Semiconductor light-emitting device
View Patent ↗A semiconductor light-emitting device including a substrate, an n-type semiconductor layer formed on the substrate, an active layer laminated on the n-type semiconductor layer and capable of emitting a light, a p-type semiconductor layer laminated on the active layer, an n-electrode which is disposed on a lower surface of the semiconductor substrate or on the n-type semiconductor layer and spaced away from the active layer and p-type semiconductor layer, and a p-electrode which is disposed on the p-type semiconductor layer and includes a reflective ohmic metal layer formed on the dot-like metallic layer, wherein the light emitted from the active layer is extracted externally from the substrate side.
1. A semiconductor light-emitting device comprising:
an n-type semiconductor layer comprising at least n-type GaN layer;
a p-type semiconductor layer comprising at least p-type GaN layer;
an active layer interposed between the n-type semiconductor layer and the p-type semiconductor layer and capable of emitting a light;
an n-electrode which is contact with the n-type GaN layer and spaced away from the active layer and p-type semiconductor layer; and
a p-electrode which is contact with the p-type GaN layer and includes a dot-like nickel oxide region in direct contact with the p-type GaN layer and a Ag layer formed on the dot-like nickel oxide region,
wherein the dot-like nickel oxide region is interposed between the p-type GaN layer and the Ag layer.
2. The device according to claim 1 , wherein the dot-like nickel oxide region has a film thickness ranging from 1 to 3 nm.
3. The device according to claim 1 , wherein the dot-like nickel oxide region is formed to have an area ratio ranging from 50% to 85% based on an entire area of the p-electrode.
4. A method of manufacturing a semiconductor light-emitting device according to claim 1 , wherein the p-electrode is formed by a process comprising:
forming the dot-like nickel region on the p-type semiconductor layer;
forming the Ag layer on the dot-like nickel region; and
subjecting the Ag layer to a heat treatment in an atmosphere containing oxygen at a temperature ranging from 350° C. to lower than 600° C.
5. The method according to claim 4 , wherein the dot-like nickel oxide region has a film thickness ranging from 1 nm to 3 nm.
6. The method according to claim 4 , wherein the dot-like nickel oxide region is formed to have an area ratio ranging from 50% to 85% based on an entire area of the p-electrode.
7. The device according to claim 1 , wherein the Ag layer is formed as a reflective electrode.
8. The device according to claim 1 , wherein Ni diffuses into the Ag layer to form an alloy.