Semiconductor device
Disclosed is a semiconductor device which includes a semiconductor chip and a base substrate. The semiconductor chip includes a semiconductor substrate, an interconnect layer and a high-frequency interconnect. The interconnect layer is provided on the substrate. The high-frequency interconnect is formed within the interconnect layer. The semiconductor chip is mounted onto the base substrate. An electromagnetic shield layer is provided between the high-frequency interconnect and the interconnect.
1. A semiconductor device comprising:
an interconnect substrate including a first interconnect; and
a semiconductor chip mounted on the interconnect substrate, the semiconductor chip including:
a substrate;
an interconnect layer provided on a surface of the substrate;
a second interconnect provided in the interconnect layer, the second interconnect formed to have an electric coil-shape; and
an electroconductive pattern formed on the interconnect layer, the electroconductive pattern applied with a constant potential,
wherein the electroconductive pattern is arranged between the first interconnect and the second interconnect.
2. The semiconductor device according to claim 1 , wherein the electroconductive pattern and the second interconnect overlap in a plan view.
3. The semiconductor device according to claim 1 , wherein the second interconnect is an interconnect which is applied with an electric current having a frequency equal to or greater than 5 GHz.
4. The semiconductor device according to claim 1 , wherein the second interconnect functions as an inductor.
5. The semiconductor device according to claim 1 , wherein the constant potential is a ground potential.
6. A semiconductor device comprising:
an interconnect substrate including a first interconnect; and
a semiconductor chip mounted on the interconnect substrate, the semiconductor chip including:
a substrate;
an interconnect layer provided on a surface of the substrate;
a second interconnect provided in the interconnect layer, the second interconnect formed to have an electric coil-shape; and
an electroconductive shield formed on the interconnect layer, the electroconductive shield applied with a constant potential,
wherein the electroconductive shield is arranged between the first interconnect and the second interconnect.
7. The semiconductor device according to claim 6 , wherein the electroconductive shield and the second interconnect overlap in a plan view.
8. The semiconductor device according to claim 6 , wherein the second interconnect is an interconnect which is applied with an electric current having a frequency equal to or greater than 5 GHz.
9. The semiconductor device according to claim 6 , wherein the second interconnect functions as an inductor.
10. The semiconductor device according to claim 6 , wherein the constant potential is a ground potential.