IP Library Granted Patent US 8,564,016
Granted Patent B2
US 8,564,016 · App. 13/678,333 · Granted Oct 22, 2013

Vertical topology light emitting device

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Quick Facts
Patent No.
US 8,564,016
App. No.
13/678,333
Granted
Oct 22, 2013
Kind
B2
Abstract

A vertical topology light emitting device comprises a conductive adhesion structure having a first surface and a second surface; a conductive support structure on the first surface; a reflective structure on the second surface, the reflective structure also serving as a first electrode; a semiconductor structure on the reflective structure; and a second electrode on the semiconductor structure.

Claims (37)

1. A vertical topology light emitting device, comprising:

a conductive support structure comprising Cu;

a first adhesion layer disposed on the conductive support structure, the first adhesion layer comprising Au;

a second adhesion layer disposed on the first adhesion layer;

a first metal layer disposed on the second adhesion layer;

a second metal layer disposed on a surface of the first metal layer, the second metal layer comprising Ti;

a GaN-based semiconductor structure disposed on the second metal layer;

an inter-layer disposed on the GaN-based semiconductor structure; and

a metal contact disposed on the inter-layer,

wherein the first metal layer directly contacts the second metal layer, and

wherein the second metal layer directly contacts the GaN-based semiconductor structure.

2. The device according to claim 1 , wherein the metal contact comprises Au and Pt.

3. The device according to claim 1 , wherein the first adhesion layer directly contacts the second adhesion layer.

4. The device according to claim 1 , wherein the GaN-based semiconductor structure is less than 5 microns thick.

5. The device according to claim 1 , wherein the inter-layer is configured to enhance adhesion.

6. The device according to claim 1 , wherein metal contact has a diameter of about 100 microns.

7. The device according to claim 1 , wherein the second metal layer serves as an electrode.

8. The device according to claim 1 , wherein the first metal layer is configured to reflect light from the GaN-based semiconductor structure.

9. The device according to claim 8 , wherein the surface of the first metal layer is a dominant reflective surface.

10. The device according to claim 1 , wherein the first adhesion layer is thicker than the second adhesion layer.

11. The device according to claim 1 , further comprising a reflective p-type metal contact which contacts the GaN-based semiconductor structure.

12. The device according to claim 1 , wherein the first metal layer is thicker than the second metal layer.

13. A vertical topology light emitting device, comprising:

a conductive support structure comprising Cu;

a first adhesion layer disposed on the conductive support structure, the first adhesion layer comprising Au;

a second adhesion layer disposed on the first adhesion layer;

a first metal layer disposed on the second adhesion layer, the first metal layer consisting of Al;

a second metal layer disposed on a surface of the first metal layer, the second metal layer comprising Ti; and

a GaN-based semiconductor structure disposed over the first adhesion layer, wherein the second metal layer directly contacts the GaN-based semiconductor structure,

wherein the second metal layer serves as an n-type electrode to the GaN-based semiconductor structure.

14. The device according to claim 13 , wherein the first metal layer is configured to reflect light from the GaN-based semiconductor structure.

15. The device according to claim 14 , wherein the surface of the first metal layer is dominant reflective surface.

16. The device according to claim 13 , wherein the first adhesion layer is thicker than the second adhesion layer.

17. The device according to claim 13 , wherein the first metal layer is thicker than the second metal layer.

18. The device according to claim 13 , wherein the conductive support structure is less than about 100 microns thick.

19. The device according to claim 13 , wherein the first adhesion layer contacts the conductive support structure.

20. The device according to claim 13 , further comprising a transparent p-type metal contact which contacts the GaN-based semiconductor structure.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 25, 2021
From: LG INNOTEK CO., LTD.
To: SUZHOU LEKIN SEMICONDUCTOR CO., LTD.
Reel/Frame 056366/0335 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 15, 2013
From: LG ELECTRONICS, INC.
To: LG INNOTEK CO. LTD.
Reel/Frame 031410/0169 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 15, 2012
From: YOO, MYUNG CHEOL
To: LG ELECTRONICS INC.
Reel/Frame 029307/0070 →