Source collector, lithographic apparatus and device manufacturing method

1. A source collector apparatus for an extreme ultraviolet radiation lithographic apparatus wherein the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation, the source collector apparatus comprising:

an enclosing structure constructed and arranged to define a closed loop flow path for a buffer gas in the enclosing structure;

a pump constructed and arranged to force the buffer gas through the closed loop flow path; and

a gas decomposer constructed and arranged to decompose a compound of fuel material and buffer gas material, and to feed back into the closed loop flow path at least a portion of said buffer gas material,

wherein the gas decomposer comprises a pipe surrounding at least one insert, and

wherein a characteristic length between a surface of the insert and a surface of the pipe at a cross-section of the decomposer is equal to a diffusion length of the compound of fuel material.

2. The source collector apparatus of claim 1 , wherein the enclosing structure comprises a chamber in fluid communication with a guide way external to the chamber, and wherein the pump and the gas decomposer are positioned in the guide way.

3. The source collector apparatus of claim 2 , wherein the gas decomposer is positioned upstream of the pump.

4. The source collector apparatus of claim 3 , wherein a heat exchanger constructed and arranged to remove heat from gas flowing in said flow path is positioned between the gas decomposer and the pump.

5. The source collector apparatus of claim 4 , wherein a supplementary gas decomposer is positioned in the guide way downstream of the pump.

6. The source collector apparatus of claim 5 , wherein a second heat exchanger constructed and arranged to provide heat to gas flowing in said flow path is positioned in the guide way between the supplementary gas decomposer and the pump.

7. The source collector apparatus of claim 6 , wherein a third heat exchanger constructed and arranged to remove heat from gas flowing in said flow path is positioned in the guide way downstream of the supplementary gas decomposer.

8. The source collector apparatus of claim 3 , wherein the guide way includes an outlet between the pump and the gas decomposer and an abatement system in fluid connection with the outlet and constructed and arranged to provide and control a flow of gas exiting the enclosing structure.

9. The source collector apparatus of claim 1 , wherein the enclosing structure is formed with an inlet connected to a buffer gas source.

10. The source collector apparatus of claim 1 , wherein the fuel comprises tin and the buffer gas comprises hydrogen.

11. The source collector apparatus of claim 10 , wherein the compound is a tin hydride.

12. The source collector apparatus of claim 10 , wherein the gas decomposer comprises a structure maintained at a temperature above 232° C.

13. The source collector apparatus of claim 12 , wherein the structure comprises a reservoir and drain.

14. The source collector apparatus of claim 1 , wherein the insert is a twisted insert.

15. A lithographic apparatus comprising:

a source collector apparatus comprising

an enclosing structure constructed and arranged to define a closed loop flow path for a buffer gas in the enclosing structure,

a pump constructed and arranged to force the buffer gas through the closed loop flow path,

a gas decomposer constructed and arranged to decompose a compound of fuel material and buffer gas material, and to feed back into the closed loop flow path at least a portion of said buffer gas material, wherein the gas decomposer comprises a pipe surrounding at least one insert, and wherein a characteristic length between a surface of the insert and a surface of the pipe at a cross-section of the decomposer is equal to a diffusion length of the compound of fuel material, and

a collector constructed and arranged to collect extreme ultraviolet radiation emitted by a plasma formed from the fuel material;

an illumination system configured to condition the collected extreme ultraviolet radiation and form a radiation beam;

a support structure constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

a substrate table constructed to hold a substrate; and

a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

16. A device manufacturing method comprising:

generating extreme ultraviolet radiation by exciting a fuel to provide a plasma emitting the radiation;

collecting the radiation with a reflective collector in a source collector apparatus;

forcing a buffer gas through a closed loop flow path which traverses an area between the collector and the radiation emitting plasma;

decomposing a compound of fuel material and buffer gas material in a gas decomposer comprising a pipe surrounding at least one insert, wherein a characteristic length between a surface of the insert and a surface of the pipe at a cross-section of the decomposer is equal to a diffusion length of the compound of fuel material;

feeding back into the closed loop flow path at least a portion of said buffer gas material;

patterning the collected radiation into a patterned beam of radiation; and

projecting the patterned beam of radiation onto a substrate.

17. The method of claim 16 , wherein the fuel comprises tin and the buffer gas comprises hydrogen.

18. The method of claim 17 , wherein the compound is a tin hydride.