IP Library Granted Patent US 8,890,234
Granted Patent B2
US 8,890,234 · App. 13/721,860 · Granted Nov 18, 2014

Nonvolatile semiconductor memory device

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Quick Facts
Patent No.
US 8,890,234
App. No.
13/721,860
Granted
Nov 18, 2014
Kind
B2
Abstract

A nonvolatile semiconductor memory device of an embodiment includes: a semiconductor layer; a tunnel insulating film formed on the semiconductor layer; an organic molecular layer that is formed on the tunnel insulating film, and includes first organic molecules and second organic molecules having a smaller molecular weight than the first organic molecules, the first organic molecules each including a first alkyl chain or a first alkyl halide chain having one end bound to the tunnel insulating film, the first organic molecules each including a charge storage portion bound to the other end of the first alkyl chain or the first alkyl halide chain, the second organic molecules each including a second alkyl chain or a second alkyl halide chain having one end bound to the tunnel insulating film; a block insulating film formed on the organic molecular layer; and a control gate electrode formed on the block insulating film.

Claims (14)

1. A nonvolatile semiconductor memory device comprising:

a semiconductor layer;

a tunnel insulating film formed on the semiconductor layer;

an organic molecular layer formed on the tunnel insulating film, the organic molecular layer including first organic molecules and second organic molecules having a smaller molecular weight than the first organic molecules, the first organic molecules each including a first alkyl chain or a first alkyl halide chain having one end bound to the tunnel insulating film, the first organic molecules each including a charge storage portion bound to the other end of the first alkyl chain or the first alkyl halide chain, the second organic molecules each including a second alkyl chain or a second alkyl halide chain having one end bound to the tunnel insulating film, the second organic molecules each having a permanent dipole;

a block insulating film formed on the organic molecular layer; and

a control gate electrode formed on the block insulating film,

wherein in a case where positive charges are stored in the charge storage portion, an orientation of the permanent dipole is positive on the side of the semiconductor layer and negative on the side of the block insulating film, and in a case where negative charges are stored in the charge storage portion, an orientation of the permanent dipole is negative on the side of the semiconductor layer and positive on the side of the block insulating film.

2. A nonvolatile semiconductor memory device comprising:

a semiconductor layer;

a tunnel insulating film formed on the semiconductor layer;

an organic molecular layer formed on the tunnel insulating film, the organic molecular layer including first organic molecules and second organic molecules having a smaller molecular weight than the first organic molecules, the first organic molecules each including a first alkyl chain or a first alkyl halide chain having one end bound to the tunnel insulating film, the first organic molecules each including a charge storage portion bound to the other end of the first alkyl chain or the first alkyl halide chain, the second organic molecules each including a second alkyl chain or a second alkyl halide chain having one end bound to the tunnel insulating film, the second organic molecules each having a permanent dipole;

a block insulating film formed on the organic molecular layer; and

a control gate electrode formed on the block insulating film,

wherein in a case where positive charges are stored in the charge storage portion, an orientation of the permanent dipole is negative on the side of the semiconductor layer and positive on the side of the block insulating film, and in a case where negative charges are stored in the charge storage portion, an orientation of the permanent dipole is positive on the side of the semiconductor layer and negative on the side of the block insulating film.

Assignments (5)
CHANGE OF NAME AND ADDRESS Recorded Jul 29, 2021
From: K.K PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 057016/0551 →
MERGER Recorded Jul 29, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K PANGEA
Reel/Frame 057016/0586 →
CHANGE OF NAME AND ADDRESS Recorded Jul 29, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 057016/0611 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 24, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043709/0035 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 20, 2012
From: TERAI, MASAYA; HATTORI, SHIGEKI; NISHIZAWA, HIDEYUKI; ASAKAWA, KOJI; TADA, TSUKASA
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 029511/0406 →