Magnetoresistive element and method of manufacturing the same
View Patent ↗According to one embodiment, a magnetoresistive element comprises a first magnetic layer having a magnetization direction invariable and perpendicular to a film surface, a tunnel barrier layer formed on the first magnetic layer, and a second magnetic layer formed on the tunnel barrier layer and having a magnetization direction variable and perpendicular to the film surface. The first magnetic layer includes an interface layer formed on an upper side in contact with a lower portion of the tunnel barrier layer, and a main body layer formed on a lower side and serving as an origin of perpendicular magnetic anisotropy. The interface layer includes a first area provided on an inner side and having magnetization, and a second area provided on an outer side to surround the first area and having magnetization smaller than the magnetization of the first area or no magnetization.
1. A magnetoresistive element comprising:
a first magnetic layer having a magnetization direction invariable and perpendicular to a film surface;
a tunnel barrier layer formed on the first magnetic layer; and
a second magnetic layer formed on the tunnel barrier layer and having a magnetization direction variable and perpendicular to the film surface,
wherein the first magnetic layer includes an interface layer formed on an upper side in contact with a lower portion of the tunnel barrier layer, and a main body layer formed on a lower side and serving as an origin of perpendicular magnetic anisotropy, and
the interface layer includes a first area provided on an inner side and having magnetization, and a second area provided on an outer side to surround the first area and having magnetization smaller than the magnetization of the first area or no magnetization,
wherein a film thickness of the tunnel barrier layer on the second area is smaller than a film thickness of the tunnel barrier layer on the first area.
2. The element of claim 1 , wherein the second area contains a first element contained in the first area and a second element different from the first element, thereby making the magnetization smaller than the magnetization of the first area.
3. The element of claim 2 , wherein the second element includes one of a group V element and a group IV element.
4. The element of claim 2 , wherein the second element includes at least one of N, P, As, Sb, C, Si, Ge, He, F, B, Zr, Tb, Ti, Mg, S, and O.
5. The element of claim 2 , wherein the second area has the magnetization smaller than the magnetization of the first area as the second element makes a chemical bond with the first element to form a compound, or the second element enters among a lattice formed by the first element to change a crystal structure.
6. The element of claim 1 , wherein a diameter of the first magnetic layer is larger than a diameter of the second magnetic layer, and a diameter of the first area is equal to the diameter of the second magnetic layer.
7. The element of claim 1 , wherein the second magnetic layer does not exist on the second area.
8. The element of claim 1 , further comprising a third magnetic layer that is provided under the first magnetic layer or on the second magnetic layer, has a magnetization direction invariable and reverse to the magnetization direction of the first magnetic layer, and cancels a leakage magnetic field from the first magnetic layer to the second magnetic layer.
9. The element of claim 1 , wherein the tunnel barrier layer does not exist on the second area.
10. A magnetoresistive element comprising:
a first magnetic layer having a magnetization direction invariable and perpendicular to a film surface;
a tunnel barrier layer formed on the first magnetic layer; and
a second magnetic layer formed on the tunnel barrier layer and having a magnetization direction variable and perpendicular to the film surface,
wherein the first magnetic layer includes a first area provided on an inner side on an upper side and having magnetization, and a second area provided on an outer side to surround the first area and having magnetization smaller than the magnetization of the first area or no magnetization,
wherein a film thickness of the tunnel barrier layer on the second area is smaller than a film thickness of the tunnel barrier layer on the first area.
11. The element of claim 10 , wherein the second area contains a first element contained in the first area and a second element different from the first element, thereby making the magnetization smaller than the magnetization of the first area.
12. The element of claim 11 , wherein the second element includes one of a group V element and a group IV element.
13. The element of claim 11 , wherein the second element includes at least one of N, P, As, Sb, C, Si, Ge, He, F, B, Zr, Tb, Ti, Mg, S, and O.
14. The element of claim 11 , wherein the second area has the magnetization smaller than the magnetization of the first area as the second element makes a chemical bond with the first element to form a compound, or the second element enters among a lattice formed by the first element to change a crystal structure.
15. The element of claim 10 , wherein a diameter of the first magnetic layer is larger than a diameter of the second magnetic layer, and a diameter of the first area is equal to the diameter of the second magnetic layer.