Interposed substrate and manufacturing method thereof
A manufacturing method of an interposed substrate is provided. A photoresist layer is formed on a metal carrier. The photoresist layer has plural of openings exposing a portion of the metal carrier. Plural of metal passivation pads and plural of conductive pillars are formed in the openings. The metal passivation pads cover a portion of the metal carrier exposed by openings. The conductive pillars are respectively stacked on the metal passivation pads. The photoresist layer is removed to expose another portion of the metal carrier. An insulating material layer is formed on the metal carrier. The insulating material layer covers the another portion of the metal carrier and encapsulates the conductive pillars and the metal passivation pads. An upper surface of the insulating material layer and a top surface of each conductive pillar are coplanar. The metal carrier is removed to expose a lower surface of the insulating material layer.
1. An interposed substrate comprising:
an insulating material layer having an upper surface and a lower surface opposite to each other and a plurality of through holes penetrating through the insulating material layer;
a plurality of conductive pillars respectively disposed within the through holes of the insulating material layer, wherein each conductive pillar has a top surface and a bottom surface opposite to each other, and the top surface of each conductive pillar and the upper surface of the insulating material layer are coplanar;
a plurality of metal passivation pads respectively disposed within the through holes of the insulating material layer, wherein the conductive pillars are respectively stacked on the metal passivation pads, and a bottom surface of each metal passivation pad and the lower surface of the insulating material layer are coplanar; and
a plurality of under ball metallurgy pads respectively disposed within the through holes of the insulating material layer, wherein the under ball metallurgy pads are respectively located between the metal passivation pads and the conductive pillars.
2. The interposed substrate as recited in claim 1 further comprising:
a first dielectric layer disposed on the upper surface of the insulating material layer, wherein the first dielectric layer covers the upper surface of the insulating material layer and the top surfaces of the conductive pillars;
a plurality of first conductive through vias penetrating through the first dielectric layer and respectively connecting the tops surfaces of the conductive pillars; and
a redistribution circuit layer disposed on the first dielectric layer and connecting the first conductive through vias, wherein the redistribution circuit layer electrically connects with the conductive pillars through the first conductive through vias.
3. The interposed substrate as recited in claim 2 further comprising:
a second dielectric layer disposed on the redistribution circuit layer, wherein the second dielectric layer covers the redistribution circuit layer and the first dielectric layer;
a plurality of second conductive through vias embedded within the second dielectric layer and connecting the redistribution circuit layer; and
a plurality of under ball metallurgy pads disposed on the second dielectric layer and respectively connecting the second conductive through vias, wherein the under ball metallurgy pads electrically connects the redistribution circuit layer through the second conductive through vias.