IP Library › Granted Patent US 8,952,476
Granted Patent B2
US 8,952,476 · App. 13/760,251 · Granted Feb 10, 2015

Solid-state image pickup device

Inventors: Ai Shimomura (Yokohama, JP); Takanori Yagami (Oita, JP)
Assignee: Kabushiki Kaisha Toshiba
H01L27/14643H01L27/14616H01L27/14641
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Quick Facts
Patent No.
US 8,952,476
App. No.
13/760,251
Granted
Feb 10, 2015
Kind
B2
Abstract

According to one embodiment, a solid-state image pickup device includes a photoelectric converter, transfer, reset and amplifier transistors and a floating diffusion layer formed on a semiconductor substrate. The photoelectric converter coverts incident light to a signal charge. The transfer transistor transfers the signal charge converted by the photoelectric converter. The floating diffusion layer stores the signal charge transferred by the transfer transistor. The reset transistor resets the signal charge stored in the floating diffusion layer. The amplifier transistor amplifies the signal charge stored in the floating diffusion layer. Source and drain regions of the reset transistor, and its channel region are formed in an L-shape on the semiconductor substrate.

Claims (14)

1. A solid-state image pickup device comprising:

a first photoelectric converter which is formed on a semiconductor substrate and which coverts incident light to a signal charge;

a transfer transistor which is formed on the semiconductor substrate and which transfers the signal charge converted by the first photoelectric converter;

a first floating diffusion layer which is formed on the semiconductor substrate and which stores the signal charge transferred by the transfer transistor;

a reset transistor which is formed on the semiconductor substrate and which resets the signal charge stored in the first floating diffusion layer; and

an amplifier transistor which is formed on the semiconductor substrate and which amplifies the signal charge stored in the first floating diffusion layer,

wherein a source region and a drain region of the reset transistor, and its channel region between the source region and the drain region are formed in an L-shape on the semiconductor substrate.

2. The solid-state image pickup device according to claim 1 , wherein the source region of the reset transistor and the first floating diffusion layer are formed from a common diffusion region.

3. The solid-state image pickup device according to claim 1 , further comprising a second photoelectric converter which coverts incident light to a signal charge,

wherein the first photoelectric converter and the second photoelectric converter hold the first floating diffusion layer therebetween.

4. The solid-state image pickup device according to claim 1 , further comprising:

third and fourth photoelectric converters which covert incident light to signal charges; and

a second floating diffusion layer held between the third photoelectric converter and the fourth photoelectric converter,

wherein the second floating diffusion layer is electrically connected to the first floating diffusion layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 6, 2013
From: SHIMOMURA, AI; YAGAMI, TAKANORI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 029763/0815 →
Priority Claims (1)
JP 2012-157885 · Jul 13, 2012 · national
Continuity (1)
Related Publication 20140015024A1 · Jan 16, 2014