Instrument-cleaning method that uses soaking with nanobubble water
A cleaning method is provided for on-site cleaning of equipment such as filling equipment that fills beverages, etc. into bottles, cans, and other containers, liquid treatment equipment for filling solutions, and pipe equipment for connecting said equipment, the method being able to increase significantly the cleanliness of portions in contact with the filling solution while shortening cleaning time and reducing the amount used of utilities such as cleaning solution, etc. In the cleaning method for on-site cleaning of the liquid pathways of equipment such as filling equipment ( 4 ) for filling beverages into bottles, cans and other containers, liquid-treatment equipment ( 3 ) for filling solutions, or pipe equipment ( 4 p ) that connects said equipment, liquid comprising nanobubbles is pumped into said equipment and is left undisturbed to soak for a prescribed period.
1. An instrument-cleaning method for on-site cleaning liquid pathways including filling equipment that fills beverages into containers, liquid-treatment equipment for filling solutions, and pipe equipment connecting the filling equipment and the liquid-treatment equipment, the instrument-cleaning method comprising the steps of:
generating a liquid containing nanobubbles by applying a first ultrasonic vibration to a liquid;
cleaning the liquid pathways using first hot water;
pumping the liquid containing nanobubbles into the liquid pathways after the step of cleaning using the first hot water;
soaking and leaving undisturbed the liquid pathways in the liquid for a prescribed period after the liquid pathways have been filled with the liquid by the step of pumping the liquid containing nanobubbles;
applying a second ultrasonic vibration to the liquid containing nanobubbles during the step of soaking and leaving undisturbed the liquid pathways;
cleaning the liquid pathways using an acid cleaning solution after the step of soaking and leaving undisturbed the liquid pathways;
cleaning the liquid pathways using second hot water after the step of cleaning using the acid cleaning solution;
cleaning the liquid pathways using a caustic cleaning solution after the step of cleaning using the second hot water, and
cleaning the liquid pathways using third hot water after the step of cleaning using the caustic cleaning solution,
wherein a period of the step of cleaning the liquid pathways using the acid cleaning solution is shorter than a period of the step of cleaning the liquid pathways using the second hot water,
wherein a period of the step of cleaning the liquid pathways using the caustic cleaning solution is shorter than a period of the step of cleaning the liquid pathways using the third hot water, and
wherein the nanobubbles are adsorbed onto contaminants adhered on a surface of the liquid pathways by an absorption action of the nanobubbles during the step of soaking and leaving undisturbed the liquid pathways.
2. The instrument-cleaning method according to claim 1 , wherein the nanobubbles are formed of ozone gas.
3. The instrument-cleaning method according to claim 1 , wherein the nanobubbles are formed of nitrogen gas.
4. The instrument-cleaning method according to claim 1 , further comprising the step of:
introducing the liquid containing nanobubbles into small gaps in the liquid pathways during at least one of the steps of soaking and leaving undisturbed the liquid pathways or applying a second ultrasonic vibration to the liquid.
5. The instrument-cleaning method according to claim 1 , wherein the period of the step of cleaning the liquid pathways using the acid cleaning solution is 3/10 with respect to the period of the step of cleaning the liquid pathways using the second hot water.
6. The instrument-cleaning method according to claim 1 , wherein the period of the step of cleaning the liquid pathways using the caustic cleaning solution is 9/20 with respect to the period of the step of cleaning the liquid pathways using the third hot water.
7. The instrument-cleaning method according to claim 1 , wherein the prescribed period of the step of soaking and leaving undisturbed the liquid pathways is in the range of 1 to 30 minutes.
8. The instrument-cleaning method according to claim 7 , wherein the nanobubbles are formed of ozone gas.
9. The instrument-cleaning method according to claim 1 , further comprising:
cleaning the liquid pathways using a chemical after the step of soaking and leaving undisturbed the liquid pathways.
10. The instrument-cleaning method according to claim 9 , wherein the nanobubbles are formed of ozone gas.
11. The instrument-cleaning method according to claim 9 , wherein the prescribed period of the step of soaking and leaving undisturbed the liquid pathways is in the range of 1 to 30 minutes.
12. The instrument-cleaning method according to claim 11 , wherein the nanobubbles are formed of ozone gas.
13. The instrument-cleaning method according to claim 1 , wherein the liquid is water.
14. The instrument-cleaning method according to claim 13 , wherein the nanobubbles are formed of ozone gas.
15. The instrument-cleaning method according to claim 13 , wherein the prescribed period of the step of soaking and leaving undisturbed the liquid pathways is in the range of 1 to 30 minutes.
16. The instrument-cleaning method according to claim 15 , wherein the nanobubbles are formed of ozone gas.
17. The instrument-cleaning method according to claim 13 , further comprising:
cleaning the liquid pathways using a chemical after the step of soaking and leaving undisturbed the liquid pathways.
18. The instrument-cleaning method according to claim 17 , wherein the nanobubbles are formed of ozone gas.
19. The instrument-cleaning method according to claim 17 , wherein the prescribed period of the step of soaking and leaving undisturbed the liquid pathways is in the range of 1 to 30 minutes.
20. The instrument-cleaning method according to claim 19 , wherein the nanobubbles are formed of ozone gas.