Apparatus and method for supporting a workpiece during processing
An apparatus for supporting a workpiece during processing of the workpiece is disclosed. The apparatus comprises: a chassis having a vacuum chamber that is connectable to a vacuum source; a supporting device rotatable relative to the chassis, the supporting device having a hollow compartment and a supporting surface for holding the workpiece; and at least one sealing device arranged between the chassis and the supporting device, to provide an air-tight seal between the chassis and the supporting device while allowing for rotation of the supporting device with respect to the chassis, so as to form a vacuum passage extending from the supporting surface of the supporting device through the hollow compartment of the supporting device and the vacuum chamber of the chassis to the vacuum source, to thereby hold the workpiece to the supporting surface of the supporting device during processing of the workpiece.
1. An apparatus for supporting a workpiece during processing of the workpiece, the apparatus comprising:
a chassis having a vacuum chamber that is connectable to a vacuum source; a supporting device rotatable relative to the chassis, the supporting device having a hollow compartment and a supporting surface for holding the workpiece; and
at least one sealing device arranged between the chassis and the supporting device, to provide an air-tight seal between the chassis and the supporting device while allowing for rotation of the supporting device with respect to the chassis, so as to form a vacuum passage extending from the supporting surface of the supporting device through the hollow compartment of the supporting device and the vacuum chamber of the chassis to the vacuum source, to thereby hold the workpiece to the supporting surface of the supporting device during processing of the workpiece,
wherein the at least one sealing device comprises:
a polymeric material; and
a biasing device arranged relative to the polymeric material to urge the polymeric material against the chassis and the supporting device to provide the air-tight seal therebetween.
2. The apparatus of claim 1 , wherein the at least one sealing device comprises a ring structure.
3. The apparatus of claim 1 , wherein the polymeric material is a polytetrafluroethylene (PTFE) based material.
4. The apparatus of claim 1 , wherein the polymeric material of each of the at least one sealing device has a generally U-shaped cross-section, and the biasing device of the sealing device is arranged within the generally U-shaped cross-section of the polymeric material to urge the sides of the U-shaped cross-section of the polymeric material against the chassis and the supporting device respectively.
5. The apparatus of claim 1 , further comprising an external sealing device and an internal sealing device,
wherein the open-end of the generally U-shaped cross-section of the polymeric material of the external sealing device being in fluid communication with the ambient environment for further urging the sides of the U-shaped cross-section of the polymeric material against the chassis and the supporting device respectively when the vacuum passage is formed, and the open-end of the generally U-shaped cross-section of the polymeric material of the internal sealing device being in fluid communication with the hollow compartment of the supporting device for further urging the sides of the U-shaped cross-section of the polymeric material against the chassis and the supporting device respectively when a positive pressure differential is formed between the hollow compartment of the supporting device and the vacuum chamber of the chassis, and the ambient environment.
6. An apparatus for singulating a semiconductor wafer, the apparatus comprising:
the apparatus of claim 1 ; and
a cutting device arranged relative to the apparatus of claim 1 , the cutting device being for singulating the semiconductor wafer as the semiconductor wafer is held to the supporting surface of the supporting device of the apparatus of claim 1 by the vacuum passage.
7. An apparatus for supporting a workpiece during processing of the workpiece, the apparatus comprising:
a chassis having a vacuum chamber that is connectable to a vacuum source;
a supporting device rotatable relative to the chassis, the supporting device having a hollow compartment and a supporting surface for holding the workpiece; and
an external sealing device and an internal sealing device arranged between the chassis and the supporting device, to provide an air-tight seal between the chassis and the supporting device while allowing for rotation of the supporting device with respect to the chassis, so as to form a vacuum passage extending from the supporting surface of the supporting device through the hollow compartment of the supporting device and the vacuum chamber of the chassis to the vacuum source, to thereby hold the workpiece to the supporting surface of the supporting device during processing of the workpiece,
wherein the external sealing device comprises:
a polymeric material having a generally U-shaped cross-section, the open-end of the generally U-shaped cross-section of the polymeric material being in fluid communication with the ambient environment for further urging the sides of the U-shaped cross-section of the polymeric material against the chassis and the supporting device respectively when the vacuum passage is formed; and
a biasing device arranged within the generally U-shaped cross-section of the polymeric material to urge the polymeric material against the chassis and the supporting device to provide the air-tight seal therebetween; and
wherein the internal sealing device comprises:
a polymeric material having a generally U-shaped cross-section, the open-end of the generally U-shaped cross-section of the polymeric material being in fluid communication with the hollow compartment of the supporting device for further urging the sides of the U-shaped cross-section of the polymeric material against the chassis and the supporting device respectively when a positive pressure differential is formed between the hollow compartment of the supporting device and the vacuum chamber of the chassis, and the ambient environment; and a biasing device arranged within the generally U-shaped cross-section of the polymeric material to urge the polymeric material against the chassis and the supporting device to provide the air-tight seal therebetween.
8. The apparatus of claim 7 , wherein each of the external and internal sealing devices comprises a ring structure.
9. The apparatus of claim 7 , wherein the polymeric material of each of the external and internal sealing devices is a polytetrafluroethylene (PTFE) based material.
10. An apparatus for singulating a semiconductor wafer, the apparatus comprising:
the apparatus of claim 7 ; and
a cutting device arranged relative to the apparatus of claim 7 , the cutting device being for singulating the semiconductor wafer as the semiconductor wafer is held to the supporting surface of the supporting device of the apparatus of claim 7 by the vacuum passage.