Photosensitive polymides

1. A photosensitive polyimide having a structure represented by formula (I):

wherein

B and D are the same or different, and each independently is a divalent organic group;

A is a tetravalent organic group containing at least one modifying group R′, J is a tetravalent organic group without a modifying group R′, n is an integer of greater than 0, and m is an integer of greater than 0,

R′ is a group selected from:

wherein R is a group selected from:

wherein

R1 is a substituted or unsubstituted C1-C20 saturated or unsaturated organic group; and

R2 is a vinyl-containing unsaturated group.

2. The photosensitive polyimide according to claim 1 , wherein the vinyl-containing unsaturated group is selected from the following groups:

wherein

each of R4 and R5 is independently H or a substituted or unsubstituted C1-C5 alkyl group, and

R6 is a covalent bond or a substituted or unsubstituted C1-C20 organic group.

3. The photosensitive polyimide according to claim 1 , wherein the vinyl-containing unsaturated group is selected from the following groups:

wherein z is an integer of 0-6.

4. The photosensitive polyimide according to claim 1 , wherein R1 is selected from the following groups:

wherein

o, p, q and r are each independently an integer of 0 or greater than 0;

each of R4 and R5 is independently H or a substituted or unsubstituted C1-C5 alkyl group;

R6 is a covalent bond or a substituted or unsubstituted C1-C20 organic group;

R7 is H or a substituted or unsubstituted C1-C12 organic group; and

R8 is a covalent bond or an organic group selected from:

5. The photosensitive polyimide according to claim 4 , wherein R1 is a group selected from:

6. The photosensitive polyimide according to claim 1 , wherein A is selected from the group consisting of:

wherein

R′ has the same meaning as defined in claim 1 ;

R 13 is —CH 2 —, —O—, —S—, —CO—, —SO 2 —, —C(CH 3 ) 2 — or —C(CF 3 ) 2 —;

R 14 is —H or —CH 3 —;

X is —O—, —NH— or —S—.

7. The photosensitive polyimide according to claim 1 , wherein A is selected from the group consisting of:

wherein R′ has the same meaning as defined in claim 1 .

8. The photosensitive polyimide according to claim 1 , wherein J is selected from the group consisting of:

wherein

R 13 is —CH 2 —, —O—, —S—, —CO—, —SO 2 —, —C(CH 3 ) 2 — or —C(CF 3 ) 2 —;

R 14 is —H or —CH 3 —;

X is —O—, —NH— or —S—; and

R 15 is OH, COOH or NH 2 .

9. The photosensitive polyimide according to claim 1 , wherein J is selected from the group consisting of

10. The photosensitive polyimide according to claim 1 , wherein B and D are the divalent organic group selected from the group consisting of:

wherein

R″ is —H, C1-C4 alkyl, C1-C4 perfluoroalkyl, methoxy, ethoxy, halogen, OH, COOH, NH 2 or SH;

R9 is H, methyl or ethyl;

c is an integer of 0-4;

d is an integer of 0-4;

a is an integer of greater than 0;

b is an integer of greater than 0; and

R11 each independently is a covalent bond or a group selected from the following groups:

—O—, —S—, —CH 2 —, —S(O) 2 —,

—C(CF 3 ) 2 —,

—C(O)—, —C(CH 3 ) 2 —,

wherein

w and x are each independently an integer of greater than 0; and

R12 is —S(O) 2 —, —C(O)—, a covalent bond or a substituted or unsubstituted C1-C18 organic group.

11. The photosensitive polyimide according to claim 1 , wherein B and D are the divalent organic group selected from the group consisting of:

wherein y is an integer of 1-12.

12. A photosensitive composition, which comprises, based on the total weight of the composition, at least 1% by weight of the photosensitive polyimide according to claim 1 and at least one photoinitiator.

13. The photosensitive composition according to claim 12 , further comprising a reactive monomer or oligomer.

14. The photosensitive composition according to claim 12 or 13 , which is a liquid photo resist composition or a solid dry film photo resist composition.

15. A photosensitive polyimide having a structure represented by formula (I):

wherein

B and D are the same or different, and each independently is a divalent organic group;

A is selected from the group consisting of:

wherein

R′ is a group selected from:

wherein R is a vinyl-containing unsaturated group or a group selected from:

wherein

R1 is a substituted or unsubstituted C1-C20 saturated or unsaturated organic group; and

R2 is a vinyl-containing unsaturated group;

R 13 is —CH 2 —, —O—, —S—, —CO—, —SO 2 —, —C(CH 3 ) 2 — or —C(CF 3 ) 2 —;

R 14 is —H or —CH 3 —;

X is —O—, —NH— or —S—;

J is a tetravalent organic group without a modifying group R′, n is an integer of greater than 0, and m is an integer of greater than 0.

16. A photosensitive polyimide having a structure represented by formula (I):

wherein

B and D are the same or different, and each independently is a divalent organic group;

A is a tetravalent organic group containing at least one modifying group R′, J is a tetravalent organic group without a modifying group R′, n is an integer of greater than 0, and m is an integer of greater than 0,

R′ is a group selected from:

wherein R is a group selected from:

wherein

R1 is a substituted or unsubstituted C1-C20 saturated or unsaturated organic group; and

R2 is a vinyl-containing unsaturated group, wherein the vinyl-containing unsaturated group is selected from the following groups:

wherein z is an integer of 0-6.