IP Library Granted Patent US 8,993,961
Granted Patent B2
US 8,993,961 · App. 13/522,132 · Granted Mar 31, 2015

Electric charged particle beam microscope and electric charged particle beam microscopy

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Quick Facts
Patent No.
US 8,993,961
App. No.
13/522,132
Granted
Mar 31, 2015
Kind
B2
Abstract

The electric charged particle beam microscope includes an electric charged particle source; a condenser lens converging electric charged particles emitted from the electric charged particle source on a specimen; a deflector scanning the converged electric charged particles over the specimen; a control unit of the deflector; a specimen stage on which the specimen is mounted; a detector detecting the electric charged particles; a computer forming an image from a control signal from the deflector and an output signal from the detector; and a display part connected with the computer. The control unit of the deflector can change the scan rate of the electric charged particles. A first rate scan image is obtained at a first rate and a second rate scan image is obtained at a second rate slower than the first rate.

Claims (62)

1. An electric charged particle beam microscope comprising:

an electric charged particle source;

a condenser lens converging electric charged particles emitted from the electric charged particle source on a specimen;

a deflector deflecting the converged electric charged particles to scan the specimen;

a control unit of the deflector;

a specimen stage on which the specimen is mounted;

a detector detecting the electric charged particles;

a computer forming an image from a control signal from the deflector and an output signal from the detector; and

a display part connected with the computer, wherein

the control unit of the deflector can change the scan rate of the electric charged particles,

a first rate scan image is obtained at a first rate and a second rate scan image is obtained at a second rate slower than the first rate, and

the electric charged particle beam microscope further comprises an analysis unit measuring the distortion of the second rate scan image by using the first rate scan image and compensating for the distortion.

2. The electric charged particle beam microscope according to claim 1 , wherein

the analysis unit divides the first rate scan image and the second rate scan image into small domains, respectively,

the analysis unit measures image shift amounts between the small domains of the first rate scan image and the small domains of the second rate scan image by pattern matching, and

the analysis unit determines the distortion from the distribution of the image shift amounts.

3. The electric charged particle beam microscope according to claim 1 , wherein

the analysis unit divides the first rate scan image and the second rate scan image into small domains, respectively,

the analysis unit measures image shift amounts and correlative values between the small domains of the first rate scan image and the small domains of the second rate scan image by pattern matching,

the analysis unit omits the image shift amount whose correlative value is equal to or lower than a threshold, and

the omitted image shift amount is interpolated based on image shift amounts of small domains in the neighborhood of the small domain whose image shift amount is omitted.

4. An electric charged particle beam microscope comprising:

an electric charged particle source;

a condenser lens converging electric charged particles emitted from the electric charged particle source on a specimen;

a deflector scanning the converged electric charged particles over the specimen;

a control unit of the deflector;

a specimen stage on which the specimen is mounted;

a detector detecting the electric charged particles;

a computer forming an image from a control signal from the deflector and an output signal from the detector; and

a display part connected with the computer, wherein

the control unit of the deflector can change the scan rate of the electric charged particles,

a first rate scan image is obtained at a first rate and a second rate scan image is obtained at a second rate slower than the first rate, and

the display part displays the distortion of the second rate scan image obtained by using the first rate scan image.

5. The electric charged particle beam microscope according to claim 4 , wherein

it can be determined whether the image distortion of the second rate scan image needs to be compensated for or not based on the image distortion.

6. The electric charged particle beam microscope according to claim 4 , further comprising

an analysis unit measuring and compensating for the distortion, wherein

the analysis unit divides the first rate scan image and the second rate scan image into small domains, respectively,

the analysis unit measures image shift amounts between the small domains of the first rate scan image and the small domains of the second rate scan image by pattern matching, and

the analysis unit determines the distortion from the distribution of the image shift amounts.

7. The electric charged particle beam microscope according to claim 4 , further comprising

an analysis unit measuring and compensating for the distortion, wherein

the analysis unit divides the first rate scan image and the second rate scan image into small domains, respectively,

the analysis unit measures image shift amounts and correlative values between the small domains of the first rate scan image and small domains of the second rate scan image by pattern matching,

the analysis unit omits the image shift amount whose correlative value is equal to or lower than a threshold, and

the omitted image shift amount is interpolated based on image shift amounts of small domains in the neighborhood of the small domain whose image shift amount is omitted.

8. An electric charged particle beam microscopy that scans electric charged particles over a specimen and forms an image based on a secondary signal emitted from the specimen, comprising:

a first step of scanning at a first rate to form an image;

a second step of scanning at a second rate slower than the first rate to form an image;

a third step of measuring distortion of the second rate scan image by using the first rate scan image; and

a fourth step of compensating for the distortion of the second rate scan image based on the measured distortion.

9. The electric charged particle beam microscopy according to claim 8 , wherein

the third step includes:

a step of dividing the first rate scan image and the second rate scan image into small domains, respectively;

a step of measuring image shift amounts between the small domains of the first rate scan image and small domains of the second rate scan image by pattern matching; and

a step of determining the distortion from the distribution of the image shift amounts.

10. The electric charged particle beam microscopy according to claim 8 , wherein

the third step includes:

a step of dividing the first rate scan image and the second rate scan image into small domains, respectively;

a step of measuring image shift amounts and correlative values between the small domains of the first rate scan image and small domains of the second rate scan image by pattern matching;

a step of omitting the image shift amount whose correlative value is equal to or lower than a threshold; and

a step of interpolating the omitted image shift amount based on image shift amounts of small domains in the neighborhood of the small domain whose image shift amount is omitted.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 13, 2012
From: TSUNETA, RURIKO; KIKUCHI, HIDEKI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 028545/0397 →