Mask rule checking based on curvature
View Patent ↗Aspects of the invention relate to techniques for mask rule checking based on curvature information. The curvature information comprises convex curvature information and concave curvature information. The convex curvature information for a vertex of a mask feature may comprise a convex curvature value derived based on the size of a circle that passes through the vertex, is tangent to an edge and does not cross any other edges. The concave curvature information for the vertex may comprise a concave curvature value derived based on the size of a circle that is tangent to two edges that form the vertex and does not cross any other edges, and of which distance from the vertex measured from the nearest point is no more than a predetermined number. The generated curvature information is compared with threshold curvature information to determine mask rule violations.
1. One or more non-transitory computer-readable media storing computer-executable instructions for causing one or more processors to perform a method, the method comprising:
receiving mask target information of a mask and threshold curvature information, the mask target corresponding to at least a portion of an integrated circuit design;
generating curvature information for a vertex of a mask feature of the mask, the curvature information comprising convex curvature information and concave curvature information, wherein the convex curvature information comprises a convex curvature value derived based on the size of a circle that passes through the vertex, is tangent to an edge and does not cross any other edges, and of which the center lies on the bisector of an angle associated with the vertex;
checking for mask rule violations by comparing the curvature information with the threshold curvature information; and
storing mask rule violation information if one or more mask rule violations are detected.
2. The one or more non-transitory computer-readable media recited in claim 1 , wherein the checking for mask rule violations comprises:
determining whether the convex curvature value is greater than a threshold value.
3. One or more non-transitory computer-readable media storing computer-executable instructions for causing one or more processors to perform a method, the method comprising:
receiving mask target information of a mask and threshold curvature information, the mask target corresponding to at least a portion of an integrated circuit design;
generating curvature information for a vertex of a mask feature of the mask, the curvature information comprising convex curvature information and concave curvature information, wherein the concave curvature information comprises a concave curvature value derived based on the size of a circle that is tangent to two edges that form the vertex and does not cross any other edges, and of which distance from the vertex measured from the nearest point is no more than a predetermined number;
checking for mask rule violations by comparing the curvature information with the threshold curvature information; and
storing mask rule violation information if one or more mask rule violations are detected.
4. The one or more non-transitory computer-readable media recited in claim 3 , wherein the checking for mask rule violations comprises:
determining whether the concave curvature value is greater than a threshold value.
5. A method, comprising:
with a computer,
receiving mask target information of a mask and threshold curvature information, the mask target corresponding to at least a portion of an integrated circuit design;
generating curvature information for a vertex of a mask feature of the mask, the curvature information comprising convex curvature information and concave curvature information, wherein the convex curvature information comprises a convex curvature value derived based on the size of a circle that passes through the vertex, is tangent to an edge and does not cross any other edges, and of which the center lies on the bisector of an angle associated with the vertex;
checking for mask rule violations by comparing the curvature information with the threshold curvature information; and
storing mask rule violation information if one or more mask rule violations are detected.
6. The method recited in claim 5 , wherein the checking for mask rule violations comprises:
determining whether the convex curvature value is greater than a threshold value.
7. A method, comprising:
with a computer,
receiving mask target information of a mask and threshold curvature information, the mask target corresponding to at least a portion of an integrated circuit design;
generating curvature information for a vertex of a mask feature of the mask, the curvature information comprising convex curvature information and concave curvature information, wherein the concave curvature information comprises a concave curvature value derived based on the size of a circle that is tangent to two edges that form the vertex and does not cross any other edges, and of which distance from the vertex measured from the nearest point is no more than a predetermined number;
checking for mask rule violations by comparing the curvature information with the threshold curvature information; and
storing mask rule violation information if one or more mask rule violations are detected.
8. The method recited in claim 7 , wherein the checking for mask rule violations comprises:
determining whether the concave curvature value is greater than a threshold value.
9. A system comprising:
one or more processors, the one or more processors programmed to perform a method, the method comprising:
receiving mask target information of a mask and threshold curvature information, the mask target corresponding to at least a portion of an integrated circuit design;
generating curvature information for a vertex of a mask feature of the mask, the curvature information comprising convex curvature information and concave curvature information, wherein the convex curvature information comprises a convex curvature value derived based on the size of a circle that passes through the vertex, is tangent to an edge and does not cross any other edges, and of which the center lies on the bisector of an angle associated with the vertex;
checking for mask rule violations by comparing the curvature information with the threshold curvature information; and
storing mask rule violation information if one or more mask rule violations are detected.
10. A system comprising:
one or more processors, the one or more processors programmed to perform a method, the method comprising:
receiving mask target information of a mask and threshold curvature information, the mask target corresponding to at least a portion of an integrated circuit design;
generating curvature information for a vertex of a mask feature of the mask, the curvature information comprising convex curvature information and concave curvature information, wherein the concave curvature information comprises a concave curvature value derived based on the size of a circle that is tangent to two edges that form the vertex and does not cross any other edges, and of which distance from the vertex measured from the nearest point is no more than a predetermined number;
checking for mask rule violations by comparing the curvature information with the threshold curvature information; and
storing mask rule violation information if one or more mask rule violations are detected.