Cold field electron emitters based on silicon carbide structures
A cold cathode field emission electron source capable of emission at levels comparable to thermal sources is described. Emission in excess of 6 A/cm 2 at 7.5 V/μm is demonstrated in a macroscopic emitter array. The emitter is comprised of a monolithic and rigid porous semiconductor nanostructure with uniformly distributed emission sites, and is fabricated through a room temperature process which allows for control of emission properties. These electron sources can be used in a wide range of applications, including microwave electronics and x-ray imaging for medicine and security.
1. A field emitter having a plurality of discrete emission projections extending from an emission face of the field emitter, the field emitter being monolithic and homogenous in a direction transverse to the emission face of the field emitter, wherein the emitter achieves an emission current density greater than 1 A/cm 2 at an applied macroscopic electric field of 3 V/μm.
2. A field emitter having a plurality of discrete emission projections extending from an emission face of the field emitter, the field emitter being monolithic and homogenous in a direction transverse to the emission face of the field emitter, wherein the emitter achieves an emission current density greater than 6 A/cm 2 at an applied macroscopic electric field of 7.5 V/μm.
3. A field emitter having a plurality of discrete emission projections extending from an emission face of the field emitter, the field emitter being monolithic and homogenous in a direction transverse to the emission face of the field emitter, wherein the emitter achieves an emission current density of up to 11 A/cm 2 at an applied macroscopic electric field of 9.0 V/μm, without failure.
4. A cold cathode silicon carbide field emitter defining an emission face having a plurality of discrete emission projections, the field emitter achieving an emission current density greater than 6A/cm 2 at an applied macroscopic electric field of 7.5 V/μm.
5. The field emitter of claim 4 wherein the field emitter is monolithic and homogenous in a direction transverse to the emission face of the field emitter.
6. The field emitter of claim 4 wherein the field emitter is nanoporous along the emission face.