Apparatus for forming porous silicon layers on at least two surfaces of a plurality of silicon templates
An apparatus for forming porous silicon layers on at least two surfaces of a plurality of silicon templates in a batch electrochemical anodic etch process is provided. The apparatus comprises a plurality of edge-sealing template mounts operable to prevent formation of porous silicon at the edges of a plurality of templates. An electrolyte is disposed among the plurality of templates. The apparatus further comprises a power supply operable to switch polarity, change current intensity, and control etching time to produce the porous silicon layers.
1. An apparatus for forming porous silicon layers on at least two surfaces of a plurality of silicon templates in a batch electrochemical anodic etch process, said apparatus comprising:
a plurality of edge-sealing template mounts, said plurality of mounts operable to prevent formation of porous silicon at the edges of a plurality of templates;
an electrolyte disposed among said plurality of templates;
an electrolyte temperature controller;
an external liquid circulation and gas bubble extractor; and
a power supply operable to switch polarity, change current intensity, and control etching time to produce said porous silicon layers.
2. An apparatus for forming porous silicon layers on at least two surfaces of a plurality of silicon templates in a batch electrochemical anodic etch process, said apparatus comprising:
a plurality of edge-sealing template mounts, said plurality of mounts operable to prevent formation of porous silicon at the edges of a plurality of templates;
an electrolyte disposed among said plurality of templates; and
a power supply operable to switch polarity, change current intensity, and control etching time to produce said porous silicon layers.
3. The apparatus of claim 2 , further comprising an electrolyte temperature controller.
4. The apparatus of claim 2 , further comprising an external liquid circulation and gas bubble extractor.