IP Library Granted Patent US 9,451,686
Granted Patent B2
US 9,451,686 · App. 13/687,067 · Granted Sep 20, 2016

Hybrid plasma reactor

Inventor: Dae-Kyu Choi (Gyeonggi-do, KR)
Assignee: Dae-Kyu Choi
H05H1/46H05H2001/4652H05H2001/4675H05H2001/4682
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Quick Facts
Patent No.
US 9,451,686
App. No.
13/687,067
Granted
Sep 20, 2016
Kind
B2
Abstract

A hybrid plasma reactor includes a reactor body having a plasma discharge space, a gas inlet, and a gas outlet; a hybrid plasma source including a first hybrid electrode and a second hybrid electrode, which face each other while the reactor body is positioned therebetween and provide a current path having one or more turns, to be inductively and capacitively coupled to plasma formed in the plasma discharge space; and an alternating switching power supply for supplying plasma generation power to the first hybrid electrode and the second hybrid electrode. The hybrid plasma reactor can complexly generate capacitively coupled plasma and inductively coupled plasma, thereby achieving a wide operation area from a low-pressure area to a high-pressure area.

Claims (17)

1. A hybrid plasma reactor comprising:

a reactor body having a plasma discharge space, a gas inlet, and a gas outlet;

a hybrid plasma source including a first hybrid electrode having a disk-shaped donut structure and a second hybrid electrode having a disk-shaped donut structure with a section cut to align with and receive the first hybrid electrode, so that the first and second hybrid electrodes partially surround the reactor body positioned therebetween when aligned and assembled to each other, and provide a current path having one or more turns, to be inductively and capacitively coupled to plasma formed in the plasma discharge space; and

an alternating switching power supply for supplying plasma generation power to the first hybrid electrode and the second hybrid electrode,

wherein a capacitively coupled plasma is formed in the plasma discharge space when the first and second hybrid electrodes function as the capacitive coupling electrodes, and

wherein an inductively coupled plasma is formed when the first and second hybrid electrodes create a current path having at least one turn due to a disconnected interval in the plasma discharge space, complexly generating inductively coupled plasma and capacitively coupled plasma.

2. The hybrid plasma reactor according to claim 1 , further comprising a magnetic core for focusing a magnetic field created by the current path having one or more turns provided by the first hybrid electrode and the second hybrid electrode.

3. The hybrid plasma reactor according to claim 1 , wherein the reactor body has a hollow ring-shaped structure.

4. The hybrid plasma reactor according to claim 1 , further comprising an insulation member installed between the first hybrid electrode and the second hybrid electrode.

5. The hybrid plasma reactor according to claim 1 , wherein the reactor body is formed of a dielectric material.

6. The hybrid plasma reactor according to claim 1 , wherein the first hybrid electrode and the second hybrid electrode are electrically connected to each other.

7. The hybrid plasma reactor according to claim 1 , wherein the first hybrid electrode and the second hybrid electrode are not electrically connected to each other.

8. The hybrid plasma reactor according to claim 1 , further comprising a switching circuit connected between the first hybrid electrode and the second hybrid electrode.

9. The hybrid plasma reactor according to claim 1 , further comprising an inductor or a capacitor connected between the first hybrid electrode and the second hybrid electrode.

10. The hybrid plasma reactor according to claim 1 , further comprising a resistance connected between the first hybrid electrode and the second hybrid electrode.

11. The hybrid plasma reactor according to claim 1 , wherein the first hybrid electrode and the second hybrid electrode comprises a cooling channel.

12. The hybrid plasma reactor according to claim 1 , wherein the first hybrid electrode and the second hybrid electrode comprise multiple overlapped electrode plates for forming the current path having one or more turns.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 7, 2019
From: CHOI, DAI KYU
To: NEW POWER PLASMA CO., LTD.
Reel/Frame 050635/0411 →
Priority Claims (1)
KR 10-2011-0124717 · Nov 28, 2011 · national
Continuity (1)
Related Publication 20130154480A1 · Jun 20, 2013