Spin-coatable liquid for formation of high purity nanotube films
View Patent ↗Certain spin-coatable liquids and application techniques are described, which can be used to form nanotube films or fabrics of controlled properties. A spin-coatable liquid for formation of a nanotube film includes a liquid medium containing a controlled concentration of purified nanotubes, wherein the controlled concentration is sufficient to form a nanotube fabric or film of preselected density and uniformity, and wherein the spin-coatable liquid comprises less than 1×10 18 atoms/cm 3 of metal impurities. The spin-coatable liquid is substantially free of particle impurities having a diameter of greater than about 500 nm.
1. An applicator liquid comprising:
a liquid medium containing a distribution of purified nanotubes; wherein said purified nanotubes are purified with a nitric acid reflux treatment,
wherein said purified nanotubes remain separate from one another without precipitation or flocculation for a time sufficient to apply said applicator liquid to a surface;
wherein said purified nanotubes are free of functionalization that deplete π electrons so that desired electrical properties of said purified nanotubes are maintained;
wherein said liquid medium is an electronics grade non-halogen solvent;
wherein said applicator liquid is free of surfactants and polymers.
2. The applicator liquid of claim 1 wherein the applicator liquid is free of particle impurities having a diameter of greater than about 300 nm.
3. The applicator liquid of claim 1 wherein the applicator liquid is free of particle impurities having a diameter of greater than about 100 nm.
4. The applicator liquid of claim 1 wherein the applicator liquid is free of particle impurities having a diameter of greater than about 45 nm.
5. The applicator liquid of claim 1 wherein said applicator liquid comprises less than about 10×10 18 atoms/cm 3 of metallic impurities.
6. The applicator liquid of claim 1 wherein the applicator liquid comprises less than about 1×10 18 atoms/cm 3 of metallic impurities.
7. The applicator liquid of claim 1 wherein the applicator liquid comprises less than about 15×10 18 atoms/cm 3 of metallic impurities.
8. The applicator liquid of claim 1 wherein the applicator liquid comprises less than about 1×10 18 atoms/cm 3 of metallic impurities.
9. The applicator liquid of claim 1 wherein the applicator liquid comprises less than about 15×10 10 atoms/cm 3 of transition metal impurities.
10. The applicator liquid of claim 1 wherein the applicator liquid comprises less than about 1×10 18 atoms/cm 3 of heavy metal impurities.
11. The applicator liquid of claim 1 wherein the applicator liquid comprises less than about 15×10 10 atoms/cm 3 of heavy metal impurities.
12. The applicator liquid of claim 1 wherein the applicator liquid comprises less than about 10×10 17 atoms/cm 3 of group I and group II element impurities.
13. The applicator liquid of claim 1 wherein the applicator liquid comprises less than about 15×10 10 atoms/cm 3 of group I and group II element impurities.
14. The applicator liquid of claim 1 wherein the liquid medium is selected for compatibility with an electronics manufacturing process.
15. The applicator liquid of claim 1 wherein the liquid medium comprises ethyl lactate.
16. The applicator liquid of claim 1 wherein the purified nanotubes comprise conductive nanotubes.
17. The applicator liquid of claim 1 wherein the purified nanotubes are single-walled nanotubes.
18. The applicator liquid of claim 1 wherein said applicator liquid is free of particle impurities having a diameter of greater than about 500 nm.