SiGe based gate driven PMOS trigger circuit
View Patent ↗Some embodiments of the present disclosure relate to a low-power, area efficient ESD protection device that provides ESD protection to an ESD susceptible circuit. The ESD protection device has a trigger circuit with a resistor. The resistor has a first terminal connected to the first external pin and a second terminal connected directly to a gate of a SiGe based PMOS shunt transistor. The trigger circuit generates a trigger signal that drives the gate of the PMOS device to shunt power away from the ESD susceptible circuit when an ESD event is present. The SiGe based PMOS shunt transistor has a lower gate leakage than a conventional NMOS shunt transistors, thereby providing for an ESD circuit with a low leakage current at small gate lengths.
1. An integrated chip, comprising:
an electrostatic discharge (ESD) susceptible circuit electrically connected to a first circuit node having a first voltage and a second circuit node having a second voltage; and
an ESD protection device, configured to act as an interface between the ESD susceptible circuit and external integrated chip pins, comprising:
a trigger circuit comprising a resistive element having a first terminal connected to the first circuit node and a second terminal directly connected to a trigger circuit output node, and a capacitive element having a first terminal directly connected to the trigger circuit output node and a second terminal connected to the second circuit node; and
a voltage controlled shunt network comprising a silicon germanium (SiGe) PMOS shunt transistor with a source connected to the first circuit node, a drain connected to the second circuit node, and a gate connected directly to the trigger circuit output node.
2. The integrated chip of claim 1 , wherein the capacitive element comprises a gate capacitance of the SiGe PMOS shunt transistor.
3. The integrated chip of claim 1 , wherein the capacitive element comprises a MOS capacitor having a source and drain connected to the drain of the SiGe PMOS shunt transistor, a gate connected to the resistive element, and a body connected to a third circuit node comprising a ground terminal.
4. The integrated chip of claim 1 , further comprising:
a timing delay circuit having an input node connected to the trigger circuit output node, wherein the timing delay circuit is configured to selectively connect the trigger circuit output node to a ground terminal when an ESD event is present so as to extend a turn-on-time of the SiGe PMOS shunt transistor.
5. The integrated chip of claim 4 , wherein the timing delay circuit comprises:
an inverter having a first inverting element and a second inverting element arranged in series between the first circuit node and the second circuit node, wherein an input node of the inverter is connected to the trigger circuit output node; and
an NMOS transistor having a gate connected to an output terminal of the inverter, a drain connected to the trigger circuit output node, and a source connected to the second circuit node.
6. The integrated chip of claim 5 , wherein
the first inverting element comprises a PMOS transistor having a source to body connection; and
the second inverting element comprises an NMOS transistor having a source to body connection.
7. The integrated chip of claim 1 , wherein the SiGe PMOS shunt transistor comprises:
a source region comprising a first, p-type SiGe region within an n-type substrate;
a drain region comprising a second, p-type SiGe region within the n-type substrate;
a channel region extending between the first and second p-type SiGe regions;
a gate electrode located over the channel region, and separated from the channel region by a gate oxide; and
a first metal interconnect layer configured to connect the gate electrode to a polysilicon resistor or an oxide definition resistor that comprises the resistive element.
8. The integrated chip of claim 1 , wherein the SiGe PMOS shunt transistor comprises a source to body connection.
9. The ESD protection device of claim 1 , wherein the first terminal of the capacitive element is the gate of the SiGe PMOS shunt transistor.
10. The ESD protection device of claim 1 , wherein the trigger circuit consists of the trigger circuit output node, the resistive element, and the capacitive element.
11. An electrostatic discharge (ESD) protection device to protect a circuit, which is electrically connected to first and second circuit nodes, from an ESD event, the ESD protection device comprising:
a first electrical path extending between first and second circuit nodes and having a trigger circuit comprising a resistive element and a capacitive element connected to one another at a trigger circuit output node;
a second electrical path extending between the first and second circuit nodes and comprising a silicon germanium (SiGe) PMOS shunt transistor with a source connected to the first circuit node, a drain connected to the second circuit node, and a gate connected directly to the trigger circuit output node; and
a timing delay circuit having an input node connected to the trigger circuit output node, wherein the timing delay circuit is configured to selectively connect the trigger circuit output node to a ground terminal when the ESD event is present so as to extend a turn-on-time of the SiGe PMOS shunt transistor.
12. The ESD protection device of claim 11 , wherein the capacitive element comprises a gate capacitance of the SiGe PMOS shunt transistor, such that a section of the first electrical path is coincident with a section of the second electrical path.
13. The ESD protection device of claim 11 ,
wherein the first electrical path is in parallel with the second electrical path; and
wherein the capacitive element comprises a MOS capacitor having a source and drain connected to the drain of the SiGe PMOS shunt transistor, a gate connected to the resistive element, and a body connected to a third circuit node comprising a ground terminal.
14. The ESD protection device of claim 11 , wherein the timing delay circuit comprises:
an inverter having a first inverting element and a second inverting element arranged in series between the first circuit node and the second circuit node, wherein the inverter is configured to receive a trigger signal from the trigger circuit; and
an NMOS transistor having a gate connected to an output terminal of the inverter, a drain connected to the trigger circuit output node, and a source connected to the second circuit node.
15. The ESD protection device of claim 11 , wherein the SiGe PMOS shunt transistor comprises:
a source region comprising a first, p-type SiGe region within an n-type substrate;
a drain region comprising a second, p-type SiGe region within the n-type substrate;
a channel region extending between the first and second p-type SiGe regions;
a gate electrode located over the channel region, and separated from the channel region by a gate oxide; and
a first metal interconnect layer configured to connect the gate electrode to a polysilicon resistor comprising the resistive element.
16. A method of forming an ESD protection device, comprising:
providing an electrostatic discharge (ESD) susceptible circuit electrically connected to a first circuit node having a first voltage and a second circuit node having a second voltage;
providing a trigger circuit comprising:
a resistive element having a first terminal connected to the first circuit node and a second terminal directly connected to a trigger circuit output node;
a capacitive element having a first terminal directly connected to the trigger circuit output node and a second terminal connected to the second circuit node; and
directly connecting a gate of a SiGe PMOS shunt transistor to the trigger circuit output node so that the gate of the SiGe PMOS shunt transistor receives a voltage value that is substantially equal to a voltage value at the trigger circuit output node.
17. The method of claim 16 , wherein the SiGe PMOS shunt transistor comprises a source to body connection.
18. The method of claim 16 , wherein the capacitive element comprises a gate capacitance of the SiGe PMOS shunt transistor.
19. The method of claim 16 , further comprising:
selectively connecting the trigger circuit output node to a ground terminal when an ESD event is present so as to extend a turn-on-time of the SiGe PMOS shunt transistor.
wherein the first terminal of the capacitive element is the gate of the SiGe PMOS shunt transistor.
20. An electrostatic discharge (ESD) protection device to protect a circuit, which is electrically connected to first and second circuit nodes, from an ESD event, the ESD protection device comprising:
a first electrical path extending between first and second circuit nodes and having a trigger circuit comprising a resistive element and a capacitive element connected to one another at a trigger circuit output node;
a second electrical path extending between the first and second circuit nodes and comprising a PMOS shunt transistor with a source connected to the first circuit node, a drain connected to the second circuit node, and a gate connected to the trigger circuit output node; and
a timing delay circuit having an input node connected to the trigger circuit output node, wherein the timing delay circuit is configured to selectively connect the trigger circuit output node to a ground terminal when the ESD event is present so as to extend a turn-on-time of the PMOS shunt transistor.
21. The ESD protection device of claim 20 , wherein the timing delay circuit comprises:
a pull-up transistor having a source connected to the first circuit node and a gate connected to the trigger circuit output node;
a pull-down transistor having a source connected to the second circuit node, a drain connected to a drain of the pull-up transistor, and a gate connected to the trigger circuit output node; and
a transistor having a gate connected to the drain of the pull-up transistor and the drain of the pull-down transistor, a drain connected to the trigger circuit output node, and a source connected to the second circuit node.