IP Library Granted Patent US 8,481,361
Granted Patent B2
US 8,481,361 · App. 13/478,460 · Granted Jul 9, 2013

Methods of depositing antimony-comprising phase change material onto a substrate and methods of forming phase change memory circuitry

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Quick Facts
Patent No.
US 8,481,361
App. No.
13/478,460
Granted
Jul 9, 2013
Kind
B2
Abstract

A method of depositing an antimony-comprising phase change material onto a substrate includes providing a reducing agent and vaporized Sb(OR) 3 to a substrate, where R is alkyl, and forming there-from antimony-comprising phase change material on the substrate. The phase change material has no greater than 10 atomic percent oxygen, and includes another metal in addition to antimony.

Claims (23)

1. A method of depositing a phase-change material onto a substrate, comprising:

providing a vaporized compound consisting of Sb(OR) 3 to a substrate, where R is alkyl;

providing a reducing agent to the substrate;

utilizing the Sb(OR) 3 to form an antimony-comprising phase change material comprising no greater than 10 atomic percent oxygen.

2. The method of claim 1 wherein the phase change material comprises at least one additional metal.

3. The method of claim 1 wherein the reducing agent and the Sb(OR) 3 are provided at the same time.

4. The method of claim 3 wherein the reducing agent comprises one or more member of the group consisting of NH 3 , CH 2 O and CH 2 O 2 .

5. The method of claim 1 wherein the phase change material further comprises at least one of Ge and Te.

6. The method of claim 1 wherein the forming utilizes chemical vapor deposition.

7. The method of claim 1 wherein the forming the phase change material comprises:

forming a monolayer comprising Sb(OR)x onto the substrate, where x is less than 3; and

after forming the monolayer, providing the reducing agent to the monolayer to remove any OR ligand from the Sb.

8. A method of forming phase change memory circuitry, comprising:

forming an electrode material over the substrate;

providing a vaporized compound consisting of Sb(OR) 3 over the electrode material, where R is alkyl;

providing a reducing agent to the substrate;

forming an Sb-comprising phase change material utilizing the Sb(OR) 3 over the electrode material, the phase change material comprising less than 10 atomic percent oxygen; and

forming an outer electrode material over the phase change material.

9. The method of claim 8 the providing the reducing agent comprises providing the reducing agent over the electrode material.

10. The method of claim 9 wherein the Sb(OR) 3 and the reducing agent are provided at the same time.

11. The method of claim 9 wherein the reducing agent is provided after the Sb(OR) 3 .

12. The method of claim 8 wherein the phase change material comprises at least one additional metal.

13. The method of claim 12 wherein the at least one additional metal is selected from Te and Ge.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2016
From: MICRON TECHNOLOGY, INC
To: OVONYX MEMORY TECHNOLOGY, LLC
Reel/Frame 039974/0496 →