IP Library › Granted Patent US 8,937,770
Granted Patent B2
US 8,937,770 · App. 13/557,073 · Granted Jan 20, 2015

Excimer laser apparatus projecting a beam with a selectively variable short-axis beam profile

Inventors: Frank Simon (Göttingen, DE); Paul Van Der Wilt (Göttingen, DE); Ludwig Schwenger (Hannover, DE)
Assignee: Coherent GmbH
G02B27/09G02B27/095B23K26/0042B23K26/0081H01L21/02532
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Quick Facts
Patent No.
US 8,937,770
App. No.
13/557,073
Granted
Jan 20, 2015
Kind
B2
Abstract

Apparatus for homogenizing and projecting two laser-beams is arranged such that the projected homogenized beams are aligned parallel to each other in a first transverse axis and partially overlap in second transverse axis perpendicular to the first transverse axis. The projected homogenized laser-beams have different intensities in the second axis and the degree of partial overlap is selected such that the combined intensity of the laser beams in the second axis has a step profile.

Claims (31)

1. Optical apparatus for projecting an elongated beam spot on a working plane, the beam spot being derived from first and second laser beams, said apparatus having a long-axis, in which lies the length of the beam spot, and a short-axis in which lies the width of the beam spot, the apparatus comprising:

first and second short-axis beam-homogenizers for homogenizing the first and second laser beams on the working plane in the short-axis;

first and second short-axis focus-separating lenses cooperative with the first and second short-axis beam-homogenizers;

a long-axis beam homogenizer for homogenizing the first and second laser beams on the working plane in the long-axis;

projection optics for projecting the short-axis homogenized first and second beams in the working plane; and

wherein the first and second short-axis beam-homogenizers, the short-axis focus-separating lenses, the long-axis beam-homogenizer, and the projection optics are configured and arranged such that the first and second laser-beams are aligned in the working plane in the long-axis parallel to each other defining the length of the beam-spot and have respectively first and second short-axis beam-widths centered around respectively first and second focal points spaced apart in the working plane in the short-axis.

2. The apparatus of claim 1 wherein the intensity of intensity of the projected first laser-beam in the working plane is between 2 and 5 percent greater than intensity of the projected second laser-beam in the working plane.

3. The apparatus of claim 1 , wherein the first and second laser beams are generated by first and second lasers.

4. The apparatus of claim 3 , further include a partially reflective and partially transmissive beam-splitter arranged to mix a first portion of the output of the first laser with a first portion of the output of the second laser to provide the first laser beam, and to mix a second portion of the first output beam with a second portion of the second output beam to provide the second laser beam.

5. The apparatus of claim 1 including a first laser providing an output beam and a partially reflective and partially transmissive beam-splitter arranged to divide the output beam into a first portion for providing the first laser beam and a second portion for providing the second laser beam.

6. The apparatus of claim 5 , wherein the first and second laser-beams have the same polarization state.

7. The apparatus of claim 1 , including a first laser providing an output beam and a polarizing beam-splitter arranged to divide the output beam into a plane-polarized first portion having a first polarization-orientation for providing the first laser beam and a plane-polarized second portion having a second polarization-orientation for providing the second laser beam, the first and second polarization orientations being perpendicular to each other.

8. The apparatus of claim 7 , further including a polarization-rotator in the path of the second portion arranged to rotate the second polarization orientation to the first polarization orientation such the first and second laser beams are plane-polarized in the first polarization-orientation.

9. The apparatus of claim 1 , wherein the first and second beam-widths partially overlap in the short-axis.

10. The apparatus of claim 9 wherein the first and second laser beams have equal power; the short-axis beam homogenizers are configured such that the first short-axis beam-width is less than the second short-axis beam-width, whereby the intensity of the projected first laser-beam in the working plane is greater than intensity of the projected second laser-beam in the working plane.

11. The apparatus of claim 10 wherein the intensity of the projected first laser-beam in the working plane is between 2 and 5 percent greater than intensity of the projected second laser-beam in the working plane.

12. The apparatus of claim 10 wherein the degree of the partial overlapping of the first and second short-axis beam-widths is selected such that the combined intensity of the projected first and second beams in the short-axis has a step profile.

13. Optical apparatus for projecting an elongated beam spot on a working plane, the beam spot having a long-axis, in which lies the length of the beam spot, and a short-axis in which lies the width of the beam spot, the apparatus comprising:

beam generating apparatus providing first and second laser beams;

first and second short-axis beam-homogenizers for homogenizing the first and second laser beams on the working plane in the short-axis;

first and second short-axis focus-separating lenses cooperative with the first and second short-axis beam-homogenizers and each thereof having an optical axis;

a long-axis beam homogenizer for homogenizing the first and second laser beams on the working plane in the long-axis;

projection optics for projecting the short-axis homogenized first and second beams in the working plane; and

wherein the first and second short-axis beam-homogenizers, the short-axis focus-separating lenses, the long-axis beam-homogenizer, and the projection optics are configured and arranged such that the first and second laser-beams are aligned parallel to each other in the working plane in the long-defining the length of the beam-spot and have respectively first and second short-axis beam-widths partially overlapping in the short axis defining the width of the beam spot.

14. The apparatus of claim 13 , wherein the apparatus has a central axis, the optical-axes of the first and second short-axis focus-separating lenses are on opposite sides of the central axis in the short-axis direction, and the first and second beam widths are centered on opposite sides of the central axis in the short-axis direction.

15. The apparatus of claim 13 , wherein the first and second short-axis focus-separating lenses have optical power in the short-axis only.

16. The apparatus of claim 13 wherein the beam-generating apparatus includes first and second lasers for providing respectively the first and second laser-beams.

17. The apparatus of claim 13 wherein the beam-generating apparatus includes a laser providing an output beam and a partially reflective and partially transmissive beam-splitter arranged to divide the output beam into a first portion for providing the first laser-beam and a second portion for providing the second laser-beam.

18. The apparatus of claim 13 , wherein the beam-generating apparatus includes a laser providing an output beam and a polarizing beam-splitter arranged to divide the output beam into a plane-polarized first portion having a first polarization-orientation for providing the first laser-beam and a plane-polarized second portion having a second polarization-orientation for providing the second laser-beam, the first and second polarization orientations being perpendicular to each other.

19. The apparatus of claim 13 wherein the intensity of the projected first laser-beam in the working plane is greater than intensity of the projected second laser-beam in the working plane and the partial overlap is arranged such that the combined intensity of the projected first and second beams in the short-axis has a step profile.

20. The apparatus of claim 19 wherein the intensity of the projected first laser-beam in the working plane is between 2 and 5 percent greater than intensity of the projected second laser-beam in the working plane.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 28, 2012
From: SIMON, FRANK; VAN DER WILT, PAUL; SCHWENGER, LUDWIG
To: COHERENT GMBH
Reel/Frame 029050/0081 →
Continuity (1)
Related Publication 20140027417A1 · Jan 30, 2014