IP Library › Granted Patent US 8,968,582
Granted Patent B2
US 8,968,582 · App. 13/674,492 · Granted Mar 3, 2015

Device for electrical characterization of molecules using CNT-nanoparticle-molecule-nanoparticle-CNT structure

Inventors: Aaron D. Franklin (Croton on Hudson, NY); Joshua T. Smith (Croton on Hudson, NY); George S. Tulevski (White Plains, NY)
Assignee: International Business Machines Corporation
H01B13/00H05K1/0296B82Y40/00Y10S977/742
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Quick Facts
Patent No.
US 8,968,582
App. No.
13/674,492
Granted
Mar 3, 2015
Kind
B2
Abstract

A method of forming an electrode is disclosed. A carbon nanotube is deposited on a substrate. A section of the carbon nanotube is removed to form at least one exposed end defining a first gap. A metal is deposited at the at least one exposed end to form the electrode that defines a second gap.

Claims (25)

1. A method of forming electrodes, comprising:

depositing a carbon nanotube on a substrate;

removing a section of the carbon nanotube to form a first carbon nanotube segment having a first exposed end and a second carbon nanotube segment having a second exposed end, wherein the exposed end of the first carbon nanotube segment and the exposed end of the second carbon nanotube segment define a first gap; and

depositing a metal at the exposed end of the first carbon nanotube segment to form a first electrode and at the exposed end of the second carbon nanotube to form a second electrode, wherein the first electrode and the second electrode define a second gap.

2. The method of claim 1 , wherein depositing the metal further comprises electroless deposition of the metal at the at least one of the first exposed end and the second exposed end.

3. The method of claim 1 further comprising controlling at least one of: (i) a length of the deposited metal; and (ii) a rate of ion growth at the first exposed end and the second exposed end in order to obtain the second gap having a selected length.

4. The method of claim 1 , wherein removing the section of the carbon nanotube further comprises performing lithography forming a window in a resist layer formed on the carbon nanotube, wherein a dimension of the window is about a length of the first gap.

5. The method of claim 1 , wherein a length of the first gap is greater than about 10 nanometers.

6. The method of claim 1 , wherein a length of the second gap is less than about 10 nanometers.

7. A method of forming a molecular dock, comprising:

depositing a carbon nanotube on a substrate;

removing a section of the carbon nanotube to form a first carbon nanotube segment having a first exposed end and a second carbon nanotube segment having a second exposed end, wherein the first exposed end and the second exposed end define a first gap;

depositing a metal at the exposed end of the first carbon nanotube segment to form a first electrode; and

depositing a metal at the exposed end of the second carbon nanotube segment to form a second electrode, wherein the first electrode and the second electrode define a second gap that forms the molecular dock.

8. The method of claim 7 , wherein depositing the metal further comprises performing electroless deposition of the metal at the first exposed end and second exposed end.

9. The method of claim 7 further comprising selecting a length of the first gap and at least one of: (i) a length of the deposited metal; and (ii) a rate of ion growth at the first exposed end and the second exposed end in order to form the molecular dock to have the second gap of a selected length.

10. The method of claim 7 , wherein removing the section of the carbon nanotube further comprises etching the carbon nanotube over a length scale over which etching is a substantially controllable process.

11. The method of claim 10 , wherein a length of the first gap is greater than about 10 nanometers.

12. The method of claim 7 , wherein a length of the second gap is less than about 10 nanometers.

13. A method of controlling a separation between carbon nanotube electrodes, comprising:

removing a section of a carbon nanotube to produce a first carbon nanotube segment having a first exposed end and a second carbon nanotube segment having a second exposed end, wherein the exposed end of the first carbon nanotube segment and the exposed end of the second carbon nanotube segment define a first gap having a first gap length; and

depositing a metal of a selected length at the exposed end of the first carbon nanotube segment to form a first electrode and at the exposed end of the second carbon nanotube segment to form a second electrode in order to form a second gap separating the first second electrode and the second electrode.

14. The method of claim 13 , wherein depositing the metal in the first gap further comprises performing electroless deposition of the metal at the first exposed end and the second exposed end.

15. The method of claim 13 , wherein removing the section of the carbon nanotube further comprises etching the section of the carbon nanotube over a selected length over which etching is a controllable process.

16. The method of claim 13 , wherein a length of the first gap is greater than about 8 nanometers and a length of the second gap is less than about 10 nanometers.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 12, 2012
From: FRANKLIN, AARON D.; SMITH, JOSHUA T.; TULEVSKI, GEORGE S.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 029281/0585 →
Continuity (1)
Related Publication 20140131304A1 · May 15, 2014