IP Library Granted Patent US 8,653,532
Granted Patent B2
US 8,653,532 · App. 13/760,325 · Granted Feb 18, 2014

Display device and method for manufacturing display device

Inventors: Akiko Tsuji (Kanagawa, JP); Toshiki Matsumoto (Kanagawa, JP); Hirofumi Fujioka (Aichi, JP); Mitsuru Asano (Aichi, JP); Hiroshi Sagawa (Kanagawa, JP); Kiwamu Miura (Kanagawa, JP)
Assignee: Sony Corporation
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Quick Facts
Patent No.
US 8,653,532
App. No.
13/760,325
Granted
Feb 18, 2014
Kind
B2
Abstract

Disclosed herein is a display device, including: a substrate; a circuit part configured to include a drive element; a planarization insulating layer; an electrically-conductive layer including a plurality of first electrodes and an auxiliary interconnect; an aperture-defining insulating layer configured to insulate the plurality of first electrodes from each other and have an aperture through which part of the first electrode is exposed; a plurality of light emitting elements; and a separator configured to be formed by removing the planarization insulating layer at a position between a display area, in which the plurality of light emitting elements connected to the drive element are disposed, and a peripheral area which is surrounding the display area. A method of manufacturing a display device is also provided.

Claims (35)

1. A display device, comprising:

a substrate;

a circuit part configured to include a drive element formed over the substrate;

a planarization insulating layer configured to be formed on the circuit part;

an electrically-conductive layer configured to be formed on the planarization insulating layer and include a plurality of first electrodes and an auxiliary interconnect;

an aperture-defining insulating layer configured to insulate the plurality of first electrodes from each other and have an aperture through which part of the first electrode is exposed;

a plurality of light emitting elements configured to be formed by stacking the first electrode, an organic layer including a light emitting layer, and a second electrode common to the plurality of light emitting elements in that order over an exposed part of each of the plurality of first electrodes; and

a separator configured to be formed by removing the planarization insulating layer at a position between a display area, in which the plurality of light emitting elements connected to the drive element are disposed, and a peripheral area which is surrounding the display area, wherein

in a whole area inside the separator, at least any of the electrically-conductive layer and the aperture-defining insulating layer intervenes between the planarization insulating layer and the second electrode and between the planarization insulating layer and the organic layer.

2. The display device according to claim 1 , further comprising

a contact part configured to be formed of the same layer as a metal layer included in the drive element and electrically interconnect the auxiliary interconnect and the second electrode, wherein

in the planarization insulating layer, an aperture for leading the auxiliary interconnect formed on the planarization insulating layer to a lower layer is formed above the contact part, and

an inner wall surface of the aperture by the planarization insulating layer is covered by at least any of the auxiliary interconnect and the aperture-defining insulating layer.

3. The display device according to claim 1 , wherein

an inner wall surface of an aperture by the planarization insulating layer is covered by the aperture-defining insulating layer.

4. The display device according to claim 1 , wherein

in an area that is inside the separator and is outside the display area, the aperture-defining insulating layer is so formed that coverage of the aperture-defining insulating layer, defined by an expression shown below, is a value in a range from 30% to 100%.

(the coverage of the aperture-defining insulating layer)={(covering area of the aperture-defining insulating layer)/(area of the area that is inside the separator and is outside the display area)}×100%  (Expression)

5. A method for manufacturing a display device, the method comprising the steps of:

forming a circuit part including a drive element over a substrate;

forming a planarization insulating layer on the circuit part;

forming a separator by removing the planarization insulating layer at a position between a display area, in which a plurality of light emitting elements connected to the drive element, and a peripheral area which is surrounding the display area;

forming an electrically-conductive layer including a plurality of first electrodes and an auxiliary interconnect on the planarization insulating layer;

forming an aperture-defining insulating layer that insulates the first electrodes from each other and has an aperture through which part of the first electrode is exposed; and

forming a plurality of light emitting elements by stacking the first electrode, an organic layer including a light emitting layer, and a second electrode common to the plurality of light emitting elements in that order over an exposed part of each of the plurality of first electrodes, wherein

in the forming the electrically-conductive layer, the forming the aperture-defining insulating layer, and the forming the light emitting elements, the electrically-conductive layer, the aperture-defining insulating layer, and the plurality of light emitting elements are so formed that, in a whole area inside the separator, at least any of the electrically-conductive layer and the aperture-defining insulating layer intervenes between the planarization insulating layer and the second electrode and between the planarization insulating layer and the organic layer.

6. The method for manufacturing a display device according to claim 5 , wherein

in the forming the circuit part, a contact part that electrically interconnects the auxiliary interconnect and the second electrode is formed by using the same layer as a metal layer included in the drive element,

in the forming the planarization insulating layer, an aperture for leading the auxiliary interconnect formed on the planarization insulating layer to a lower layer is formed above the contact part, and

in the forming the electrically-conductive layer and the forming the aperture-defining insulating layer, the auxiliary interconnect and the aperture-defining insulating layer are so formed that an inner wall surface of the aperture by the planarization insulating layer is covered by at least any of the auxiliary interconnect and the aperture-defining insulating layer.

7. The method for manufacturing a display device according to claim 5 , wherein

in the forming the aperture-defining insulating layer, the aperture-defining insulating layer is so formed as to cover an inner wall surface of an aperture by the planarization insulating layer.

8. The method for manufacturing a display device according to claim 5 , wherein

in the forming the aperture-defining insulating layer, the aperture-defining insulating layer is so formed that coverage of the aperture-defining insulating layer, defined by an expression shown below, is a value in a range from 30% to 100% in an area that is inside the separator and is outside the display area.

(the coverage of the aperture-defining insulating layer)={(covering area of the aperture-defining insulating layer)/(area of the area that is inside the separator and is outside the display area)}×100%  (Expression)

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 15, 2015
From: SONY CORPORATION
To: JOLED INC.
Reel/Frame 036106/0355 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 22, 2013
From: TSUJI, AKIKO; MATSUMOTO, TOSHIKI; FUJIOKA, HIROFUMI; ASANO, MITSURU; SAGAWA, HIROSHI; MIURA, KIWAMU
To: SONY CORPORATION
Reel/Frame 029860/0445 →
Priority Claims (1)
JP 2009-243589 · Oct 22, 2009 · national
Continuity (3)
Continuation 13491237 · Jun 7, 2012
Division 12899981 · Oct 7, 2010
Related Publication 20130146855A1 · Jun 13, 2013