IP Library Granted Patent US 8,634,238
Granted Patent B2
US 8,634,238 · App. 13/604,386 · Granted Jan 21, 2014

Magnetic memory element having an adjustment layer for reducing a leakage magnetic field from a reference layer and magnetic memory thereof

Inventors: Masahiko Nakayama (Shimonoseki, JP); Hisanori Aikawa (Yokohama, JP); Masaru Toko (Yokohama, JP); Hiroaki Yoda (Kawasaki, JP); Tatsuya Kishi (Yokohama, JP); Sumio Ikegawa (Tokyo, JP)
Assignee: Kabushiki Kaisha Toshiba
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Quick Facts
Patent No.
US 8,634,238
App. No.
13/604,386
Granted
Jan 21, 2014
Kind
B2
Abstract

According to one embodiment, a magnetic memory element includes a memory layer, a first nonmagnetic layer, a reference layer, a second nonmagnetic layer, and an adjustment layer which are stacked. The adjustment layer is configured to reduce a leakage magnetic field from the reference layer. The adjustment layer is formed by stacking an interface layer provided on the second nonmagnetic layer, and a magnetic layer having magnetic anisotropy perpendicular to a film surface. Saturation magnetization of the interface layer is larger than that of the magnetic layer.

Claims (42)

1. A magnetic memory element comprising:

a memory layer having magnetic anisotropy perpendicular to a film surface and having a variable magnetization direction;

a first nonmagnetic layer provided on the memory layer;

a reference layer provided on the first nonmagnetic layer, having magnetic anisotropy perpendicular to a film surface, and having an invariable magnetization direction;

a second nonmagnetic layer provided on the reference layer; and

an adjustment layer provided on the second nonmagnetic layer and configured to reduce a leakage magnetic field from the reference layer,

wherein the adjustment layer is formed by stacking an interface layer provided on the second nonmagnetic layer, and a magnetic layer having magnetic anisotropy perpendicular to a film surface, and

saturation magnetization of the interface layer is larger than that of the magnetic layer.

2. The element of claim 1 , wherein a magnetization direction in the interface layer is an in-plane direction.

3. The element of claim 1 , wherein the interface layer is made of one element selected from the group consisting of Co, Fe, and Ni, or an alloy containing at least one element selected from the group consisting of Co, Fe, and Ni.

4. The element of claim 1 , wherein the magnetic layer is made of an alloy containing at least one element selected from the group consisting of Co and Fe, and at least one element selected from the group consisting of Pt, Pd, and Cr.

5. The element of claim 1 , wherein the magnetic layer is formed by alternately stacking an alloy containing at least one element selected from the group consisting of Co and Fe, and an alloy containing at least one element selected from the group consisting of Pt, Pd, and Cr.

6. The element of claim 1 , wherein a magnetization direction in the magnetic layer is antiparallel to that in the reference layer.

7. A magnetic memory comprising a magnetic memory element of claim 1 .

8. The memory of claim 7 , further comprising:

a first bit line electrically connected to one terminal of the magnetic memory element;

a selection transistor electrically connected to the other terminal of the magnetic memory element;

a second bit line electrically connected to one terminal of the selection transistor; and

a word line electrically connected to a gate of the selection transistor.

9. A magnetic memory element comprising:

a memory layer having magnetic anisotropy perpendicular to a film surface and having a variable magnetization direction;

a first nonmagnetic layer provided on the memory layer;

a reference layer provided on the first nonmagnetic layer, having magnetic anisotropy perpendicular to a film surface, and having an invariable magnetization direction;

a second nonmagnetic layer provided on the reference layer;

a first adjustment layer provided on the second nonmagnetic layer and configured to reduce a leakage magnetic field from the reference layer;

a third nonmagnetic layer provided under the memory layer; and

a second adjustment layer provided under the third nonmagnetic layer and configured to reduce the leakage magnetic field from the reference layer,

wherein the first adjustment layer is formed by stacking a first interface layer provided on the second nonmagnetic layer, and a first magnetic layer having magnetic anisotropy perpendicular to a film surface,

saturation magnetization of the first interface layer is larger than that of the first magnetic layer,

the second adjustment layer is formed by stacking a second interface layer provided on the third nonmagnetic layer, and a second magnetic layer having magnetic anisotropy perpendicular to a film surface, and

saturation magnetization of the second interface layer is larger than that of the second magnetic layer.

10. The element of claim 9 , wherein a magnetization direction in each of the first interface layer and the second interface layer is an in-plane direction.

11. The element of claim 9 , wherein each of the first interface layer and the second interface layer is made of one element selected from the group consisting of Co, Fe, and Ni, or an alloy containing at least one element selected from the group consisting of Co, Fe, and Ni.

12. The element of claim 9 , wherein each of the first magnetic layer and the second magnetic layer is made of an alloy containing at least one element selected from the group consisting of Co and Fe, and at least one element selected from the group consisting of Pt, Pd, and Cr.

13. The element of claim 9 , wherein each of the first magnetic layer and the second magnetic layer is formed by alternately stacking an alloy containing at least one element selected from the group consisting of Co and Fe, and an alloy containing at least one element selected from the group consisting of Pt, Pd, and Cr.

14. The element of claim 9 , wherein a magnetization direction in each of the first magnetic layer and the second magnetic layer is antiparallel to that in the reference layer.

15. A magnetic memory comprising a magnetic memory element of claim 9 .

16. The memory of claim 15 , further comprising:

a first bit line electrically connected to one terminal of the magnetic memory element;

a selection transistor electrically connected to the other terminal of the magnetic memory element;

a second bit line electrically connected to one terminal of the selection transistor; and

a word line electrically connected to a gate of the selection transistor.

Assignments (4)
DE-MERGER Recorded Dec 12, 2019
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 051260/0291 →
MERGER Recorded Dec 12, 2019
From: TOSHIBA MEMORY CORPORATION; K.K PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 051262/0776 →
CHANGE OF NAME AND ADDRESS Recorded Dec 12, 2019
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 051262/0881 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 16, 2012
From: NAKAYAMA, MASAHIKO; AIKAWA, HISANORI; TOKO, MASARU; YODA, HIROAKI; KISHI, TATSUYA; IKEGAWA, SUMIO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 029313/0768 →
Priority Claims (1)
JP 2011-231363 · Oct 21, 2011 · national
Continuity (1)
Related Publication 20130099337A1 · Apr 25, 2013