Solid-state image sensor including a photoelectric conversion element, a charge retaining element, and a light shielding element, method for producing the same solid-state image sensor, and electronic apparatus including the same solid-state image sensor

1. A solid-state image sensor comprising:

a semiconductor substrate having a photoelectric conversion element converting incident light into a charge and a charge retaining section temporarily retaining the charge photoelectrically converted by the photoelectric conversion element; and

a light shielding section comprising:

an embedded section extending vertically in at least a region between the photoelectric conversion element and the charge retaining section of the semiconductor substrate, and

a lid section extending horizontally in such a way as to cover at least the charge retaining section of the semiconductor substrate, wherein the embedded section and the lid section are directly connected to each other.

2. The solid-state image sensor according to claim 1 , further comprising:

a wiring layer having a plurality of wirings, wherein the light enters the photoelectric conversion element from a back side of the semiconductor substrate, the back side opposite to a front side of the semiconductor substrate on which the wiring layer is provided.

3. The solid-state image sensor according to claim 1 , wherein

the embedded section of the light shielding section is formed in such a way as to surround the photoelectric conversion element and the charge retaining section.

4. The solid-state image sensor according to claim 1 , wherein

in the lid section of the light shielding section, an opening is formed in a region corresponding to the photoelectric conversion element.

5. The solid-state image sensor according to claim 1 , wherein

the light shielding section further has a front-side lid section disposed in such a way as to cover at least the charge retaining section on a front side of the semiconductor substrate opposite to a side on which the light enters the photoelectric conversion element.

6. The solid-state image sensor according to claim 5 , wherein

in the front-side lid section of the light shielding section, an opening is formed in a region corresponding to the photoelectric conversion element.

7. A method for producing a solid-state image sensor comprising:

forming, on a semiconductor substrate, a photoelectric conversion element converting incident light into a charge and a charge retaining section temporarily retaining the charge photoelectrically converted by the photoelectric conversion element; and

forming a light shielding section comprising

an embedded section extending vertically in at least a region between the photoelectric conversion element and the charge retaining section of the semiconductor substrate, and

a lid section extending horizontally in such a way as to cover at least the charge retaining section of the semiconductor substrate, wherein the embedded section and the lid section are directly connected to each other.

8. An electronic apparatus comprising:

a solid-state image sensor including a semiconductor substrate having a photoelectric conversion element converting incident light into a charge and a charge retaining section temporarily retaining the charge photoelectrically converted by the photoelectric conversion element; and

a light shielding section having

an embedded section extending vertically in at least a region between the photoelectric conversion element and the charge retaining section of the semiconductor substrate, and

a lid section extending horizontally in such a way as to cover at least the charge retaining section of the semiconductor substrate, wherein the embedded section and the lid section are directly connected to each other.