IP Library › Granted Patent US 9,200,372
Granted Patent B2
US 9,200,372 · App. 13/657,367 · Granted Dec 1, 2015

Passivation composition and process

Inventors: William A. Wojtczak (Austin, TX); Bing Du (Gilbert, AZ); Tomonori Takahashi (Mesa, AZ)
Assignee: Fujifilm Electronic Materials U.S.A., Inc.
C23F1/44C23C22/48C23F1/16H01L21/02H01L21/321H01L21/32134H01L21/28518
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Quick Facts
Patent No.
US 9,200,372
App. No.
13/657,367
Granted
Dec 1, 2015
Kind
B2
Abstract

This disclosure relates to a passivation composition containing at least one sulfonic acid, at least one compound containing a nitrate or nitrosyl ion, and water. The passivation composition is substantially free of a halide ion.

Claims (51)

1. A passivation composition, comprising:

from about 55% by weight to about 75% by weight of at least one sulfonic acid;

at least one compound containing a nitrate or nitrosyl ion; and

water;

wherein the composition comprises from about 0.1% by weight to about 20% by weight of the nitrate or nitrosyl ion and is free of a halide ion.

2. The composition of claim 1 , wherein the composition has a pH at most about 2.

3. The composition of claim 1 , wherein the composition comprises from about 0.5% by weight to about 10% by weight of the nitrate or nitrosyl ion.

4. The composition of claim 1 , wherein the at least one compound containing a nitrate or nitrosyl ion comprises nitric acid.

5. The composition of claim 1 , wherein the composition comprises a first sulfonic acid and a second sulfonic acid.

6. The composition of claim 5 , wherein the first sulfonic acid is a compound of formula (1):

R 1 SO 3 H  (1),

in which R 1 is unsubstituted C 1 -C 4 straight or branched alkyl.

7. The composition of claim 6 , wherein the first sulfonic acid is methanesulfonic acid.

8. The composition of claim 5 , wherein the second sulfonic acid comprises a compound of formula (2):

in which

each of R 2 , R 3 , and R 4 , independently, is C 1 -C 12 straight or branched alkyl, C 3 -C 12 cyclic alkyl, F, Cl, or Br;

R 5 is H; and

each of a, b, c, and n, independently, is 0, 1, 2, or 3 provided that the sum of a, b, and c is n.

9. The composition of claim 8 , wherein the second sulfonic acid is p-toluenesulfonic acid.

10. The composition of claim 1 , wherein the composition consists essentially of the at least one sulfonic acid, the at least one compound containing a nitrate or nitrosyl ion; and the water.

11. A passivation composition, comprising:

a first sulfonic acid of formula (1):

R 1 SO 3 H  (1),

in which R 1 is unsubstituted C 1 -C 4 straight or branched alkyl;

a second sulfonic acid of formula (2):

in which each of R 2 , R 3 , and R 4 , independently, is C 1 -C 12 straight or branched alkyl, C 3 -C 12 cyclic alkyl, F, Cl, or Br; R 5 is H; and each of a, b, c, and n, independently, is 0, 1, 2, or 3 provided that the sum of a, b, and c is n;

at least one compound containing a nitrate or nitrosyl ion; and

water;

wherein the composition is free of a halide ion and the composition comprises from about 0.1% by weight to about 20% by weight of the nitrate or nitrosyl ion.

12. The composition of claim 11 , wherein the composition has a pH at most about 2.

13. The composition of claim 11 , wherein the composition comprises from about 0.5% by weight to about 10% by weight of the nitrate or nitrosyl ion.

14. The composition of claim 11 , wherein the at least one compound containing a nitrate or nitrosyl ion comprises nitric acid.

15. The composition of claim 11 , wherein the first sulfonic acid is methanesulfonic acid.

16. The composition of claim 11 , wherein the second sulfonic acid is p-toluenesulfonic acid.

17. The composition of claim 11 , wherein the first and second sulfonic acids are from about 55% by weight to about 90% by weight of the composition.

18. The composition of claim 11 , wherein the composition consists essentially of the first and second sulfonic acids, the at least one compound containing a nitrate or nitrosyl ion, and the water.

19. A passivation composition, comprising:

a first sulfonic acid of formula (1):

R 1 SO 3 H  (1),

in which R 1 is unsubstituted C 1 -C 4 straight or branched alkyl;

a second sulfonic acid of formula (2):

in which each of R 2 , R 3 , and R 4 , independently, is C 1 -C 12 straight or branched alkyl, C 3 -C 12 cyclic alkyl, F, Cl, or Br; R 5 is H; and each of a, b, c, and n, independently, is 0, 1, 2, or 3 provided that the sum of a, b, and c is n;

at least one compound containing a nitrate or nitrosyl ion; and

water;

wherein the composition is free of a halide ion and the first and second sulfonic acids are from about 55% by weight to about 90% by weight of the composition.

20. The composition of claim 19 , wherein the composition has a pH at most about 2.

21. The composition of claim 19 , wherein the composition comprises from about 0.5% by weight to about 10% by weight of the nitrate or nitrosyl ion.

22. The composition of claim 19 , wherein the at least one compound containing a nitrate or nitrosyl ion comprises nitric acid.

23. The composition of claim 19 , wherein the first sulfonic acid is methanesulfonic acid.

24. The composition of claim 19 , wherein the second sulfonic acid is p-toluenesulfonic acid.

25. The composition of claim 19 , wherein the composition consists essentially of the first and second sulfonic acids, the at least one compound containing a nitrate or nitrosyl ion, and the water.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 15, 2012
From: KRUPA, FRANK J.; WOJTCZAK, WILLIAM A.; DU, BING; TAKAHASHI, TOMONORI
To: FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
Reel/Frame 029300/0948 →
Continuity (2)
Provisional Application 61550041 · Oct 21, 2011
Related Publication 20130122701A1 · May 16, 2013