Generation of combinatorial patterns by deliberate tilting of a polymer-pen array
The disclosure relates to a method of forming a pattern having pattern elements with a plurality of sizes on a substrate surface with a tilted pen array that includes choosing a tilt geometry for a pen array with respect to a substrate, inducing the tilt geometry between the pen array and the substrate surface, and forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes. For example, the tilt geometry is in reference to the substrate surface and comprises a first angle with respect to a first axis of the substrate and a second angle with respect to a second axis of the substrate, the second axis being perpendicular to the first axis, and at least one of the first and second angles being non-zero.
1. A method of forming a pattern comprising pattern elements with a plurality of sizes on a substrate surface with a tilted pen array, comprising:
choosing a tilt geometry for a pen array with respect to a substrate surface,
the tilt geometry being in reference to a substrate surface and comprising a first angle of the pen array with respect to a first axis of the substrate and a second angle of the pen array with respect to a second axis of the substrate, the first and second axes being parallel to the substrate surface and perpendicular to one another, at least one of the first and second angles being non-zero, wherein a leveled position with respect to the substrate surface comprises first and second angles both equaling 0°, and
the pen array comprising a plurality of tips fixed to a common substrate layer, the plurality of tips and the common substrate layer being formed from an elastomeric polymer or elastomeric gel polymer, and the tips having a radius of curvature of less than 1 μm;
inducing the tilt geometry between the pen array and the substrate surface by the chosen first and second angles; and
forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes.
2. A method of forming a pattern comprising pattern elements with a plurality of sizes on a substrate surface with a tilted pen array, comprising:
choosing a range of pattern element sizes for a pattern to be formed on a substrate surface;
choosing, based on a theoretical model, a tilt geometry for a pen array with respect to the substrate surface to achieve the chosen range of pattern element sizes,
the tilt geometry being in reference to a substrate surface and comprising a first angle of the pen array with respect to a first axis of the substrate and a second angle of the pen array with respect to a second axis of the substrate, the first and second axes being parallel to the substrate surface and perpendicular to one another, at least one of the first and second angles being non-zero, wherein a leveled position with respect to the substrate surface comprises first and second angles both equaling 0°, and
the pen array comprising a plurality of tips fixed to a common substrate layer, the plurality of tips and the common substrate layer being formed from an elastomeric polymer or elastomeric gel polymer, and the tips having a radius of curvature of less than 1 μm;
inducing the tilt geometry between the pen array and the substrate surface by the chosen first and second angles; and
forming the pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes and comprises the chosen range of pattern element sizes.
3. The method of claim 2 , wherein the theoretical model predicts a pattern element size generated by each tip based a combination of the first and second angles, a spacing between tips of the tip array, an edge length of a top surface of the tip, an edge length at a bottom surface of the tip, a height of the tip, a compression modulus of the elastomeric polymer, a number of tips from a first tip to contact the substrate surface the tip is spaced in the first axis, and a number of tips from a first tip to contact the substrate surface the tip is spaced in the second axis.
4. The method of claim 1 , comprising inducing the tilt geometry between the pen array and the substrate surface by tilting the pen array and maintaining the substrate surface stationary.
5. The method of claim 4 , comprising tilting the pen array by providing a motor-controlled, multi-axis stage attached to the pen array, and controlling the degree of extension of one or more motors to induce the desired tilt angles.
6. The method of claim 1 , further comprising coating the pen array with a patterning composition, wherein forming the pattern comprises contacting the substrate surface with the tilted pen array to deposit the patterning composition onto the substrate surface.
7. The method of claim 6 , comprising contacting the substrate surface with the tilted pen array such that all of the plurality of tips of the pen array contact the substrate surface and deform, whereby deformation of the plurality of tips varies across the pen array along the tilted axis or axes.
8. The method of claim 6 , wherein the patterning composition comprises a biomaterial having an activity, and further comprising selecting a patterning composition formulation to preserve the activity of the biomaterial when depositing the patterning composition onto the substrate surface.
9. The method of claim 6 , wherein the patterning composition is free of exogenous patterning composition carriers.
10. The method of claim 6 , wherein coating the pen array with a patterning composition comprises adsorbing and/or absorbing the patterning composition onto the tip array.
11. The method of claim 6 , wherein the patterning composition is a metal nanoparticle-forming patterning composition, and the pattern is an array of nanoparticles, the method further comprising catalyzing a reaction using the array of nanoparticles; and analyzing the array of nanoparticles to determine a nanoparticle size which exhibits the highest catalytic activity.
12. The method of claim 11 , wherein the metal nanoparticle-forming patterning composition comprises a metal nanoparticle precursor material or pre-formed metal nanoparticles.
13. The method claim 1 , wherein said forming comprises irradiating at least one tip of the pen array with a radiation source to transmit radiation through the at least one tip and out a tip end disposed opposite the common substrate layer; and exposing a portion of the substrate surface with the transmitted radiation.
14. The method of claim 1 , wherein the pattern elements have a dot size or line width of less than 900 nm.
15. The method of claim 1 , wherein the pattern elements have a dot size or line width of less than 100 nm.
16. The method of claim 1 , comprising inducing a tilt geometry comprising either or both of the first and second angles in a range of −20° to 20°.
17. The method of claim 1 , comprising inducing a tilt geometry comprising either or both of the first and second angles in a range of −6° to 6°.
18. The method of claim 1 , comprising inducing a tilt geometry comprising both the first and second angles as non-zero values.
19. The method of claim 1 , comprising choosing one of the first and second angles to be 0°.
20. The method of claim 1 , wherein the size of the pattern elements differs by a value in a range of about 10 nm to about 100 μm.
21. The method of claim 1 , wherein adjacent tips of the pen array have a tip-to-tip spacing and thereby forming a spacing between adjacent pattern elements substantially equal to the tip-to-tip spacing between adjacent tips of the pen array.
22. The method of claim 1 , wherein the plurality of tips are pyramidal.
23. The method of claim 1 , wherein the plurality of tips are arranged in a regular periodic pattern.
24. The method of claim 1 comprising leveling the pen array to the leveled position with respect to the substrate surface prior to inducing the tilt geometry.