Sub-resolution assist feature repair
View Patent ↗After layout design data has been modified using a resolution enhancement process, a repair flow is initiated. This repair flow includes checking a layout design altered by a resolution enhancement process for errors. A repair process is performed to correct detected sub-resolution assist feature errors. The repair process may employ a rule-based sub-resolution assist feature technique, a model-based sub-resolution assist feature technique, an inverse lithography-based sub-resolution assist feature technique, or any combination thereof.
1. One or more non-transitory computer-readable media storing computer-executable instructions for causing one or more processors to perform a method, the method comprising:
receiving information of a layout design, the layout design representing at least a portion of an integrated circuit design;
performing a resolution enhancement process on the layout design to generate an altered layout design;
checking the altered layout design for errors, wherein one or more errors are detected and comprise one or more sub-resolution assist feature errors and one or more main feature errors;
performing a repair process to correct the one or more detected sub-resolution assist feature errors;
saving the corrected layout design to a memory storage location;
A. forming a re-correction region around at least one of the one or more main feature errors, wherein the re-correction region designates a sub-portion of the altered layout design;
B. identifying a second set of parameter values different than the first set of parameter values employed by the resolution enhancement process;
C. performing an optical proximity correction process that employs the second set of parameter values on the re-correction region to generate an altered re-correction region; and
D. stitching the altered re-correction region into the altered layout design to generate a modified layout design.
2. The one or more non-transitory computer-readable media recited in claim 1 , wherein the method further comprises iterating the checking for errors and method acts A through C until an end condition is met, wherein a plurality of altered sub-portions of the layout design are generated, and wherein method act D stitches the plurality of altered sub-portions of the layout design into the altered layout design.
3. The one or more non-transitory computer-readable media recited in claim 1 , wherein the second set of parameter values has at least one different parameter than the first set of parameter values does.
4. The one or more non-transitory computer-readable media recited in claim 1 , wherein method act A further comprises: forming a context region, the context region encompassing the re-correction region and designating a second sub-portion of the layout design; the optical proximity correction process implemented by method act C takes as input the second sub-portion of the layout design designated by the context region; and the optical proximity correction process implemented by method act C only alters the sub-portion of the layout design designated by the re-correction region.
5. The one or more non-transitory computer-readable media recited in claim 1 , wherein the method further comprises iterating the checking for errors and method acts A through C until an end condition is met.
6. A method, comprising:
with a computer,
receiving information of a layout design, the layout design representing at least a portion of an integrated circuit design;
performing a resolution enhancement process on the layout design to generate an altered layout design;
checking the altered layout design for errors, wherein one or more errors are detected and comprise one or more sub-resolution assist feature errors and one or more main feature errors;
performing a repair process to correct the one or more detected sub-resolution assist feature errors;
saving the corrected layout design to a memory storage location; and
A. forming a re-correction region around at least one of the one or more main feature errors, wherein the re-correction region designates a sub-portion of the altered layout design;
B. identifying a second set of parameter values different than the first set of parameter values employed by the resolution enhancement process;
C. performing an optical proximity correction process that employs the second set of parameter values on the re-correction region to generate an altered re-correction region; and
D. stitching the altered re-correction region into the altered layout design to generate a modified layout design.
7. The method recited in claim 6 , wherein the method further comprises iterating the checking for errors and method acts A through C until an end condition is met, wherein a plurality of altered sub-portions of the layout design are generated, and wherein method act D stitches the plurality of altered sub-portions of the layout design into the altered layout design.
8. The method recited in claim 6 , wherein the second set of parameter values has at least one different parameter than the first set of parameter values does.
9. The method recited in claim 6 , wherein method act A further comprises: forming a context region, the context region encompassing the re-correction region and designating a second sub-portion of the layout design; the optical proximity correction process implemented by method act C takes as input the second sub-portion of the layout design designated by the context region; and the optical proximity correction process implemented by method act C only alters the sub-portion of the layout design designated by the re-correction region.
10. The method recited in claim 6 , wherein the method further comprises iterating the checking for errors and method acts A through C until an end condition is met.