Non-volatile memory cell with high bit density
View Patent ↗A non-volatile memory cell with high bit density is disclosed. Embodiments include: providing a transistor having a wordline gate structure over a substrate, first and second floating gate structures proximate opposite sides of the wordline gate structure, and first and second diffusion regions in the substrate, wherein the wordline gate structure, the first floating gate structure, and the second floating gate structure are laterally between the first and second diffusion regions; and providing a capacitor having first, second, and third control gate structures over the substrate, a third floating gate structure between the first and second control gate structures, a fourth floating gate structure between the second and third control gate structures, and third and fourth diffusion regions in the substrate, wherein the first, second, and third control gate structures are laterally between the third and fourth diffusion regions.
1. A method comprising:
providing a transistor having a wordline gate structure over a substrate, first and second floating gate structures proximate opposite sides of the wordline gate structure, and first and second diffusion regions in the substrate, wherein the wordline gate structure, the first floating gate structure, and the second floating gate structure are laterally between the first and second diffusion regions; and
providing a capacitor having first, second, and third control gate structures over the substrate, a third floating gate structure between the first and second control gate structures, a fourth floating gate structure between the second and third control gate structures, and third and fourth diffusion regions in the substrate, wherein the first, second, and third control gate structures are laterally between the third and fourth diffusion regions.
2. The method according to claim 1 , further comprising:
coupling the transistor and the capacitor via the first and third floating gate structures, and via the second and fourth floating gate structures.
3. The method according to claim 1 , wherein the first floating gate structure is the third floating gate structure, and the second floating gate structure is the fourth floating gate structure.
4. The method according to claim 1 , further comprising:
providing a write operation by:
positively biasing the wordline gate structure and one of the first and second diffusion regions;
coupling another one of the first and second diffusion regions to a ground rail; and
positively biasing the first, second, and third control gate structures, and the third and fourth diffusion regions.
5. The method according to claim 4 , further comprising:
positively biasing the one of the first and second diffusion regions, the first, second, and third control gate structures, and the third and fourth diffusion regions by applying a programming drain voltage to the one of the first and second diffusion regions, the first, second, and third control gate structures, and the third and fourth diffusion regions.
6. The method according to claim 1 , further comprising:
providing an erase operation by:
negatively biasing the wordline gate structure, the first, second, and third control gate structures, and the third and fourth diffusion regions;
positively biasing one of the first and second diffusion regions; and
floating another one of the first and second diffusion regions.
7. The method according to claim 6 , further comprising:
negatively biasing the wordline gate structure, the first, second, and third control gate structures, and the third and fourth diffusion regions by applying an erase wordline voltage to the wordline gate structure, the first, second, and third control gate structures, and the third and fourth diffusion regions; and
positively biasing the one of the first and second diffusion regions by applying an erase drain voltage to the one of the first and second diffusion regions.
8. The method according to claim 1 , further comprising:
providing an erase operation by:
coupling the wordline gate structure, the first, second, and third control gate structures,
and the first and second diffusion regions to a ground rail; and
positively biasing the third and fourth diffusion regions.
9. A device comprising:
a transistor having a wordline gate structure over a substrate, first and second floating gate structures proximate opposite sides of the wordline gate structure, and first and second diffusion regions in the substrate, wherein the wordline gate structure, the first floating gate structure, and the second floating gate structure are laterally between the first and second diffusion regions; and
a capacitor having first, second, and third control gate structures over the substrate, a third floating gate structure between the first and second control gate structures, a fourth floating gate structure between the second and third control gate structures, and third and fourth diffusion regions in the substrate, wherein the first, second, and third control gate structures are laterally between the third and fourth diffusion regions.
10. The device according to claim 9 , wherein the transistor is coupled to the capacitor via the first and third floating gate structures, and via the second and fourth floating gate structures.
11. The device according to claim 9 , wherein the first floating gate structure is the third floating gate structure, and the second floating gate structure is the fourth floating gate structure.
12. The device according to claim 9 , wherein the transistor and the capacitor are configured to provide a write operation via:
positive biasing of the wordline gate structure and one of the first and second diffusion regions;
coupling of another one of the first and second diffusion regions to a ground rail; and
positive biasing of the first, second, and third control gate structures, and the third and fourth diffusion regions.
13. The device according to claim 9 , wherein the transistor and the capacitor are configured to provide an erase operation via:
negative biasing of the wordline gate structure, the first, second, and third control gate structures, and the third and fourth diffusion regions;
positive biasing of one of the first and second diffusion regions; and
floating of another one of the first and second diffusion regions.
14. The device according to claim 9 , wherein the transistor and the capacitor are configured to provide an erase operation via:
coupling of the wordline gate structure, the first, second, and third control gate structures, and the first and second diffusion regions to a ground rail; and
positive biasing of the third and fourth diffusion regions.
15. The device according to claim 9 , further comprising:
a shallow trench isolation (STI) region that separates the transistor and the capacitor;
a plurality of source/drain extension regions in the substrate laterally between the first and second diffusion regions;
a plurality of halo implant regions respectively proximate sides of the source/drain extension regions.
16. The device according to claim 9 , further comprising:
a set of spacers between each of the wordline gate structure and the first floating gate structure, the wordline gate structure and the second floating gate structure, the first control gate structure and the third floating gate structure, the second control gate structure and the third floating gate structure, the second control gate structure and the fourth floating gate structure, and the third control gate structure and the fourth floating gate structure, wherein each set of spacers include one spacer that is formed of nitride, and another spacer that is formed of oxide.
17. A method comprising:
providing first and second floating gate structures over first and second well regions in a substrate;
providing a transistor having a wordline gate structure over the first well region, the first and second floating gate structures proximate opposite sides of the wordline gate structure, and first and second diffusion regions in the first well region, wherein the wordline gate structure, the first floating gate structure, and the second floating gate structure are laterally between the first and second diffusion regions; and
providing a capacitor having first, second, and third control gate structures over the second well region, the first floating gate structure between the first and second control gate structures, the second floating gate structure between the second and third control gate structures, and third and fourth diffusion regions in the second well region, wherein the first, second, and third control gate structures are laterally between the third and fourth diffusion regions.
18. The method according to claim 17 , wherein the transistor and the capacitor are configured to provide a write operation via:
application of a positive wordline voltage to the wordline gate structure;
application of a positive programming drain voltage to one of the first and second diffusion regions;
coupling of another one of the first and second diffusion regions to a ground rail; and
application of the positive programming drain voltage to the first, second, and third control gate structures, and the third and fourth diffusion regions.
19. The method according to claim 18 , wherein the transistor and the capacitor are further configured to provide an erase operation via:
application of a negative erase wordline voltage to the wordline gate structure, the first, second, and third control gate structures, and the third and fourth diffusion regions;
application of a positive erase drain voltage to the one of the first and second diffusion regions; and
floating of the other one of the first and second diffusion regions.
20. The method according to claim 19 , wherein the transistor and the capacitor are further configured to provide another erase operation via:
coupling of the wordline gate structure, the first, second, and third control gate structures, and the first and second diffusion regions to the ground rail; and
application of a positive erase drain voltage to the third and fourth diffusion regions.