IP Library Granted Patent US 9,359,691
Granted Patent B2
US 9,359,691 · App. 13/685,323 · Granted Jun 7, 2016

Method of loading a charge of polysilicon into a crucible

Inventors: Umberto Martini (Merano, IT); Luigi Bonanno (Merano, IT); Paolo Collareta (Merano, IT); Maria Porrini (Merano, IT)
Assignee: MEMC Electronic Materials SpA
C30B15/10C30B11/04C30B15/02C30B29/06Y10T117/1032
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Quick Facts
Patent No.
US 9,359,691
App. No.
13/685,323
Granted
Jun 7, 2016
Kind
B2
Abstract

A method of loading a crucible includes loading a first layer of polysilicon chunks into the crucible and loading a second layer of granular polysilicon into the crucible to form a polysilicon charge such that the packing density of the polysilicon charge within the crucible is greater than 0.70.

Claims (36)

1. A method of loading a crucible, comprising:

loading a first layer of polysilicon chunks into the crucible;

loading a second layer of granular polysilicon into the crucible; and

loading a third layer of polysilicon particles into the crucible such that the following equation is satisfied:

PD C =PD L +(1−PD L )PD M +(1−PD L )(1−PD M )PD S ,

wherein:

PD C is a packing density of a charge of polysilicon within the crucible;

PD L is a packing density of the polysilicon chunks;

PD M is a packing density of the polysilicon particles; and

PD S is a packing density of the polysilicon granules, and wherein the packing density of polysilicon within the crucible is greater than about 0.70.

2. A method of loading a crucible according to claim 1 , wherein the polysilicon particles are smaller than the polysilicon chunks and larger than the polysilicon granules.

3. A method of loading a crucible according to claim 1 , wherein the crucible is loaded such that the packing density of polysilicon within the crucible is between about 0.70 and about 0.90.

4. A method of loading a crucible according to claim 1 , further comprising classifying bulk polysilicon material into the polysilicon chunks having a large particle dimension and polysilicon granules having a small particle dimension, wherein a ratio of the large particle dimension to the small particle dimension is greater than about 7:1.

5. A method of loading a crucible according to claim 4 , wherein the ratio of the large particle dimension to the small particle dimension is about 10:1.

6. A method of loading a crucible according to claim 4 , wherein the ratio of the large particle dimension to the small particle dimension is about 100:1.

7. A method of loading a crucible according to claim 1 , wherein loading a second layer of granular polysilicon into the crucible includes loading the second layer of granular polysilicon after adding the first quantity of polysilicon chunks.

8. A method of loading a crucible according to claim 1 , further comprising alternately providing a plurality of layers of the polysilicon chunks and layers of the polysilicon granules.

9. A method of loading a crucible according to claim 8 , further comprising providing the layers of the polysilicon chunks and the layers of the polysilicon granules until a total weight of the polysilicon chunks and polysilicon granules within the crucible is at least 90 kilograms.

10. A method of loading a crucible according to claim 8 , wherein each layer of polysilicon chunks weighs about 10 kg to about 15 kg and each layer of granular polysilicon weighs about 10 kg to about 15 kg.

11. A method of loading a crucible according to claim 8 , wherein providing the layers includes providing a top layer of polysilicon chunks.

12. A method of loading a crucible according to claim 1 , wherein the crucible is loaded such that a height of the polysilicon charge does not extend past a rim of the crucible.

13. A method of loading a crucible according to claim 1 , further comprising exhausting polysilicon dust using a vacuum.

14. A crucible comprising:

a first layer of polysilicon chunks within the crucible;

a second layer of granular polysilicon within the crucible;

a third layer of polysilicon particles within the crucible;

wherein the following equation is satisfied:

PD C =PD L +(1−PD L )PD M +(1−PD L )(1−PD M )PD S ,

wherein:

PD C is the packing density of the charge of polysilicon within the crucible;

PD L is a packing density of the polysilicon chunks;

PD M is a packing density of the polysilicon particles; and

PD S is a packing density of the polysilicon granules; and

wherein the packing density of the combination of the first layer, the second layer, and the third layer of polysilicon within the crucible is greater than about 0.70.

15. A crucible according to claim 14 , wherein the polysilicon particles are smaller than the polysilicon chunks and larger than the polysilicon granules.

16. A crucible according to claim 14 , wherein the packing density of polysilicon within the crucible is between about 0.70 and about 0.90.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 7, 2018
From: SUNEDISON SEMICONDUCTOR LIMITED; MEMC JAPAN LIMITED; MEMC ELECTRONIC MATERIALS S.P.A.
To: GLOBALWAFERS CO., LTD.
Reel/Frame 046327/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 21, 2013
From: MARTINI, UMBERTO; BONANNO, LUIGI; COLLARETA, PAOLO; PORRINI, MARIA
To: MEMC ELECTRONIC MATERIALS SPA
Reel/Frame 030455/0565 →
Continuity (2)
Continuation PCTIT2012000270 · Sep 5, 2012
Related Publication 20140060422A1 · Mar 6, 2014