Layout method and system for multi-patterning integrated circuits
A method identifies, as an independent node, any node representing a circuit pattern in any odd loop of a layout of a region of a layer of an IC that is not included in any other odd loop of the layout. The layer is to have a plurality of circuit patterns to be patterned using at least three photomasks. The method identifies, as a safe independent node, any independent node not closer than a threshold distance from any other independent nodes in another odd loop of the layout. The layout is modified, if the circuit patterns in the layout include any odd loop without any safe independent node, so that that after the modifying, each odd loop has at least one safe independent node.
1. A method comprising:
(a) using a programmed computer to generate a graph of a layout of at least a region in a layer of an integrated circuit (IC), where the layer is to have a plurality of circuit patterns to be patterned using at least three photomasks, the graph including nodes representing circuit patterns within the layout, the nodes connected to one another by edges representing respective separations between adjacent ones of the circuit patterns, wherein the separations are smaller than a threshold distance, and the graph has two or more loops;
(b) checking whether any of the nodes within the graph having two or more loops is included in a respective single odd loop of the graph, and identifying each node that is included in a single odd loop as an independent node;
(c) identifying, as a safe independent node, any said independent node not closer than a threshold distance from any other one of said independent nodes in another odd loop of the graph; and
(d) using the programmed computer to check each odd loop of the graph to determine whether each odd loop has a safe independent node, and modify the layout, if the graph representing the circuit patterns in the layout includes any odd loop without any safe independent node, so that after the modifying, each odd loop in a graph of the modified layout has at least one safe independent node.
2. The method of claim 1 , further comprising:
(e) assigning and storing photomask assignments of the circuit patterns in a non-transitory machine readable storage medium for use in a design verification or photomask fabrication process for use in a multi-patterning IC fabrication process using the at least three photomasks.
3. The method of claim 2 , wherein step (e) comprises:
identifying any odd loop of the layout of the layer of the IC having at least one safe independent node;
assigning a respective circuit pattern represented by a single one of the at least one safe independent node in each identified odd loop to a first one of the at least three photomasks, such that each circuit pattern assigned to the first photomask has no design rule violation.
4. The method of claim 3 , wherein the multi-patterning process is a triple patterning process, and step (e) further comprises:
assigning each remaining circuit pattern in the layout to the second and third of the three photomasks using a double patterning mask assignment technique.
5. The method of claim 4 , wherein step (e) further comprises:
re-assigning one of the remaining circuit patterns from one of the second and third photomasks to the first photomask, so long as each circuit pattern assigned to the first photomask has no design rule violation.
6. The method of claim 4 , wherein step (e) further comprises:
re-assigning one of the remaining circuit patterns from one of the three photomasks to another of the three photomasks, so as to more evenly distribute a total area of circuit patterns in the layout of the layer of the IC among the three photomasks.
7. The method of claim 1 , wherein step (d) includes shifting or re-routing at least one of the circuit patterns of the layout of the layer of the IC.
8. The method of claim 1 , wherein step (d) includes inserting a stitch in at least one of the circuit patterns of the layout of the layer of the IC.
9. The method of claim 8 , wherein the stitch is inserted in a circuit pattern of the odd loop without any safe independent node, so as to change that odd loop into an even loop.
10. The method of claim 1 , further comprising before step (d):
causing a display device to display the graph of the layout of the layer of the IC with an indication identifying the odd loop without any safe independent node.
11. A non-transitory computer readable storage medium encoded with computer program instructions, such that when the computer program instructions are executed by a computer, the computer performs the method comprising:
(a) generating, in the computer, a graph of a layout of at least a region in a layer of an integrated circuit (IC), where the layer is to have a plurality of circuit patterns to be patterned using at least three photomasks, the graph including nodes representing circuit patterns within the layout, the nodes connected to one another by edges representing respective separations between adjacent ones of the circuit patterns, wherein the separations are smaller than a threshold distance, and the graph has two or more loops;
(b) checking whether any of the nodes within the graph having two or more loops which is included in a respective single odd loop of the graph, and identifying each node that is included in a single odd loop as an independent node;
(c) identifying, as a safe independent node, any said independent node not closer than a threshold distance from any other one of said independent nodes in another odd loop of the graph representing the layout of the layer of the IC; and
(d) checking each odd loop of the graph to determine whether each odd loop has a safe independent node, and modifying the layout of the layer of the IC, if the graph representing the circuit patterns in the layout includes any odd loop without any safe independent node, so that after the modifying, each odd loop in a graph of the modified layout has at least one safe independent node.
12. The non-transitory computer readable storage medium of claim 11 , further comprising:
(e) assigning and storing photomask assignments of the circuit patterns in a non-transitory machine readable storage medium for use in a design verification or photomask fabrication process for use in a multi-patterning IC fabrication process using the at least three photomasks.
13. The non-transitory computer readable storage medium of claim 12 , wherein step (e) comprises:
identifying any odd loop of the graph having at least one safe independent node;
assigning a respective circuit pattern represented by a single one of the at least one safe independent node in each identified odd loop to a first one of the at least three photomasks, such that each circuit patterns assigned to the first photomask has no design rule violation.
14. The non-transitory computer readable storage medium of claim 13 , wherein the multi-patterning process is a triple patterning process, and step (e) further comprises:
assigning each remaining circuit pattern in the layout to the second and third of the three photomasks using a double patterning mask assignment technique.
15. The non-transitory computer readable storage medium of claim 14 , wherein step (e) further comprises:
re-assigning one of the remaining circuit patterns from one of the second and third photomasks to the first photomask, so long as each circuit pattern assigned to the first photomask has no design rule violation.
16. The non-transitory computer readable storage medium of claim 11 , wherein step (d) includes one of the group consisting of:
inserting a stitch in at least one of the circuit patterns of the layout of the layer of the IC, wherein the stitch is inserted in a circuit pattern represented by a node of the odd loop without any safe independent node, so as to change that odd loop into an even loop; and
shifting or re-routing at least one of the circuit patterns of the layout of the layer of the IC.
17. A system comprising:
a special purpose computer configured to generate a graph of a layout of at least a region in a layer of an integrated circuit (IC), where the layer is to have a plurality of circuit patterns to be patterned using at least three photomasks, the graph including nodes representing circuit patterns within the layout, the nodes connected to one another by edges representing respective separations between adjacent ones of the circuit patterns, wherein the separations are smaller than a threshold distance, and the graph has two or more loops;
the computer configured to checking whether any of the nodes within the graph having two or more loops is included in a respective single odd loop of the graph, and identifying each node that is included in a single odd loop as an independent node;
the computer configured to identify, as a safe independent node, any said independent node not closer than a threshold distance from any other one of said independent nodes in another odd loop of the graph;
the computer configured to check each odd loop of the graph to determine whether the graph representing the circuit patterns in the layout includes any odd loop without any safe independent node, and
the computer including a layout editor for modifying the layout of the layer of the IC, so that that after the modifying, each odd loop in a graph of the modified layout has at least one safe independent node.
18. The system of claim 17 , wherein the computer is configured to assign and store photomask assignments of the circuit patterns in a non-transitory machine readable storage medium for use in a design verification or photomask fabrication process for use in a multi-patterning IC fabrication process using the at least three photomasks.
19. The system of claim 18 , wherein the computer is configured for:
identifying any odd loop of the graph having two or more safe independent nodes; and
assigning a respective circuit pattern represented by a single one of the safe independent nodes in each identified odd loop to a first one of the at least three photomasks, such that each circuit patterns assigned to the first photomask has no design rule violation.
20. The system of claim 19 , wherein the multi-patterning process is a triple patterning process, and the computer is configured for:
assigning each remaining circuit pattern in the layout to the second and third of the three photomasks using a double patterning mask assignment technique.
21. The system of claim 20 , wherein the computer is configured for:
re-assigning one of the remaining circuit patterns from one of the second and third photomasks to the first photomask, so long as each circuit pattern assigned to the first photomask has no design rule violation.
22. The system of claim 18 , wherein the computer is configured to perform one of the group consisting of:
inserting a stitch in at least one of the circuit patterns of the layout of the layer of the IC, wherein the stitch is inserted in a circuit pattern of the odd loop without any safe independent node, so that odd loop in the graph of the layout is replaced by an even loop in the graph of the modified layout; and
shifting or re-routing at least one of the circuit patterns of the layout of the layer of the IC.