Organic light emitting display device and method for manufacturing the same
Present invention is for an organic light emitting display device in which permeation of exterior moisture can be prevented, dark defects caused by foreign materials can be improved and lifespan can thus be improved by changing the structure and manufacturing method of thin film encapsulation layer, and a method for manufacturing the same, the organic light emitting display device includes the edge region of the thin film encapsulation layer is thicker than the active region thereof and the thin film encapsulation layer includes a plurality of organic film and a plurality of inorganic film, the organic film and the inorganic film being laminated one on top of the other.
1. An organic light emitting display device having an active region and an edge region, comprising:
a substrate in which the active region and the edge region are defined;
an organic light emitting element array formed in the active region; and
a thin film encapsulation layer to cover the organic light emitting element array, wherein the thin film encapsulation layer is thicker in the edge region than in the active region, and the thin film encapsulation layer includes a plurality of organic films and a plurality of inorganic films, the organic films and the inorganic films being laminated in an alternating manner,
wherein among the inorganic films and the organic films of the thin film encapsulation layer, only the organic films are formed to be thicker in the edge region than in the active region.
2. The organic light emitting display device according to claim 1 , wherein the thin film encapsulation layer is flatly formed in the active region.
3. The organic light emitting display device according to claim 1 , wherein a diameter of a thicker region of the organic film in the edge region is 10 μm to 5000 μm.
4. The organic light emitting display device according to claim 2 , wherein a thickness of the thin film encapsulation layer in the edge region is 1.2 to 2 times greater than a thickness of the thin film encapsulation layer in the active region.
5. The organic light emitting display device according to claim 1 , wherein lowermost and uppermost layers of the thin film encapsulation layer are the inorganic films.
6. The organic light emitting display device according to claim 1 , wherein a mesh edge of a screen mask for forming the organic films of the thin film encapsulation layer corresponds to a thicker area of the thin film encapsulation layer of the edge region.
7. A method for manufacturing an organic light emitting display device having an active region and an edge region, the method comprising:
preparing a substrate in which the active region and the edge region are defined;
forming an organic light emitting element array in the active region; and
forming a thin film encapsulation layer by laminating a plurality of organic films and a plurality of inorganic films in an alternating manner, wherein the thin film encapsulation layer covers the organic light emitting element array and the thin film encapsulation layer is thicker in the edge region than the active region,
wherein among the inorganic films and the organic films of the thin film encapsulation layer, only the organic films are formed to be thicker in the edge region than in the active region.
8. The method according to claim 7 , wherein in the step of forming the thin film encapsulation layer, the organic films of the thin film encapsulation layer are formed by screen printing using a screen mask having a mesh corresponding to the edge region.
9. The method according to claim 8 , wherein the mesh edge of the screen mask corresponds to a thicker edge region of the thin film encapsulation layer.
10. The method according to claim 8 , wherein in the step of forming the thin film encapsulation layer, the screen mask is used for formation of all of the organic films of the thin film encapsulation layer.
11. The method according to claim 7 , wherein in the step of forming the thin film encapsulation layer, the thin film encapsulation layer is flatly formed in the active region.
12. The method according to claim 7 , wherein a diameter of a thicker region of the organic film in the edge region is 10 μm to 5000 μm.
13. The method according to claim 11 , wherein after the step of forming the thin film encapsulation layer, a thickness of the thin film encapsulation layer in the edge region has a thickness 1.2 to 2 times greater than a thickness of the thin film encapsulation layer in the active region.
14. The method according to claim 7 , wherein lowermost and uppermost layers of the thin film encapsulation layer are the inorganic films.