Litho scanner alignment signal improvement
View Patent ↗A method and a device are provided for diffracting incident light from a lithographic scanner in an IC process flow. Embodiments include forming a diffraction grating in a first layer on a semiconductor substrate; and forming a plurality of lithographic alignment marks in a second layer, overlying the first layer, wherein the diffraction grating has a width and a length greater than or equal to a width and length, respectively, of the plurality of lithographic alignment marks.
1. A method comprising:
forming a diffraction grating in a first layer on a semiconductor substrate;
forming a plurality of lithographic alignment marks in a second layer, overlying the first layer,
wherein the diffraction grating has a width and a length greater than or equal to a width and length, respectively, of the plurality of lithographic alignment marks; and
forming an integrated circuit (IC) pattern on the first layer concurrently with forming the diffraction grating, and forming the diffraction grating to a depth equal to a depth of the IC pattern.
2. The method according to claim 1 , comprising forming the diffraction grating and the plurality of lithographic alignment marks in an area which includes no integrated circuit (IC) pattern on the first or second layer.
3. The method according to claim 1 , comprising forming the diffraction grating in a layer directly underneath the layer containing the plurality of lithographic alignment marks.
4. The method according to claim 1 , comprising forming elements of the diffraction grating in a direction parallel to a direction of the plurality of lithographic alignment marks.
5. The method according to claim 1 , comprising forming elements of the diffraction grating in a direction perpendicular to a direction of the plurality of lithographic alignment marks.
6. A method comprising:
forming a diffraction grating as a square array of grating elements in a first layer on a semiconductor substrate;
forming a plurality of lithographic alignment marks on a second layer, overlying the first layer, wherein the square array has a width and a length greater than or equal to a width and length of the plurality of alignment marks; and
forming an integrated circuit (IC) pattern on the first layer concurrently with forming the diffraction grating, and forming the diffraction grating to a depth equal to a depth of the IC pattern.
7. The method according to claim 6 , comprising forming the diffraction grating and the plurality of lithographic alignment marks in an area which includes no integrated circuit (IC) pattern on the first or second layer.
8. The method according to claim 6 , comprising forming the square array in a layer directly underneath the layer containing the plurality of lithographic alignment marks.
9. The method according to claim 6 , forming each grating element of the square array with an identical width and length.
10. The method according to claim 6 , comprising lithographically forming the IC pattern and the diffraction grating on the first layer.
11. A device comprising:
a semiconductor substrate; a first layer on the semiconductor substrate, the first layer including a diffraction grating;
a second layer overlying the first layer, the second layer including a plurality of lithographic alignment marks directly above diffraction grating,
wherein the diffraction grating has a width and a length greater than or equal to a width and length, respectively, of the plurality of lithographic alignment marks; and
an IC pattern on the first layer, wherein the diffraction grating has a depth equal to a depth of the IC pattern.
12. The device according to claim 11 , wherein the diffraction grating and the plurality of lithographic alignment marks are positioned in an area which includes no integrated circuit (IC) pattern on the first or second layer.
13. The device according to claim 11 , wherein the first layer, including the diffraction grating, is directly underneath the second layer, containing the plurality of lithographic alignment marks.
14. The device according to claim 11 , wherein elements of the diffraction grating are in a direction parallel to a direction of the plurality of lithographic alignment marks.
15. The device according to claim 11 , wherein elements of the diffraction grating are in a direction perpendicular to a direction of the plurality of lithographic alignment marks.
16. the device according to claim 11 , wherein the diffraction grating is in a border region around the IC pattern.
17. The device according to claim 11 , further comprising:
a second diffraction grating on the second layer remote from the IC pattern and the plurality of lithographic alignment marks;
a third layer overlying the second layer; and
a second plurality of alignment marks on the third layer directly above the second diffraction grating.