IP Library Granted Patent US 8,866,390
Granted Patent B2
US 8,866,390 · App. 13/738,654 · Granted Oct 21, 2014

Hybrid plasma reactor

Inventor: Dae-Kyu Choi (Gyeonggi-do, KR)
Assignee: Dae-Kyu Choi
H05H1/46H05H2001/4675H05H2001/4652
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Quick Facts
Patent No.
US 8,866,390
App. No.
13/738,654
Granted
Oct 21, 2014
Kind
B2
Abstract

A hybrid plasma reactor includes a first plasma chamber for providing a first ring-shaped plasma discharge space, second plasma chambers providing a second plasma discharge space connected to the first plasma discharge space and coupled to magnetic flux channels, a hybrid plasma source including magnetic cores, which partially surround the first plasma chamber and have magnetic entrances forming the magnetic flux channels, and primary winding coils wound in the magnetic cores and complexly generating ring-shaped transformer-coupled plasma in the first plasma discharge space and magnetic flux channel coupled plasma in the second plasma discharge space, and an AC switching power supply for supplying plasma generation power to the primary winding coils. The hybrid plasma reactor can complexly generate magnetic flux channel coupled plasma and transformer coupled plasma so that it has a high control capability for plasma ion energy and a wide operation region from a low-pressure region to a high-pressure region.

Claims (14)

1. A hybrid plasma reactor comprising:

a first plasma chamber for providing a first ring-shaped plasma discharge space;

second plasma chambers configured to provide a second plasma discharge space connected to the first plasma discharge space and coupled to magnetic flux channels;

a hybrid plasma source including magnetic cores, which partially surround the first plasma chamber and have magnetic entrances forming the magnetic flux channels, and primary winding coils wound in the magnetic cores and complexly generating ring-shaped transformer-coupled plasma in the first plasma discharge space and magnetic flux channel coupled plasma in the second plasma discharge space; and

an AC switching power supply for supplying plasma generation power to the primary winding coils.

2. The hybrid plasma source as claimed in claim 1 , wherein the first plasma chamber includes a conductive material or an insulation material.

3. The hybrid plasma source as claimed in claim 1 , wherein the second plasma chamber includes a dielectric material.

4. The hybrid plasma source as claimed in claim 1 , wherein the first plasma chamber has at least one electrical insulation region for preventing vortex from being generated.

5. The hybrid plasma source as claimed in claim 1 , further comprising a cooling channel for controlling temperatures of the first plasma chamber and the second plasma chamber.

6. The hybrid plasma source as claimed in claim 1 , further comprising a gas inlet connected to the first plasma chamber or the second plasma chamber and a gas outlet connected to the first plasma chamber or the second plasma chamber.

7. The hybrid plasma source as claimed in claim 1 , wherein the first plasma chamber includes a conductive material and is electrically grounded.

8. The hybrid plasma source as claimed in claim 1 , wherein the second plasma chamber is positioned in an internal side of the ring-shaped first plasma chamber.

9. The hybrid plasma source as claimed in claim 1 , wherein the second plasma chamber is positioned in an external side of the ring-shaped first plasma chamber.

10. The hybrid plasma source as claimed in claim 1 , further comprising a vacuum insulation member formed between the first plasma chamber and the second plasma chamber.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 7, 2019
From: CHOI, DAI KYU
To: NEW POWER PLASMA CO., LTD.
Reel/Frame 050635/0411 →
Priority Claims (1)
KR 10-2012-0002871 · Jan 10, 2012 · national
Continuity (1)
Related Publication 20130175928A1 · Jul 11, 2013