Non-planar inorganic optoelectronic device fabrication

1. A method of fabricating an optoelectronic device, the method comprising:

creating an optoelectronic structure on a first substrate, wherein the optoelectronic structure includes a release layer and a plurality of inorganic semiconductor layers supported by the release layer, the plurality of inorganic semiconductor layers being arranged in a stack and configured to be active in operation of the optoelectronic device;

attaching permanently the plurality of inorganic semiconductor layers to a second substrate via a cold weld bond with an electrode contact for the optoelectronic structure, the electrode contact being disposed on the first substrate before attaching the plurality of inorganic semiconductor layers to the second substrate, the second substrate being flexible;

transferring the plurality of inorganic semiconductor layers of the optoelectronic structure from the first substrate to the second substrate by releasing, via the release layer, the plurality of inorganic semiconductor layers from the first substrate after the attaching step; and

deforming the second substrate and the plurality of inorganic semiconductor layers to a non-planar configuration.

2. The method of claim 1 , wherein:

creating the optoelectronic structure comprises depositing the electrode contact over the plurality of inorganic semiconductor layers; and

attaching the plurality of inorganic semiconductor layers comprises:

depositing a metal contact on the second substrate; and

forming the cold weld bond between the electrode contact and the metal contact.

3. The method of claim 2 , wherein the metal contact has a pattern that matches a pattern of the electrode contact.

4. The method of claim 2 , wherein depositing the metal contact comprises depositing a plurality of metal islands on the second substrate.

5. The method of claim 2 , wherein depositing the electrode contact comprises depositing an interconnect coupled to the electrode contact, and wherein the interconnect comprises a strain relief section.

6. The method of claim 2 , wherein creating the optoelectronic structure further comprises:

forming the optoelectronic structure on a semiconductor substrate;

depositing an adhesion reduction layer on the first substrate;

depositing a further electrode contact on the adhesion reduction layer;

attaching the first substrate to the semiconductor substrate via a further cold weld bond between the further electrode contact and the optoelectronic structure; and

removing the semiconductor substrate with the optoelectronic structure remaining attached to the first substrate via the further cold weld bond.

7. The method of claim 1 , further comprising creating a further device structure on the first substrate coupled to the optoelectronic structure.

8. The method of claim 7 , further comprising depositing an interconnect between the optoelectronic structure and the further device structure before the attaching step.

9. The method of claim 1 , wherein the deforming step is implemented after the attaching and releasing steps.

10. The method of claim 1 , further comprising fabricating a feature of the optoelectronic device after the releasing step.

11. The method of claim 1 , wherein the plurality of inorganic semiconductor layers comprises a Group III-V semiconductor material.

12. The method of claim 1 , wherein creating the optoelectronic structure comprises growing an epitaxial photodetector structure.

13. The method of claim 1 , wherein releasing the plurality of inorganic semiconductor layers comprises implementing an epitaxial lift-off procedure.

14. The method of claim 1 , wherein the first substrate comprises a silicon-on-insulator substrate, a Group III-V semiconductor substrate, or a Group II-VI semiconductor substrate.

15. The method of claim 1 , wherein creating the optoelectronic structure comprises patterning the plurality of inorganic semiconductor layers to reveal an electrode contact area of an Ohmic contact layer of the plurality of inorganic semiconductor layers.

16. The method of claim 1 , wherein deforming the second substrate comprises heating the second substrate.

17. A method of fabricating an optoelectronic device, the method comprising:

creating an optoelectronic structure on a first substrate, wherein the optoelectronic structure includes a release layer and a plurality of inorganic semiconductor layers supported by the release layer, the plurality of inorganic semiconductor layers being configured to be active in operation of the optoelectronic device;

depositing a first metal contact on the optoelectronic structure, the first metal contact comprising an electrode contact for the optoelectronic structure;

depositing a second metal contact on a second substrate, the second substrate being flexible;

after depositing the first metal contact and after depositing the second metal contact, attaching the first and second substrates via a cold weld bond between the electrode and second metal contacts;

transferring the plurality of inorganic semiconductor layers of the optoelectronic structure from the first substrate to the second substrate by releasing, via the release layer, the plurality of inorganic semiconductor layers from the first substrate; and

deforming the second substrate and the plurality of inorganic semiconductor layers to a non-planar configuration.

18. The method of claim 17 , wherein creating the optoelectronic structure comprises:

forming the plurality of inorganic semiconductor layers on a semiconductor substrate; and

transferring the optoelectronic structure onto the first substrate from the semiconductor substrate before attaching the plurality of inorganic semiconductor layers to the second substrate.

19. The method of claim 17 , further comprising patterning the second metal contact on the second substrate before attaching the first and second substrates.

20. The method of claim 17 , wherein creating the optoelectronic structure comprises patterning the plurality of inorganic semiconductor layers to reveal an electrode contact area of an Ohmic contact layer of the plurality of inorganic semiconductor layers.

21. A method of fabricating an optoelectronic device, the method comprising:

creating an optoelectronic structure on a semiconductor substrate, wherein the optoelectronic structure includes a first release layer and a plurality of inorganic semiconductor layers supported by the first release layer, the plurality of inorganic semiconductor layers being configured to be active in operation of the optoelectronic device;

attaching the optoelectronic structure to a stamp substrate via a cold weld bond with an electrode contact for the optoelectronic structure, the electrode contact being disposed on the semiconductor substrate before attaching the optoelectronic structure to the stamp substrate, the stamp substrate comprising a second release layer;

transferring the plurality of inorganic semiconductor layers of the optoelectronic structure from the semiconductor substrate to the stamp substrate by removing the semiconductor substrate via the first release layer, while the optoelectronic structure remains attached to the stamp substrate via the cold weld bond;

attaching the optoelectronic structure to a flexible substrate after removing the semiconductor substrate;

releasing the plurality of inorganic semiconductor layers from the stamp substrate via the second release layer after attaching the optoelectronic structure to the flexible substrate; and

deforming the flexible substrate and the plurality of inorganic semiconductor layers to a non-planar configuration.

22. The method of claim 21 , further comprising:

depositing the first electrode contact over the second release layer of the stamp substrate; and

depositing and patterning a metal layer on the flexible substrate;

wherein attaching the optoelectronic structure to the flexible substrate comprises forming a further cold weld bond between the metal layer and a further electrode contact for the optoelectronic structure.