size included in a slurry.

5. The retainer ring as claimed in claim 4 , wherein the distance between adjacent minute grooves is so dimensioned as to be smaller than the diameter of the particle having the maximum size included in the slurry.

6. The retainer ring as claimed in claim 1 , wherein the slurry inflowing portions are disposed at a same distance along the base portion, the slurry inflowing portions having line shapes extending from an outer circumference to an inner circumference of the base portion.

7. The retainer ring as claimed in claim 1 , wherein the minute grooves are on a surface portion of the pressurizing surface between adjacent slurry inflowing portions.

8. The retainer ring as claimed in claim 1 , wherein the minute grooves are on a bottom portion and on a sidewall portion of the slurry inflowing portion of the base portion.

9. The retainer ring as claimed in claim 1 , wherein the minute grooves are only on a bottom portion of the slurry inflowing portion of the base portion.

10. The retainer ring as claimed in claim 1 , wherein the base portion includes engineering plastic.

11. A retainer ring of a chemical mechanical polishing apparatus utilizing a slurry including particles, sizes of which particles are no larger than that of a particle having a maximum size, the retainer ring comprising:

a base portion including a first surface and a second surface opposite each other;

slurry inflowing portions on the first surface of the base portion, the slurry inflowing portions being recesses in the first surface and being configured to pass slurry therethrough; and

a plurality of minute grooves on at least a bottom portion of each slurry inflowing portion, each minute groove having a same length as a corresponding slurry inflowing portion and a smaller width than the corresponding slurry inflowing portion.

12. The retainer ring as claimed in claim 11 , wherein a width of each minute groove is so dimensioned as to be smaller than a diameter of the particle having the maximum size included in the slurry, the width of the minute groove being measured along a perimeter of the base portion.

13. The retainer ring as claimed in claim 11 , wherein a depth of each minute groove is smaller than a corresponding minute groove width.

14. A method of manufacturing a retainer ring utilizing a slurry including particles, sizes of which particles are no larger than that of a particle having a maximum size, the method comprising:

forming a base portion having a ring shape, the base portion including a pressurizing surface and a combining surface opposite the pressurizing surface;

forming slurry inflowing portions on the pressurizing surface of the base portion, the slurry inflowing portions having groove shapes; and

forming minute grooves at least on a surface portion of the slurry inflowing portions,

wherein forming the minute grooves includes forming a width of the minute grooves so dimensioned as to be smaller than ten times a diameter of the particle having the maximum size included in the slurry and greater than a diameter of a water molecule.

15. The method as claimed in claim 14 , wherein forming the base portion includes:

forming a preliminary base portion having a ring shape by cutting and processing an engineering plastic; and

cutting and processing a surface portion of the preliminary base portion to form the base portion.

16. The method as claimed in claim 14 , wherein forming the slurry inflowing portions includes removing a portion of the pressurizing surface of the base portion.

17. The method as claimed in claim 14 , wherein forming the minute grooves includes forming a distance between the minute grooves so dimensioned as to be smaller than ten times the diameter of the particle having the maximum size included in the slurry.

18. The method as claimed in claim 14 , wherein forming the minute grooves includes performing a mechanical processing or a photolithography on the base portion.