Passivation composition and process
View Patent ↗This disclosure relates to a passivation composition containing at least one sulfonic acid, at least one compound containing a nitrate or nitrosyl ion, and water. The passivation composition is substantially free of a halide ion.
1. A passivation composition, comprising:
from about 55% by weight to about 75% by weight of at least one sulfonic acid;
at least one compound containing a nitrate or nitrosyl ion; and
water;
wherein the composition comprises from about 0.1% by weight to about 20% by weight of the nitrate or nitrosyl ion and is free of a halide ion.
2. The composition of claim 1 , wherein the composition has a pH at most about 2.
3. The composition of claim 1 , wherein the composition comprises from about 0.5% by weight to about 10% by weight of the nitrate or nitrosyl ion.
4. The composition of claim 1 , wherein the at least one compound containing a nitrate or nitrosyl ion comprises nitric acid.
5. The composition of claim 1 , wherein the composition comprises a first sulfonic acid and a second sulfonic acid.
6. The composition of claim 5 , wherein the first sulfonic acid is a compound of formula (1):
R 1 SO 3 H (1),
in which R 1 is unsubstituted C 1 -C 4 straight or branched alkyl.
7. The composition of claim 6 , wherein the first sulfonic acid is methanesulfonic acid.
8. The composition of claim 5 , wherein the second sulfonic acid comprises a compound of formula (2):
in which
each of R 2 , R 3 , and R 4 , independently, is C 1 -C 12 straight or branched alkyl, C 3 -C 12 cyclic alkyl, F, Cl, or Br;
R 5 is H; and
each of a, b, c, and n, independently, is 0, 1, 2, or 3 provided that the sum of a, b, and c is n.
9. The composition of claim 8 , wherein the second sulfonic acid is p-toluenesulfonic acid.
10. The composition of claim 1 , wherein the composition consists essentially of the at least one sulfonic acid, the at least one compound containing a nitrate or nitrosyl ion; and the water.
11. A passivation composition, comprising:
a first sulfonic acid of formula (1):
R 1 SO 3 H (1),
in which R 1 is unsubstituted C 1 -C 4 straight or branched alkyl;
a second sulfonic acid of formula (2):
in which each of R 2 , R 3 , and R 4 , independently, is C 1 -C 12 straight or branched alkyl, C 3 -C 12 cyclic alkyl, F, Cl, or Br; R 5 is H; and each of a, b, c, and n, independently, is 0, 1, 2, or 3 provided that the sum of a, b, and c is n;
at least one compound containing a nitrate or nitrosyl ion; and
water;
wherein the composition is free of a halide ion and the composition comprises from about 0.1% by weight to about 20% by weight of the nitrate or nitrosyl ion.
12. The composition of claim 11 , wherein the composition has a pH at most about 2.
13. The composition of claim 11 , wherein the composition comprises from about 0.5% by weight to about 10% by weight of the nitrate or nitrosyl ion.
14. The composition of claim 11 , wherein the at least one compound containing a nitrate or nitrosyl ion comprises nitric acid.
15. The composition of claim 11 , wherein the first sulfonic acid is methanesulfonic acid.
16. The composition of claim 11 , wherein the second sulfonic acid is p-toluenesulfonic acid.
17. The composition of claim 11 , wherein the first and second sulfonic acids are from about 55% by weight to about 90% by weight of the composition.
18. The composition of claim 11 , wherein the composition consists essentially of the first and second sulfonic acids, the at least one compound containing a nitrate or nitrosyl ion, and the water.
19. A passivation composition, comprising:
a first sulfonic acid of formula (1):
R 1 SO 3 H (1),
in which R 1 is unsubstituted C 1 -C 4 straight or branched alkyl;
a second sulfonic acid of formula (2):
in which each of R 2 , R 3 , and R 4 , independently, is C 1 -C 12 straight or branched alkyl, C 3 -C 12 cyclic alkyl, F, Cl, or Br; R 5 is H; and each of a, b, c, and n, independently, is 0, 1, 2, or 3 provided that the sum of a, b, and c is n;
at least one compound containing a nitrate or nitrosyl ion; and
water;
wherein the composition is free of a halide ion and the first and second sulfonic acids are from about 55% by weight to about 90% by weight of the composition.
20. The composition of claim 19 , wherein the composition has a pH at most about 2.
21. The composition of claim 19 , wherein the composition comprises from about 0.5% by weight to about 10% by weight of the nitrate or nitrosyl ion.
22. The composition of claim 19 , wherein the at least one compound containing a nitrate or nitrosyl ion comprises nitric acid.
23. The composition of claim 19 , wherein the first sulfonic acid is methanesulfonic acid.
24. The composition of claim 19 , wherein the second sulfonic acid is p-toluenesulfonic acid.
25. The composition of claim 19 , wherein the composition consists essentially of the first and second sulfonic acids, the at least one compound containing a nitrate or nitrosyl ion, and the water.