Charged particle beam drawing apparatus and method of manufacturing article

1. A drawing apparatus which performs drawing on a substrate with a pulse of a charged particle beam, the apparatus comprising:

a detector configured to output a current in accordance with a pulse of a charged particle beam incident thereon; and

a processor including a capacitor which is charged with a current output from the detector in accordance with the pulse incident thereon, and configured to detect a value of a voltage of the capacitor, and to obtain an intensity of the pulse incident on the detector based on a value of a capacitance of the capacitor and the detected voltage value,

wherein the processor includes a resistor, and is configured to detect a current output from the detector in accordance with a charged particle beam incident thereon through a voltage drop across the resistor, to supply a current, having a current value that is determined based on the detected current, to the capacitor to detect a value of a voltage of the capacitor to which the current having the determined current value is supplied, and to obtain the value of the capacitance based on the determined current value and the detected value of the voltage of the capacitor to which the current having the determined current value is supplied.

2. The apparatus according to claim 1 , wherein the processor includes a voltage detection device configured to detect a value of a voltage of the capacitor, and a supply device configured to supply a current having the determined current value to the capacitor, and

a transmission path which connects the supply device with the detector is shorter than a transmission path which connects the voltage detection device with the detector.

3. The apparatus according to claim 1 , wherein the processor is configured to cause a continuous charged particle beam to be incident on the detector if the processor detects the current output from the detector through the voltage drop across the resistor.

4. A method of manufacturing an article, the method comprising:

performing drawing on a substrate using a drawing apparatus;

developing the substrate on which the drawing has been performed; and

processing the developed substrate to manufacture the article,

wherein the drawing apparatus performs drawing on the substrate with a pulse of a charged particle beam, the apparatus includes:

a detector configured to output a current in accordance with a pulse of a charged particle beam incident thereon; and

a processor including a capacitor which is charged with a current output from the detector in accordance with the pulse incident thereon, and configured to detect a value of a voltage of the capacitor, and to obtain an intensity of the pulse incident on the detector based on a value of a capacitance of the capacitor and the detected voltage value,

wherein the processor includes a resistor, and is configured to detect a current output from the detector in accordance with a charged particle beam incident thereon through a voltage drop across the resistor, to supply a current, having a current value that is determined based on the detected current, to the capacitor to detect a value of a voltage of the capacitor to which the current having the determined current value is supplied, and to obtain the value of the capacitance based on the determined current value and the detected value of the voltage of the capacitor to which the current having the determined current value is supplied.

5. A drawing apparatus which performs drawing on a substrate with a charged particle beam, the apparatus comprising:

a detector configured to detect a charged particle beam incident thereon;

a capacitor configured to be charged with an output from the detector in accordance with the charged particle beam incident on the detector;

a processor configured to detect a value of a voltage of the capacitor, and to obtain an intensity of the charged particle beam incident on the detector based on a value of a capacitance of the capacitor and the detected voltage value; and

a resistor,

wherein the processor is configured to detect an output from the detector in accordance with a charged particle beam incident on the detector through a voltage drop across the resistor, to supply a current, having a current value determined based on the detected output to the capacitor to detect a value of a voltage of the capacitor to which the current having the determined current value is supplied, and to obtain the value of the capacitance based on the determined current value and the detected value of the voltage of the capacitor to which the current having the determined current value is supplied.

6. The apparatus according to claim 5 , further comprising a voltage detection device configured to detect a value of a voltage of the capacitor, and a supply device configured to supply a current having the determined current value to the capacitor,

wherein a transmission path which connects the supply device with the detector is shorter than a transmission path which connects the voltage detection device with the detector.

7. The apparatus according to claim 5 , wherein the processor is configured to cause a charged particle beam to be incident on the detector for detecting an output from the detector via the resistor, during a period longer than that for detecting an output from the detector via the capacitor.

8. A method of manufacturing an article, the method comprising steps of:

performing drawing on a substrate using a drawing apparatus;

developing the substrate on which the drawing has been performed; and

processing the developed substrate to manufacture the article,

wherein the drawing apparatus performs drawing on the substrate with a charged particle beam, and includes:

a detector configured to detect a charged particle beam incident thereon;

a capacitor configured to be charged with an output from the detector in accordance with the charged particle beam incident on the detector;

a processor configured to detect a value of a voltage of the capacitor, and to obtain an intensity of the charged particle beam incident on the detector based on a value of a capacitance of the capacitor and the detected voltage value; and

a resistor,

wherein the processor is configured to detect an output from the detector in accordance with a charged particle beam incident on the detector through a voltage drop across the resistor, to supply a current, having a current value determined based on the detected output to the capacitor to detect a value of a voltage of the capacitor to which the current having the determined current value is supplied, and to obtain the value of the capacitance based on the determined current value and the detected value of the voltage of the capacitor to which the current having the determined current value is supplied.

9. A method of obtaining an intensity of a charged particle beam, the method comprising steps of:

detecting an output from a detector, on which a charged particle beam is incident, via a resistor based on a voltage drop across the resistor;

supplying a current, having a current value determined based on the detected output, to a capacitor to detect a value of a voltage of the capacitor to which the current having the determined current value is supplied;

obtaining a value of a capacitance of the capacitor based on the determined current value and the detected value of the voltage of the capacitor; and

detecting an output from the detector, on which a charged particle beam is incident, via the capacitor to obtain an intensity of the charged particle beam based on a value of a voltage of the capacitor and the obtained value of the capacitance.

10. The method according to claim 9 , wherein a charged particle beam is caused to be incident on the detector for detecting an output from the detector via the resistor, during a period longer than that for detecting an output from the detector via the capacitor.