IP Library Granted Patent US 9,225,313
Granted Patent B2
US 9,225,313 · App. 13/662,425 · Granted Dec 29, 2015

Bulk acoustic wave resonator having doped piezoelectric layer with improved piezoelectric characteristics

Inventors: Paul Bradley (Los Altos, CA); John D. Larson, III (Palo Alto, CA); Steve Gilbert (San Francisco, CA); Kevin J. Grannen (Thornton, CO); Ivan Ionash (Fort Collins, CO); Chris Feng (Fort Collins, CO); Tina Lamers (Fort Collins, CO); John Choy (Westminster, CO)
Assignee: Avago Technologies General IP (Singapore) Pte. Ltd.
H03H9/02015H03H9/02031H03H9/132H03H9/173H03H9/175
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Quick Facts
Patent No.
US 9,225,313
App. No.
13/662,425
Granted
Dec 29, 2015
Kind
B2
Abstract

A bulk acoustic wave (BAW) resonator structure includes a first electrode disposed over a substrate, a piezoelectric layer disposed over the first electrode and a second electrode disposed over the first piezoelectric layer. The piezoelectric layer is formed of a piezoelectric material doped with one of erbium or yttrium at an atomic percentage of greater than three for improving piezoelectric properties of the piezoelectric layer.

Claims (26)

1. A bulk acoustic wave (BAW) resonator structure, comprising:

a first electrode disposed over a substrate;

a piezoelectric layer disposed over the first electrode, the piezoelectric layer comprising a piezoelectric material doped with erbium at an atomic percentage of greater than three for improving piezoelectric properties of the piezoelectric layer; and

a second electrode disposed over the piezoelectric layer.

2. The BAW resonator according to claim 1 , wherein the piezoelectric material comprises aluminum nitride (AlN).

3. The BAW resonator according to claim 2 , wherein the erbium is incorporated into a crystal lattice of the AlN.

4. The BAW resonator according to claim 2 , wherein a concentration of the erbium is less than approximately 10 atomic percent of the piezoelectric material.

5. The BAW resonator according to claim 2 , wherein a concentration of the erbium is less than approximately 40 atomic percent of the piezoelectric material.

6. The BAW resonator according to claim 2 , wherein the piezoelectric layer is provided using a target formed of an alloy comprising aluminum and the erbium, and sputtering the aluminum alloy from the target over the first electrode using a plasma comprising nitrogen.

7. The BAW resonator according to claim 2 , wherein the piezoelectric layer is provided using a plurality of targets formed of aluminum and the erbium, respectively, and sputtering the aluminum and the erbium from the corresponding targets over the first electrode using a plasma comprising nitrogen.

8. The BAW resonator according to claim 1 , wherein the substrate defines a cavity over which the first electrode is formed.

9. The BAW resonator according to claim 1 , further comprising:

an acoustic reflector formed on the substrate between the substrate and the first electrode.

10. A bulk acoustic wave (BAW) resonator structure, comprising:

a first electrode disposed over a substrate;

a piezoelectric layer disposed over the first electrode, the piezoelectric layer comprising a piezoelectric material doped with yttrium at an atomic percentage of greater than three for improving piezoelectric properties of the piezoelectric layer; and

a second electrode disposed over the piezoelectric layer.

11. The BAW resonator according to claim 10 , wherein the piezoelectric material comprises aluminum nitride (AlN).

12. The BAW resonator according to claim 11 , wherein the yttrium is incorporated into a crystal lattice of the AlN.

13. The BAW resonator according to claim 11 , wherein a concentration of the yttrium is less than approximately 10 atomic percent of the piezoelectric material.

14. The BAW resonator according to claim 11 , wherein a concentration of the yttrium is less than approximately 40 atomic percent of the piezoelectric material.

15. The BAW resonator according to claim 11 , wherein the piezoelectric layer is provided using a target formed of an alloy comprising aluminum and the yttrium, and sputtering the aluminum alloy from the target over the first electrode using a plasma comprising nitrogen.

16. The BAW resonator according to claim 11 , wherein the piezoelectric layer is provided using a plurality of targets formed of aluminum and the yttrium, respectively, and sputtering the aluminum and the yttrium from the corresponding targets over the first electrode using a plasma comprising nitrogen.

17. The BAW resonator according to claim 10 , wherein the substrate defines a cavity over which the first electrode is formed.

18. The BAW resonator according to claim 10 , further comprising:

an acoustic reflector formed on the substrate between the substrate and the first electrode.

Assignments (7)
CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE PREVIOUSLY RECORDED AT REEL: 047422 FRAME: 0464. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Recorded Mar 6, 2019
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 048883/0702 →
MERGER Recorded Oct 5, 2018
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 047422/0464 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS Recorded Feb 3, 2017
From: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 041710/0001 →
PATENT SECURITY AGREEMENT Recorded Feb 11, 2016
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 037808/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032851-0001) Recorded Feb 2, 2016
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 037689/0001 →
PATENT SECURITY AGREEMENT Recorded May 8, 2014
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 032851/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 6, 2012
From: BRADLEY, PAUL; LARSON, JOHN D., III; GILBERT, STEVE; GRANNEN, KEVIN J.; IONASH, IVAN; FENG, CHRIS; LAMERS, TINA; CHOY, JOHN
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 029422/0503 →
Continuity (1)
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