Lateral transistors with low-voltage-drop shunt to body diode
View Patent ↗Methods and systems for power semiconductor devices integrating multiple quasi-vertical transistors on a single chip. Multiple power transistors (or active regions) are paralleled, but one transistor has a lower threshold voltage. This reduces the voltage drop when the transistor is forward-biased. In an alternative embodiment, the power device with lower threshold voltage is simply connected as a depletion diode, to thereby shunt the body diodes of the active transistors, without affecting turn-on and ON-state behavior.
1. A power semiconductor device, comprising:
a first and a second quasi-vertical transistor integrated on a semiconductor die, each said quasi-vertical transistor having a lateral gated portion and a vertical conduction portion; wherein said vertical conduction portions thereof are identical;
wherein the lateral gated portion of said first quasi-vertical transistor is narrower than the lateral gated portion of said second quasi-vertical transistor; and
wherein the lateral gated portion of said first quasi-vertical transistor comprises a source electrode and a gate electrode, and said gate electrode is shorted to said source electrode.
2. The device of claim 1 , wherein the threshold voltage of said first quasi-vertical transistor is lower than the threshold voltage of said second quasi-vertical transistor.
3. The device of claim 1 , wherein said vertical conduction portions are a single common region which laterally separates the lateral gated portions of said first and second quasi-vertical transistors.
4. The device of claim 1 , wherein said semiconductor die is made of silicon.
5. A power semiconductor device, comprising:
a first and a second laterally-gated transistor both having a portion of a first-conductivity-type source region, a gate electrode which is capacitively coupled to a body region to selectably form a lateral channel therein, and a first-conductivity-type drain extension region laterally connecting said lateral channel to a vertically-extended conduction region extending from a single common drain region;
wherein both said gate electrodes are electrically separate portions of a single thin film layer;
wherein the threshold voltage of said first laterally-gated transistor is less than the threshold voltage of said second laterally-gated transistor;
wherein both said laterally-gated transistors are connected identically to a common source electrode and a common drain electrode, except that the gate electrode of said first laterally-gated transistor, but not the gate electrode of said second laterally-gated transistor, is connected to said common source electrode.
6. The device of claim 5 , wherein the lateral channel of said first laterally-gated transistor has a shorter lateral extent than does the lateral channel of said second laterally-gated transistor.
7. The device of claim 5 , further comprising impurities implanted in the lateral channel of said first laterally-gated transistor which decrease the threshold voltage of said first laterally-gated transistor.
8. The device of claim 5 , wherein said laterally-gated transistors both have a first-conductivity-type source extension region laterally connecting said source region to said lateral channel.
9. The device of claim 5 , wherein said vertically-extended conduction regions are a single common region which laterally separates said first and second laterally-gated transistors.
10. The device of claim 5 , further comprising a shielding shape interposed between said gate electrodes.
11. The device of claim 5 , wherein said first conductivity type is N type.
12. A power semiconductor device, comprising:
a first and a second laterally-gated transistor both having a portion of a first-conductivity-type source region, a gate electrode which is capacitively coupled to a body region to selectably form a lateral channel therein, and a first-conductivity-type drain extension region laterally connecting said lateral channel to a vertically-extended conduction region extending from a single common drain region;
wherein the threshold voltage of said first laterally-gated transistor is less than the threshold voltage of said second laterally-gated transistor;
wherein both said gate electrodes are electrically separate portions of a single thin film layer; and
wherein both said laterally-gated transistors are connected identically to a common source electrode, a common gate electrode, and a common drain electrode.
13. The device of claim 12 , wherein the lateral channel of said first laterally-gated transistor has a shorter lateral extent than does the lateral channel of said second laterally-gated transistor.
14. The device of claim 12 , further comprising impurities implanted in the lateral channel of said first laterally-gated transistor which decrease the threshold voltage of said first laterally-gated transistor.
15. The device of claim 12 , wherein said laterally-gated transistors both have a first-conductivity-type source extension region laterally connecting said source region to said lateral channel.
16. The device of claim 12 , wherein said vertically-extended conduction regions are a single common region which laterally separates said first and second laterally-gated transistors.
17. The device of claim 12 , further comprising a shielding shape interposed between the gate electrodes of said first and second laterally-gated transistors.
18. The device of claim 12 , wherein said first conductivity type is N type.