IP Library Granted Patent US 8,804,110
Granted Patent B2
US 8,804,110 · App. 13/703,414 · Granted Aug 12, 2014

Fault inspection device and fault inspection method

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Quick Facts
Patent No.
US 8,804,110
App. No.
13/703,414
Granted
Aug 12, 2014
Kind
B2
Abstract

Proposed is a defect inspection method whereby: illuminating light having a substantially uniform illumination intensity distribution in one direction of a sample surface irradiated on the sample surface; multiple scattered light components, which are output in multiple independent directions, are detected among the scattered light from the sample surface and multiple corresponding scattered light detection signals are obtained; at least one of the multiple scattered light detection signals is processed and the presence of defects is determined; at least one of the multiple scattered light detection signals that correspond to each of the points determined by the processing as a defect is processed and the dimensions of the defect are determined; and the position and dimensions of the defect on the sample surface, at each of the points determined as a defect, are displayed.

Claims (30)

1. A defect inspection device comprising:

an irradiating unit, the irradiating unit comprising:

an illumination light adjusting unit which adjusts light emitted from a light source into illumination light having predetermined irradiation conditions; and

an illumination intensity distribution control unit which controls an illumination intensity so that an illumination intensity in a predetermined detection target area out of an illumination area on a surface of a sample on which the illumination light is irradiated is 50% or more of an illumination intensity at a center position of the illumination light on a surface of the sample and an illumination intensity in an illumination area other than the predetermined detection target area is 0.1% or less of an illumination intensity at a center position of the illumination light on a surface of the sample;

a scanning unit which scans the sample in a direction perpendicular to a longitudinal direction of the illumination area in the irradiating unit;

a detecting unit which detects scattered light generated from a surface of the sample due to illumination light irradiated by the irradiating unit; and

a determining unit, the determining unit comprising:

a defect presence/absence determining unit which processes a detection signal based on scattered light from a surface of the sample detected by the detecting unit and determines presence/absence of a defect on a surface of the sample; and

a defect dimension determining unit which determines, when presence of a defect is determined by the defect presence/absence determining unit, a dimension of the defect;

wherein the illumination intensity distribution control unit comprises:

a light-shielding unit which shields part of an illumination intensity distribution at a position of an intermediate image corresponding to a center position of the illumination light; and

an imaging unit which forms the intermediate image on a surface of the sample.

2. The defect inspection device according to claim 1 , wherein, in the detecting unit, a plurality of scattered light beams scattering due to illumination light irradiated by the irradiating unit, from a surface of the sample, and in mutually different directions are detected, and a detection signal based on the plurality of scattered light beams is detected.

3. The defect inspection device according to claim 1 , wherein, in the illumination intensity distribution control unit, an illumination intensity distribution provided to a surface of the sample is a distribution in a longitudinal direction of the illumination area, which includes a center of a Gaussian distribution and in which an intensity distribution of skirts of a Gaussian distribution away from a center by a desired distance or more is reduced.

4. The defect inspection device according to claim 1 , wherein, in the scanning unit, an amount of scan of the sample is made shorter than a length of an illumination intensity distribution on a surface of the sample obtained by the illumination intensity distribution control unit and scan is performed so that a same defect passes through a plurality of positions mutually different on an illumination intensity distribution.

5. A defect inspection method which comprises:

an irradiating step, the irradiating step comprising:

an illumination-light adjusting step for adjusting light emitted from a light source into illumination light having predetermined irradiation conditions; and

an illumination-intensity-distribution controlling step for controlling an illumination intensity so that an illumination intensity in a predetermined detection target area out of an illumination area on a surface of a sample on which the illumination light is irradiated is 50% or more of an illumination intensity at a center position of the illumination light on a surface of the sample and an illumination intensity in an illumination area other than the predetermined detection target area is 0.1% or less of an illumination intensity at a center position of the illumination light on a surface of the sample;

a scanning step for scanning the sample in a direction perpendicular to a longitudinal direction of the illumination area in the irradiating step;

a detecting step for detecting scattered light generated from a surface of the sample due to illumination light irradiated by the irradiation step; and

a determining step, the determining step comprising:

a defect-presence/absence-determining step for processing a detection signal based on scattered light from a surface of the sample detected in the detecting step and determining presence/absence of a defect on a surface of the sample; and

a defect-dimension-determining step for determining, when presence of a defect is determined in the defect-presence/absence-determining step, a dimension of the defect;

wherein the illumination-intensity-distribution controlling step comprises:

a light-shielding step for shielding part of an illumination intensity distribution at a position of an intermediate image corresponding to a center position of the illumination light; and

an imaging step for forming the intermediate image on a surface of the sample.

6. The defect inspection method according to claim 5 , wherein, in the detecting step, a plurality of scattered light beams scattered due to illumination light irradiated in the irradiating step, from a surface of the sample, and in mutually different directions are detected, and a detection signal based on the plurality of scattered light beams is detected.

7. The defect inspection method according to claim 5 , wherein, in the illumination-intensity-distribution controlling step, the illumination intensity distribution provided to a surface of the sample is a distribution in a longitudinal direction of the illumination area, which includes a center of a Gaussian distribution and in which an intensity distribution of skirts of a Gaussian distribution away from a center by a desired distance or more is reduced.

8. The defect inspection method according to claim 5 , wherein, in the scanning step, an amount of scan of the sample is made shorter than a length of an illumination intensity distribution on a surface of the sample obtained in the illumination-intensity-distribution controlling step and scan is performed so that a same defect passes through a plurality of positions mutually different on an illumination intensity distribution.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 30, 2013
From: URANO, YUTA; MARUYAMA, SHIGENOBU; NAKAO, TOSHIYUKI; HONDA, TOSHIFUMI; SHIBATA, YUKIHIRO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 029725/0520 →