IP Library Granted Patent US 8,643,035
Granted Patent B2
US 8,643,035 · App. 13/489,158 · Granted Feb 4, 2014

Light emitting device and method of manufacturing the same

Inventors: Jong Wook Kim (Gyeonggi-do, KR); Hyun Kyong Cho (Seoul, KR); Gyu Chul Yi (Gyeongsangbuk-do, KR); Sung Jin An (Gyeongsangbuk-do, KR); Jin Kyoung Yoo (Gyeongsangbuk-do, KR); Young Joon Hong (Gyeongsangbuk-do, KR)
Assignee: LG Electronics Inc.
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Quick Facts
Patent No.
US 8,643,035
App. No.
13/489,158
Granted
Feb 4, 2014
Kind
B2
Abstract

A light emitting device and a method of manufacturing the same are disclosed. The light emitting device includes a buffer layer formed on a substrate, a nitride semiconductor layer including a first semiconductor layer, an active layer, and a second semiconductor layer, which are sequentially stacked on the buffer layer, a portion of the first semiconductor layer being exposed to the outside by performing mesa etching from the second semiconductor layer to the portion of the first semiconductor layer, and at least one nanocone formed on the second semiconductor layer.

Claims (35)

1. A light emitting device, comprising:

a conductive substrate;

a nitride semiconductor layer formed on the conductive substrate, the nitride semiconductor layer including a second semiconductor layer on the conductive substrate, an active layer on the second semiconductor layer, and a first semiconductor layer on the active layer;

a light extraction structure grown on the first semiconductor layer, wherein a portion of the first semiconductor layer is free of the light extraction structure; and

a first electrode located on the portion of the first semiconductor layer that is free of the light extraction structure.

2. The light emitting device of claim 1 , wherein the first electrode directly contacts with the first semiconductor layer.

3. The light emitting device of claim 1 , wherein the active layer includes InGaN, and at least one of the first semiconductor layer or the second semiconductor layer includes AlGaN.

4. The light emitting device of claim 1 , wherein the light extraction structure includes a plurality of cones.

5. The light emitting device according to claim 4 , wherein at least one of the cones is formed with a shape of a pyramid.

6. The light emitting device of claim 4 , wherein at least one of the cones is a nano scale cone.

7. The light emitting device of claim 6 , wherein the nano scale cone has a size of 10 nm to 1000 nm.

8. The light emitting device of claim 4 , wherein the first electrode is not overlapped with the cones.

9. The light emitting device of claim 1 , wherein the conductive substrate includes Cu.

10. The light emitting device of claim 1 , wherein the conductive substrate includes an ohmic layer disposed on a conductive support layer.

11. The light emitting device of claim 10 , wherein the conductive support layer includes a soft metal and a hard metal.

12. The light emitting device of claim 10 , wherein the ohmic layer includes a metal.

13. The light emitting device of claim 12 , wherein the metal includes Ni.

14. The light emitting device of claim 10 , wherein the ohmic layer has a specific contact resistance of 10 −3 to 10 −4 Ωcm 2 .

15. A light emitting device, comprising:

a conductive substrate;

a nitride semiconductor layer formed on the conductive substrate, the nitride semiconductor layer including a second semiconductor layer on the conductive substrate, an active layer on the second semiconductor layer, and a first semiconductor layer on the active layer;

a light extraction structure grown on a first portion of first semiconductor layer; and

a first electrode located on a second portion of the first semiconductor layer.

16. The light emitting device of claim 15 , wherein the first portion is not overlapped with the second portion.

17. The light emitting device of claim 15 , wherein the first electrode directly contacts with the first semiconductor layer.

18. The light emitting device of claim 15 , wherein the active layer includes InGaN, and at least one of the first semiconductor layer or the second semiconductor layer includes AlGaN.

19. The light emitting device of claim 16 , wherein the conductive substrate includes an ohmic layer disposed on a conductive support layer, the ohmic layer includes a metal and the conductive substrate includes a soft metal and a hard metal.

20. The light emitting device of claim 19 , wherein the metal of the ohmic layer includes Ni, and the conductive substrate includes Cu.

21. The light emitting device of claim 1 , wherein the light extraction structure and the first electrode are disposed on the one plane of the first semiconductor layer.

22. The light emitting device of claim 1 , wherein the light extraction structure rises above a lower surface of the first electrode.

23. The light emitting device of claim 22 , wherein the light extraction surface rises above at least halfway of the first electrode.

24. The light emitting device of claim 22 , wherein the light extraction surface rises to at least an upper surface of the first electrode.

25. The light emitting device of claim 15 , wherein the light extraction structure rises above a lower surface of the first electrode.

26. The light emitting device of claim 25 , wherein the light extraction surface rises above at least halfway of the first electrode.

27. The light emitting device of claim 25 , wherein the light extraction surface rises to at least an upper surface of the first electrode.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 25, 2025
From: LG ELECTRONICS INC.
To: SUZHOU LEKIN SEMICONDUCTOR CO., LTD.
Reel/Frame 072529/0173 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 25, 2021
From: LG INNOTEK CO., LTD.
To: SUZHOU LEKIN SEMICONDUCTOR CO., LTD.
Reel/Frame 056366/0335 →
Priority Claims (1)
KR 10-2006-0021443 · Mar 7, 2006 · national
Continuity (3)
Continuation 12731029 · Mar 24, 2010
Continuation 11707167 · Feb 16, 2007
Related Publication 20120241757A1 · Sep 27, 2012